公开(公告)号：US20240420936A1

公开(公告)日：2024-12-19

申请号：US18818710

申请日：2024-08-29

Applicant: SEMES Co., Ltd.

Inventor： Hyo Seong Seong ,  Tae Hoon Jo ,  Jeong Yeon Hwang ,  Jae Hong Min

IPC: H01J37/32

Abstract: Provided are an impedance control apparatus for automatically compensating impedance by predicting the occurrence of wear on a ring assembly, and a substrate treating system having the same. The substrate treating system includes a housing for providing a space for treating a substrate, a substrate support member installed inside the housing and for supporting the substrate, a plasma generating unit for generating plasma inside the housing, a ring assembly disposed in circumference of the substrate, and an impedance control unit for controlling the impedance around the ring assembly and automatically compensating the impedance by predicting the occurrence of wear of the ring assembly.

公开(公告)号：US20220139683A1

公开(公告)日：2022-05-05

申请号：US17509200

申请日：2021-10-25

Applicant: SEMES Co., Ltd.

Inventor： Hyo Seong Seong ,  Tae Hoon Jo ,  Jeong Yeon Hwang ,  Jae Hong Min

IPC: H01J37/32

Abstract: Provided are an impedance control apparatus for automatically compensating impedance by predicting the occurrence of wear on a ring assembly, and a substrate treating system having the same. The substrate treating system includes a housing for providing a space for treating a substrate, a substrate support member installed inside the housing and for supporting the substrate, a plasma generating unit for generating plasma inside the housing, a ring assembly disposed in circumference of the substrate, and an impedance control unit for controlling the impedance around the ring assembly and automatically compensating the impedance by predicting the occurrence of wear of the ring assembly.