公开(公告)号：US06439965B1

公开(公告)日：2002-08-27

申请号：US09651637

申请日：2000-08-30

申请人： Mitsuyoshi Ichino ,  Koji Nakamura ,  Yoshiaki Ishizawa ,  Yasushi Ito ,  Takahiro Shimobayashi ,  Gosuke Ikemori ,  Yuichiro Fujisawa

发明人： Mitsuyoshi Ichino ,  Koji Nakamura ,  Yoshiaki Ishizawa ,  Yasushi Ito ,  Takahiro Shimobayashi ,  Gosuke Ikemori ,  Yuichiro Fujisawa

IPC分类号： B24B100

CPC分类号： B24B37/08 ,  B24B37/22 ,  B24B37/26

摘要： A workpiece is pinched from above and below by polishing pads attached to the inner surfaces of a pair of upper and lower rotary platens. A slurry is dropped between the workpiece and the polishing pads to polish the workpiece. The polishing pad is comprised of a base layer, and a sheet-shaped nap layer, which is laminated on the base layer and is made of a soft plastic foam. The nap layer is formed of closed pores, whose surface is covered with non-foaming skin layers and which involves pores (air bubble) in the nap layer without opening the pores in the surface. The polishing pad is used in combination with a colloidal slurry whose abrasive grains are colloidal silica in order to polish a surface of the workpiece.

摘要翻译： 通过附着在一对上下旋转压板的内表面的抛光垫从上下夹持工件。 在工件和抛光垫之间落下浆料以抛光工件。 抛光垫由基层和片状薄层组成，层叠在基层上并由软质塑料泡沫制成。 绒毛层由闭孔形成，其表面被不起泡的皮肤层覆盖，并且在打褶层中包含孔（气泡），而不打开表面中的孔。 抛光垫与其研磨颗粒是胶体二氧化硅的胶体浆料组合使用以抛光工件的表面。