公开(公告)号：US20040238012A1

公开(公告)日：2004-12-02

申请号：US10885951

申请日：2004-07-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dong-Jin Park ,  Kyung-Dae Kim ,  Hoi-Sik Chung ,  Pil-Kwon Jun ,  Young-Ho Kim

IPC: B08B009/00

CPC classification number: C11D7/06 ,  C11D7/10 ,  C11D7/264 ,  C11D7/32 ,  C11D7/5004 ,  C11D11/0047 ,  Y10S134/902

Abstract: A cleaning solution for a cured anti-reflective layer (AFC layer) component and a method of cleaning an anti-reflective layer component by using the same, wherein the cleaning solution comprises about 5-30% by weight of ammonium hydroxide, about 23-70% by weight of an organic solvent and about 10-50% by weight of water. When an organic material is spattered to adjacent equipment during implementing a coating process onto a wafer, the equipment is detached and then is dipped into the cleaning solution. Thereafter, the equipment is rinsed and dried. Cured and non-cured organic materials are advantageously removed. Cured organic materials left for a period of time, particularly anti-reflective layer components are advantageously removed.