公开(公告)号：US20160013900A1

公开(公告)日：2016-01-14

申请号：US14861558

申请日：2015-09-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyo-Jin LEE ,  Youn-Sun KIM ,  Ki-ll KIM

IPC: H04L5/00 ,  H04B17/345 ,  H04W72/04 ,  H04B17/24

CPC classification number: H04B7/0626 ,  H04B17/24 ,  H04B17/345 ,  H04L5/0035 ,  H04L5/0053 ,  H04L5/0057 ,  H04W24/00 ,  H04W72/0413 ,  H04W72/082 ,  H04W88/02 ,  H04W88/08

Abstract: A method and user equipment for transmitting channel state information (CSI) are provided. The method includes identifying a first CSI configuration with a first information for a period and an offset; identifying a second CSI configuration with a second information for a period and an offset; generating a first CSI for the first CSI configuration, the first CSI including at least one of a rank indicator (RI), a channel quality indicator (CQI), a precoding matrix indicator (PMI), and a precoding type indicator (PTI); generating a second CSI for the second CSI configuration, the second CSI including at least one of a RI, a CQI, a PMI, and a PTI; and reporting a CSI for a CSI configuration among the first CSI configuration and the second CSI configuration based on a type of the CSI, in case of collision between report of the first CSI for the first CSI configuration and report of the second CSI for the second CSI configuration, wherein a type of a CSI with wideband CQI has lower priority than a type of a CSI with RI.

Abstract translation: 提供了用于发送信道状态信息（CSI）的方法和用户设备。 该方法包括：识别具有周期的第一信息和偏移的第一CSI配置; 用周期和偏移量的第二信息识别第二CSI配置; 生成用于所述第一CSI配置的第一CSI，所述第一CSI包括秩指示符（RI），信道质量指示符（CQI），预编码矩阵指示符（PMI）和预编码类型指示符（PTI）中的至少一个; 生成用于所述第二CSI配置的第二CSI，所述第二CSI包括RI，CQI，PMI和PTI中的至少一个; 以及在所述第一CSI配置的所述第一CSI的报告与所述第二CSI的所述第二CSI的报告之间的冲突的情况下，基于所述CSI的类型，在所述第一CSI配置和所述第二CSI配置之中报告用于CSI配置的CSI CSI配置，其中具有宽带CQI的CSI的类型比具有RI的CSI的类型具有较低的优先级。

公开(公告)号：US20250104980A1

公开(公告)日：2025-03-27

申请号：US18628334

申请日：2024-04-05

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Changbae PARK ,  Ki-ll KIM ,  Jongchul PARK ,  Jae Sik AN ,  Suntaek LIM

IPC: H01J37/32

Abstract: A substrate processing apparatus includes a process chamber providing a process space, a stage configured to support a substrate, a gas injection unit spaced upward from the stage in the process space, and a spin polarizer having a ring shape and spaced upward from the stage. The spin polarizer includes a polarizer body having a ring shape, and a thin layer on a surface of the polarizer body. The thin layer includes a ferromagnetic material.