公开(公告)号：US20250018718A1

公开(公告)日：2025-01-16

申请号：US18613128

申请日：2024-03-22

Applicant: Samsung Display Co., Ltd.

Inventor： HYEMIN LEE ,  JAESIK KIM ,  JUNGHAN SEO ,  KWANHYUCK YOON ,  SEUNGHO YOON ,  BYEONGJUN LEE ,  SEUNGGUN CHAE

IPC: B41J2/165

Abstract: A head cleaning method includes contacting a nozzle surface of a head in which nozzle holes are defined with an absorbent on a pressurizer, starting a wiping operation at a first edge portion of the head closest to the pressurizer at a first position, and ending the wiping operation at a second edge portion of the head furthest away from the pressurizer at the first position, positioning the pressurizer at a second position to define a first angle between a first imaginary line parallel to a longitudinal direction of the head and a second imaginary line parallel to a longitudinal direction of the pressurizer, and starting the wiping operation at a third edge portion of the head closest to the pressurizer at the second position, and ending the wiping operation at a fourth edge portion of the head furthest away from the pressurizer at the second position.