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公开(公告)号：US08277884B2
公开(公告)日：2012-10-02
申请号：US12569988
申请日：2009-09-30
CPC分类号： H01L21/68721 , B05D1/005 , G03F7/162 , H01L21/6715 , H01L21/68735 , H01L21/6875
摘要： There is provided a coating and processing apparatus including a spin chuck horizontally holding a quadrangular substrate and rotating the substrate in a horizontal plane, a coating solution nozzle for supplying a coating solution to a front surface of the substrate horizontally held by the spin chuck, and a solvent supply mechanism provided in the spin chuck for supplying a solvent to a back surface of the substrate, in which the solvent supplied to the back surface of the substrate is allowed to reach the back surface and side surface of each of corners of the substrate by centrifugal force, thereby removing the coating solution attached.
摘要翻译： 提供一种涂布处理装置，其包括水平保持四边形基板并旋转基板在水平面中的旋转卡盘，用于将涂布溶液供给到由旋转卡盘水平保持的基板的前表面的涂布溶液喷嘴，以及 溶剂供给机构，设置在旋转卡盘中，用于向基板的背面供给溶剂，其中供给到基板的背面的溶剂被允许到达基板的每个角部的背面和侧面 通过离心力，从而除去附着的涂布溶液。
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公开(公告)号：US07927657B2
公开(公告)日：2011-04-19
申请号：US12492650
申请日：2009-06-26
IPC分类号： B05D3/12
CPC分类号： H01L21/68721 , B05C11/08 , B05D1/005 , H01L21/6715 , H01L21/68735 , H01L21/6875
摘要： In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.
摘要翻译： 在用于通过在下降的清洁空气流中在环境中旋涂在多边形基板上形成涂膜的液体处理装置中，旋转卡盘包括用于在其上大致水平地支撑基板的支撑板。 空气流量控制构件设置在旋转卡盘上，使得气流控制构件邻近支撑在旋转卡盘上的多边形基板的周边设置，其中气流控制构件不设置在支撑在基座上的基板的拐角部分附近 旋转卡盘。 液体处理装置可以包括气流调节环，该气流调节环设置有具有围绕空气流量控制构件的外周的开口的空气入口，其中空气入口与排气单元连通。
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公开(公告)号：US20100034969A1
公开(公告)日：2010-02-11
申请号：US12569988
申请日：2009-09-30
IPC分类号： B05D3/12
CPC分类号： H01L21/68721 , B05D1/005 , G03F7/162 , H01L21/6715 , H01L21/68735 , H01L21/6875
摘要： There is provided a coating and processing apparatus including a spin chuck horizontally holding a quadrangular substrate and rotating the substrate in a horizontal plane, a coating solution nozzle for supplying a coating solution to a front surface of the substrate horizontally held by the spin chuck, and a solvent supply mechanism provided in the spin chuck for supplying a solvent to a back surface of the substrate, in which the solvent supplied to the back surface of the substrate is allowed to reach the back surface and side surface of each of corners of the substrate by centrifugal force, thereby removing the coating solution attached.
摘要翻译： 提供一种涂布处理装置，其包括水平保持四边形基板并旋转基板在水平面中的旋转卡盘，用于将涂布溶液供给到由旋转卡盘水平保持的基板的前表面的涂布溶液喷嘴，以及 溶剂供给机构，设置在旋转卡盘中，用于向基板的背面供给溶剂，其中供给到基板的背面的溶剂被允许到达基板的每个角部的背面和侧面 通过离心力，从而除去附着的涂布溶液。
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公开(公告)号：US07615117B2
公开(公告)日：2009-11-10
申请号：US10795269
申请日：2004-03-09
CPC分类号： H01L21/68721 , B05D1/005 , G03F7/162 , H01L21/6715 , H01L21/68735 , H01L21/6875
摘要： There is provided a coating and processing apparatus including a spin chuck horizontally holding a quadrangular substrate and rotating the substrate in a horizontal plane, a coating solution nozzle for supplying a coating solution to a front surface of the substrate horizontally held by the spin chuck, and a solvent supply mechanism provided in the spin chuck for supplying a solvent to a back surface of the substrate, in which the solvent supplied to the back surface of the substrate is allowed to reach the back surface and side surface of each of corners of the substrate by centrifugal force, thereby removing the coating solution attached.
摘要翻译： 提供一种涂布处理装置，其包括水平保持四边形基板并旋转基板在水平面中的旋转卡盘，用于将涂布溶液供给到由旋转卡盘水平保持的基板的前表面的涂布溶液喷嘴，以及 溶剂供给机构，设置在旋转卡盘中，用于向基板的背面供给溶剂，其中供给到基板的背面的溶剂被允许到达基板的每个角部的背面和侧面 通过离心力，从而除去附着的涂布溶液。
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公开(公告)号：US07566365B2
公开(公告)日：2009-07-28
申请号：US10796179
申请日：2004-03-10
IPC分类号： B05C5/02
CPC分类号： H01L21/68721 , B05C11/08 , B05D1/005 , H01L21/6715 , H01L21/68735 , H01L21/6875
摘要： In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.
