公开(公告)号：US20150040826A1

公开(公告)日：2015-02-12

申请号：US14248483

申请日：2014-04-09

Applicant: Samsung Display Co., Ltd.

Inventor： Sung-Woo JUNG ,  Sang-Yun LEE ,  Yong-Hwan KIM

IPC: C23F1/02 ,  G03F7/30 ,  G03F7/40 ,  B05C21/00

CPC classification number: C23F1/02 ,  C23C14/042 ,  G03F7/12 ,  G03F7/2032 ,  H01L51/0011

Abstract: A method for manufacturing a metal mask includes defining pattern areas exposing an upper surface, and a lower surface opposite to the upper surface, of a thin plate; and etching the upper and lower surfaces of the thin film plate exposed by the pattern areas, to reduce a thickness of the thin film plate by a predetermined thickness and form deposition openings in the metal mask. The etching the upper and lower surfaces of the thin film plate includes both a wet-etching method and a dry-etching method.

Abstract translation: 制造金属掩模的方法包括限定暴露薄板的上表面和与上表面相对的下表面的图案区域; 并且蚀刻由图案区域暴露的薄膜板的上表面和下表面，以将薄膜板的厚度减小预定厚度，并在金属掩模中形成沉积开口。 蚀刻薄膜板的上表面和下表面都包括湿蚀刻方法和干蚀刻方法。