公开(公告)号：US20030101615A1

公开(公告)日：2003-06-05

申请号：US10004680

申请日：2001-12-05

Applicant: PROMOS TECHNOLOGIES, INC.

Inventor： San-Pen Chen ,  Shun-Lian Wu ,  William Wang

IPC: F26B021/06 ,  F26B003/00

CPC classification number: H01L21/67017 ,  Y10S414/135

Abstract: An apparatus and a method for preventing a wafer mapping system of an SMIF system from being polluted by a corrosive gas remaining on wafers according to the present invention are disclosed. The wafer mapping system includes a plurality of mirrors and sensors used to detect the positions of the wafers. The apparatus of the prevent invention comprises a pipe having a plurality of holes thereon and a purge gas flowing inside the pipe, and is characterized in that the purge gas is emitted out from the plurality of holes toward the mirrors of the wafer mapping system, thereby preventing the mirrors from being polluted by the corrosive gas remaining on the wafers. The method of the prevent invention is characterized by emitting a purge gas from a pipe toward the mirrors of the wafer mapping system, thereby preventing the mirrors from being polluted by the corrosive gas remaining on the wafers.

Abstract translation: 公开了一种用于防止SMIF系统的晶片映射系统被残留在根据本发明的晶片上的腐蚀性气体污染的装置和方法。 晶片映射系统包括用于检测晶片位置的多个反射镜和传感器。 防止发明的装置包括在其上具有多个孔的管和在管内流动的净化气体，其特征在于，吹扫气体从多个孔向晶片映射系统的反射镜发射出去，从而 防止反射镜被残留在晶片上的腐蚀性气体污染。 防止发明的方法的特征在于从管道向晶片映射系统的反射镜发射净化气体，从而防止反射镜被残留在晶片上的腐蚀性气体污染。