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10 条记录 (耗时 0.018 秒)

    Cleaning agent composition for a positive or a negative photoresist
    1.
    发明授权
    Cleaning agent composition for a positive or a negative photoresist 有权
    用于正性或负性光致抗蚀剂的清洁剂组合物

    公开(公告)号：US07172996B2

    公开(公告)日：2007-02-06

    申请号：US10500752

    申请日：2003-01-09

    申请人： Sae-Tae Oh ,  Doek-Man Kang ,  Kyung-Soo Choi

    发明人： Sae-Tae Oh ,  Doek-Man Kang ,  Kyung-Soo Choi

    IPC分类号： C11D7/50

    CPC分类号： C11D7/264 ,  C11D3/3707 ,  C11D7/263 ,  C11D7/3263 ,  C11D7/3281 ,  C11D11/0047 ,  G03F7/168

    摘要： The present invention relates to a composition for cleaning a photoresist and is to provide a cleaning composition wherein the residue of the photoresist does not remain on the boundary surface between the cleaned area and the not-cleaned area after a negative photoresist containing pigment is cleaned, soft-baked, exposed and developed. The present invention provides a composition for cleaning a positive or negative photoresist which comprises (a) from 0.1 to 20 wt. % of and alkyl oxide polymer with a molecular weight of from 50 to 2000 and (b) from 80 to 99.9 wt. % of an organic solvent comprising: (b−1) from 1 to 20 parts by weight of dipropylene glycol methyl ether (DPGME), from 10 to 50 parts by weight of N-methyl pyrolidone (NMP) and from 50 to 90 parts by weight of methyl isobutyl ketone (MIBK), or (b−2) from 10 to 90 parts by weight of dimethyl formaldehyde (DMF) or dimethylacetamide (DMAc) and from 10 to 50 parts by weight of n-butyl acetate.

    摘要翻译： 本发明涉及一种用于清洁光致抗蚀剂的组合物，并且提供一种清洁组合物，其中在清洁含有负性光致抗蚀剂的颜料之后，光致抗蚀剂的残留物不残留在清洁区域和未清洁区域之间的边界表面上， 软烤，暴露和发达。 本发明提供一种用于清洗正性或负性光致抗蚀剂的组合物，其包含（a）0.1-20wt。 ％和分子量为50至2000的烷基氧化物聚合物和（b）80至99.9重量％ ％的有机溶剂含有：（b-1）1〜20重量份二丙二醇甲基醚（DPGME），10〜50重量份N-甲基吡咯烷酮（NMP）和50〜90重量份 甲基异丁基酮（MIBK）的重量，或（b-2）10至90重量份的二甲基甲醛（DMF）或二甲基乙酰胺（DMAc）和10至50重量份的乙酸正丁酯。

    Cleaning agent composition for a positive or a negative photoresist
    2.
    发明申请
    Cleaning agent composition for a positive or a negative photoresist 有权
    用于正性或负性光致抗蚀剂的清洁剂组合物

