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1.发明申请Method and processing equipment for hydrocarbons and for separation of the phases produced by said processing 审中-公开用于碳氢化合物的方法和加工设备以及用于分离由所述处理产生的相公开(公告)号：US20050075527A1
公开(公告)日：2005-04-07
申请号：US10373197
申请日：2003-02-26
CPC分类号： B01D19/0042 , C10G49/12
摘要： Method for processing hydrocarbons comprising at least two processing chambers and means for separating the liquid and gaseous fractions contained in the polyphasic mixture produced in the first processing chamber, said mixture coming from a zone (700) where a batch of liquid hydrocarbons, a gaseous batch and solid particles come into contact, said method comprising separation of liquid and gaseous phases located in the chamber. Equipment comprising: a) At least a first chamber comprising means inside said chamber for separating gaseous and liquid fractions coming from said zone, b) means for conveying said liquid fraction toward a second chamber, c) a second chamber comprising a second contact zone and means of introducing, into said zone, a gaseous batch and a liquid batch comprising at least a portion of the liquid fraction coming from the first chamber.
摘要翻译： 用于处理包含至少两个处理室的烃的方法和用于分离包含在第一处理室中产生的多相混合物中的液相和气态馏分的装置，所述混合物来自区域（700），其中一批液体烃，气态批料 并且固体颗粒接触，所述方法包括分离位于室中的液相和气相。 一种设备，包括：a）至少一个第一室，包括在所述室内的装置，用于分离来自所述区域的气态和液态馏分; b）用于将所述液体馏分输送到第二室的装置，c）第二室，包括第二接触区和 在所述区域中引入气态批料和包含至少一部分来自第一室的液体馏分的液体批料的装置。
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2.发明授权
公开(公告)号：US5817919A
公开(公告)日：1998-10-06
申请号：US676920
申请日：1996-07-08
申请人： Pierre Porot
发明人： Pierre Porot
IPC分类号： G01N7/00
CPC分类号： G01N7/00
摘要： The present invention is a process for controlling a leak rate in a measuring system comprising an element under pressure, by allowing a leak rate proportional to the pressure from the system and in varying the leak rate in the manner as the pressure charge. The present invention allows lower high pressure to be applied to the element under pressure in order to obtain a given proportion of gas and therefore to reach the proportion of gas more rapidly by applying lower pressures to the element under pressure.
摘要翻译： 本发明是一种用于通过允许与来自系统的压力成比例的泄漏速率和以压力充电的方式改变泄漏率来控制包括元件在内的测量系统中的泄漏率的方法。 本发明允许在压力下对元件施加较低的高压，以便获得给定比例的气体，因此通过在压力下对元件施加较低的压力来更快地达到气体的比例。
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