公开(公告)号：US20160201195A1

公开(公告)日：2016-07-14

申请号：US14739149

申请日：2015-06-15

Applicant: Samsung Display Co., Ltd.

Inventor： Byung Chul LEE ,  Gan Young PARK ,  Chang Sik LEE ,  Seong Ho JEONG ,  Hyun CHOI

IPC: C23C16/455

CPC classification number: C23C14/243 ,  C23C14/12 ,  H01L51/001

Abstract: A deposition apparatus includes: a deposition source disposed facing a substrate and configured to accommodate a deposition material; and a plurality of injection nozzles arranged from one side of the deposition source along a first direction, the plurality of injection nozzles configured to inject the deposition material onto the substrate, each injection nozzle including: a first injection part including a first injection passage which has one end connected to the deposition source and extends along a second direction between the deposition source and the substrate, and a second injection part including a second injection passage which has walls extending from the other end of the first injection passage in a direction inclined at a predetermined inclined angle with respect to the second direction, wherein the first direction is a length direction of the deposition source and the second direction is a height direction of the deposition source.

Abstract translation: 沉积设备包括：沉积源，其面向基板设置并且构造成容纳沉积材料; 以及多个喷射喷嘴，其沿着第一方向从所述沉积源的一侧排列，所述多个注射喷嘴被配置为将所述沉积材料注入到所述基板上，每个喷射喷嘴包括：第一喷射部分，其包括第一喷射通道， 一端连接到沉积源并沿沉积源和衬底之间的第二方向延伸，第二注射部分包括第二注射通道，该第二注射通道具有从第一注射通道的另一端沿着倾斜的方向延伸的壁 相对于第二方向的预定倾斜角，其中第一方向是沉积源的长度方向，第二方向是沉积源的高度方向。