    公开(公告)号：US20050119142A1

    公开(公告)日：2005-06-02

    申请号：US10500752

    申请日：2003-01-09

    申请人： Sae-Tae Oh ,  Doek-Man Kang ,  Kyung-Soo Choi

    发明人： Sae-Tae Oh ,  Doek-Man Kang ,  Kyung-Soo Choi

    IPC分类号： C11D3/37 ,  C11D7/26 ,  C11D7/32 ,  C11D11/00 ,  G03F7/16 ,  G03F7/42 ,  H01L21/027 ,  H01L21/304 ,  C11D1/00

    CPC分类号： C11D7/264 ,  C11D3/3707 ,  C11D7/263 ,  C11D7/3263 ,  C11D7/3281 ,  C11D11/0047 ,  G03F7/168

    摘要： The present invention relates to a composition for cleaning a photoresist and is to provide a cleaning composition wherein the residue of the photoresist does not remain on the boundary surface between the cleaned area and the not-cleaned area after a negative photoresist containing pigment is cleaned, soft-baked, exposed and developed. The present invention provides a composition for cleaning a positive or negative photoresist which comprises (a) from 0.1 to 20 wt. % of and alkyl oxide polymer with a molecular weight of from 50 to 2000 and (b) from 80 to 99.9 wt. % of an organic solvent comprising: (b−1) from 1 to 20 parts by weight of dipropylene glycol methyl ether (DPGME), from 10 to 50 parts by weight of N-methyl pyrolidone (NMP) and from 50 to 90 parts by weight of methyl isobutyl ketone (MIBK), or (b−2) from 10 to 90 parts by weight of dimethyl formaldehyde (DMF) or dimethylacetamide (DMAc) and from 10 to 50 parts by weight of n-butyl acetate.

    摘要翻译： 本发明涉及一种用于清洁光致抗蚀剂的组合物，并且提供一种清洁组合物，其中在清洁含有负性光致抗蚀剂的颜料之后，光致抗蚀剂的残留物不残留在清洁区域和未清洁区域之间的边界表面上， 软烤，暴露和发达。 本发明提供一种用于清洗正性或负性光致抗蚀剂的组合物，其包含（a）0.1-20wt。 ％和分子量为50至2000的烷基氧化物聚合物和（b）80至99.9重量％ ％的有机溶剂含有：（b-1）1〜20重量份二丙二醇甲基醚（DPGME），10〜50重量份N-甲基吡咯烷酮（NMP）和50〜90重量份 甲基异丁基酮（MIBK）的重量，或（b-2）10至90重量份的二甲基甲醛（DMF）或二甲基乙酰胺（DMAc）和10至50重量份的乙酸正丁酯。

    PHOTORESIST RESIN, AND METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING DISPLAY PANEL USING THE SAME
    3.
    发明申请
    PHOTORESIST RESIN, AND METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING DISPLAY PANEL USING THE SAME 审中-公开
    光电树脂，以及形成图案的方法和使用其制造显示面板的方法

    公开(公告)号：US20090258497A1

    公开(公告)日：2009-10-15

    申请号：US12389296

    申请日：2009-02-19

    申请人： Jeong-Min Park ,  Doo-Hee Jung ,  Jung-Soo Lee ,  Hi-Kuk Lee ,  Sae-Tae Oh ,  Jae-Young Choi ,  Doek-Man Kang

    发明人： Jeong-Min Park ,  Doo-Hee Jung ,  Jung-Soo Lee ,  Hi-Kuk Lee ,  Sae-Tae Oh ,  Jae-Young Choi ,  Doek-Man Kang

    IPC分类号： H01L21/311 ,  G03F7/00

    CPC分类号： G03F7/0236 ,  G03F7/0007

    摘要： A photoresist resin composition, a method for forming a pattern and a method for manufacturing a display panel using the photoresist resin composition are disclosed. The photoresist resin composition includes an alkali soluble resin, a photoresist compound, and a solvent, wherein the alkali soluble resin includes a first polymer resin represented by the following Chemical Formula 1, wherein, of R1, R2, R3, R4, R5 and R6, at least one is a hydroxyl group, at least two are methyl groups and any remaining groups are hydrogen, and of R7, R8, R9, R10 and R11, at least one is a hydroxyl group, at least two are methyl groups and any remaining groups are hydrogen.

    摘要翻译： 公开了光致抗蚀剂树脂组合物，形成图案的方法和使用该光致抗蚀剂树脂组合物的显示面板的制造方法。 光致抗蚀剂树脂组合物包括碱溶性树脂，光致抗蚀剂化合物和溶剂，其中碱溶性树脂包括由以下化学式1表示的第一聚合物树脂，其中R1，R2，R3，R4，R5和R6 至少一个是羟基，至少两个是甲基，任何剩余的基团是氢，R7，R8，R9，R10和R11中的至少一个是羟基，至少两个是甲基，任何 剩余的基团是氢。