公开(公告)号：US20250046588A1

公开(公告)日：2025-02-06

申请号：US18657015

申请日：2024-05-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Youn Sok Choi ,  Ju Hyun Kim ,  Hae Wook Park ,  Young Yoon

IPC: H01J37/32

Abstract: A plasma diagnosis device and a method for manufacturing the plasma diagnosis device are provided. The plasma diagnosis device includes: a process chamber in which processes using plasma are performed; a probe structure which includes a protective layer having a first face abutting the plasma, a second face opposite to the first face, and an outer wall connecting the first face and the second face inside the process chamber, and a conductive measuring unit spaced apart from the first face of the protective layer and configured to measure a status of the plasma; and a wafer on a periphery of the probe structure and in contact with the outer wall of the protective layer, in which the wafer and the protective layer include materials different from each other.