System and process for analyzing surface defects
    1.
    发明申请
    System and process for analyzing surface defects 审中-公开
    用于分析表面缺陷的系统和过程

    公开(公告)号:US20020191831A1

    公开(公告)日:2002-12-19

    申请号:US10132876

    申请日:2002-04-25

    Abstract: Three-dimensional analysis of surface defects and microdefects of an object is performed by correlating two images of the surface of the object based upon a stereoscopic view thereof. Analyzing surface defects may be implemented by integrating, in a single monolithic component made using VLSI CMOS technology, an optical sensor with a cellular neural network. The optical sensor includes a matrix of cells configured as analog processors.

    Abstract translation: 基于立体视图对物体的表面的两个图像进行关联来进行物体的表面缺陷和微观缺陷的三维分析。 分析表面缺陷可以通过在使用VLSI CMOS技术制造的单个单片组件中集成具有细胞神经网络的光学传感器来实现。 光学传感器包括配置为模拟处理器的单元矩阵。

Patent Agency Ranking