公开(公告)号：US20140036211A1

公开(公告)日：2014-02-06

申请号：US14046396

申请日：2013-10-04

Applicant: Samsung Display Co., Ltd.

Inventor： Kyung-Sook JEON ,  Jang-Soo KIM ,  Hong-Suk YOO ,  Yong-Hwan KIM ,  Hwa-Yeul OH ,  Jong-In KIM ,  Sang-Hee JANG

IPC: G02F1/1335

CPC classification number: G02F1/133514 ,  G02F1/133516 ,  G02F1/13394 ,  G02F2001/133388

Abstract: Exemplary embodiments of the present invention disclose a liquid crystal display (LCD) and a method of manufacturing the same. The LCD may have a display area and a peripheral area. An organic layer of the peripheral area may be patterned using a half-tone mask, and a protrusion member may be formed in the peripheral area. Accordingly, the thin film transistor array panel and the corresponding substrate may be prevented from being temporary adhered in the peripheral area such that the density of the liquid crystal molecules filled in the peripheral area may be uniformly maintained and the display quality of the liquid crystal display may be improved.

Abstract translation: 本发明的示例性实施例公开了液晶显示器（LCD）及其制造方法。 LCD可以具有显示区域和外围区域。 可以使用半色调掩模对周边区域的有机层进行图案化，并且可以在周边区域中形成突起构件。 因此，可以防止薄膜晶体管阵列面板和对应的基板临时粘附在周边区域中，使得可以均匀地保持填充在周边区域中的液晶分子的密度，并且液晶显示器的显示质量 可以改进。

公开(公告)号：US20130314686A1

公开(公告)日：2013-11-28

申请号：US13786863

申请日：2013-03-06

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong-Hwan KIM

IPC: G03F7/20

CPC classification number: G03F7/70733

Abstract: A mask support frame for supporting a mask is provided. The frame is configured to secure both ends of a mask and apply tension to the mask in a first direction. The frame includes a frame main body defining an opening for exposing a patterned opening area of the mask and an end tensioner coupled to the frame main body, and configured to apply tension to one of both ends of the mask in a second direction crossing the first direction.

Abstract translation: 提供一种用于支撑面罩的面罩支撑框架。 框架被配置为固定掩模的两端并且在第一方向上对掩模施加张力。 该框架包括框架主体，其限定用于暴露面罩的图案化开口区域的开口和联接到框架主体的端部张紧器，并且构造成沿着穿过第一个框架的第二方向向面罩的两端之一施加张力 方向。

公开(公告)号：US20150040826A1

公开(公告)日：2015-02-12

申请号：US14248483

申请日：2014-04-09

Applicant: Samsung Display Co., Ltd.

Inventor： Sung-Woo JUNG ,  Sang-Yun LEE ,  Yong-Hwan KIM

IPC: C23F1/02 ,  G03F7/30 ,  G03F7/40 ,  B05C21/00

CPC classification number: C23F1/02 ,  C23C14/042 ,  G03F7/12 ,  G03F7/2032 ,  H01L51/0011

Abstract: A method for manufacturing a metal mask includes defining pattern areas exposing an upper surface, and a lower surface opposite to the upper surface, of a thin plate; and etching the upper and lower surfaces of the thin film plate exposed by the pattern areas, to reduce a thickness of the thin film plate by a predetermined thickness and form deposition openings in the metal mask. The etching the upper and lower surfaces of the thin film plate includes both a wet-etching method and a dry-etching method.

Abstract translation: 制造金属掩模的方法包括限定暴露薄板的上表面和与上表面相对的下表面的图案区域; 并且蚀刻由图案区域暴露的薄膜板的上表面和下表面，以将薄膜板的厚度减小预定厚度，并在金属掩模中形成沉积开口。 蚀刻薄膜板的上表面和下表面都包括湿蚀刻方法和干蚀刻方法。