公开(公告)号：US10513438B2

公开(公告)日：2019-12-24

申请号：US15613517

申请日：2017-06-05

Applicant: OCI Company Ltd.

Inventor： Wenjun Qin ,  Chad Fero ,  Aaron D. Rhodes ,  Jeffrey C. Gum

IPC: C23C16/50 ,  C01B33/035 ,  C23C16/24 ,  C23C16/44

Abstract: A method is provided for stabilizing filaments in a chemical vapor deposition (CVD) reactor. The method includes providing the pair of filaments, and connecting the pair of filaments with at least one stabilizer. The stabilizer may include an electronically insulating material.

公开(公告)号：US20170320746A1

公开(公告)日：2017-11-09

申请号：US15613517

申请日：2017-06-05

Applicant: OCI Company Ltd.

Inventor： Wenjun Qin ,  Chad Fero ,  Aaron D. Rhodes ,  Jeffrey C. Gum

IPC: C01B33/035 ,  C23C16/44 ,  C23C16/24

CPC classification number: C01B33/035 ,  C23C16/24 ,  C23C16/4418

Abstract: In various embodiments, systems, methods, and apparatus are provided for stabilizing filaments in a chemical vapor deposition (CVD) reactor system. A system includes a base plate having a plurality of electrical connections, a pair of filaments extending from the base plate, and a stabilizer connecting the pair of filaments. Each filament is in electrical contact with, and defines a conductive path between, the two electrical connections. A method of stabilizing the filaments includes providing the pair of filaments, and connecting the pair of filaments with at least one stabilizer. The stabilizer may include an electrically insulating material.