摘要翻译： 在用于通过在下降的清洁空气流中在环境中旋涂在多边形基板上形成涂膜的液体处理装置中，旋转卡盘包括用于在其上大致水平地支撑基板的支撑板。 空气流量控制构件设置在旋转卡盘上，使得气流控制构件邻近支撑在旋转卡盘上的多边形基板的周边设置，其中气流控制构件不设置在支撑在基座上的基板的拐角部分附近 旋转卡盘。 液体处理装置可以包括气流调节环，该气流调节环设置有具有围绕空气流量控制构件的外周的开口的空气入口，其中空气入口与排气单元连通。
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公开(公告)号：US20090263577A1
公开(公告)日：2009-10-22
申请号：US12492650
申请日：2009-06-26
IPC分类号： B05D3/12
CPC分类号： H01L21/68721 , B05C11/08 , B05D1/005 , H01L21/6715 , H01L21/68735 , H01L21/6875
摘要： In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.
摘要翻译： 在用于通过在下降的清洁空气流中在环境中旋涂在多边形基板上形成涂膜的液体处理装置中，旋转卡盘包括用于在其上大致水平地支撑基板的支撑板。 空气流量控制构件设置在旋转卡盘上，使得气流控制构件邻近支撑在旋转卡盘上的多边形基板的周边设置，其中气流控制构件不设置在支撑在基座上的基板的拐角部分附近 旋转卡盘。 液体处理装置可以包括气流调节环，该气流调节环设置有具有围绕空气流量控制构件的外周的开口的空气入口，其中空气入口与排气单元连通。
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公开(公告)号：US20050181127A1
公开(公告)日：2005-08-18
申请号：US11047600
申请日：2005-02-02
申请人： Masahito Hamada , Fumio Hirota , Shinji Kobayashi
发明人： Masahito Hamada , Fumio Hirota , Shinji Kobayashi
CPC分类号： H01L21/6715
摘要： In the present invention, a gas flow restraining ring facing corner portions of the front face of a substrate horizontally held on a substrate holding unit and movable up and down, is set to a predetermined height in accordance with a coating treatment. Then, a coating solution containing a coating film forming component and a solvent is applied to the front face of the substrate and spread into a thin film state by a so-called spin coating method, and thereafter the substrate is rotated at a high speed so that the coating solution is dried. In this case, it is possible to control fresh gas flow from above the substrate to decrease the difference in evaporation rate of the solvent between the coating solution on the corner portions of the substrate and the coating solution inside them, thus enabling the coating treatment uniform within a plane on the substrate.
摘要翻译： 在本发明中，根据涂布处理，将水平保持在基板保持单元上并可上下移动的基板的前面的角部的气流限制环设定为规定的高度。 然后，将含有涂膜形成成分和溶剂的涂布溶液涂布在基板的正面，通过所谓的旋涂法扩展成薄膜状态，然后高速旋转基板 使涂层溶液干燥。 在这种情况下，可以控制从基板上方的新鲜气体流动，以减少基板的角部上的涂布液与其内部的涂布液之间的溶剂的蒸发速率差，从而能够使涂布处理均匀 在基板上的平面内。
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公开(公告)号：US07553374B2
公开(公告)日：2009-06-30
申请号：US11047600
申请日：2005-02-02
申请人： Masahito Hamada , Fumio Hirota , Shinji Kobayashi
发明人： Masahito Hamada , Fumio Hirota , Shinji Kobayashi
CPC分类号： H01L21/6715
摘要： In the present invention, a gas flow restraining ring facing corner portions of the front face of a substrate horizontally held on a substrate holding unit and movable up and down, is set to a predetermined height in accordance with a coating treatment. Then, a coating solution containing a coating film forming component and a solvent is applied to the front face of the substrate and spread into a thin film state by a so-called spin coating method, and thereafter the substrate is rotated at a high speed so that the coating solution is dried. In this case, it is possible to control fresh gas flow from above the substrate to decrease the difference in evaporation rate of the solvent between the coating solution on the corner portions of the substrate and the coating solution inside them, thus enabling the coating treatment uniform within a plane on the substrate.
摘要翻译： 在本发明中，根据涂布处理，将水平保持在基板保持单元上并可上下移动的基板的前面的角部的气流限制环设定为规定的高度。 然后，将含有涂膜形成成分和溶剂的涂布溶液涂布在基板的正面，通过所谓的旋涂法扩展成薄膜状态，然后高速旋转基板 使涂层溶液干燥。 在这种情况下，可以控制从基板上方的新鲜气体流动，以减少基板的角部上的涂布液与其内部的涂布液之间的溶剂的蒸发速率差，从而能够使涂布处理均匀 在基板上的平面内。
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公开(公告)号：US20080176172A1
公开(公告)日：2008-07-24
申请号：US12007268
申请日：2008-01-08
IPC分类号： G03F7/30 , H01L21/027 , B05C5/00
CPC分类号： G03F7/3021
摘要： A device includes a rotary base; an approach stage; a substrate holding table and a nozzle head. The substrate holding table holds the work by suction, and comes into intimate contact with the approach stage and the rotary base through first and second annular seal members to form a liquid storage space, respectively. When the suction holding and the intimate contact are released, the substrate becomes rotatable together with the rotary base and the approach stage.
摘要翻译： 一种装置包括旋转底座; 进场阶段 基板保持台和喷嘴头。 基板保持台通过抽吸保持工件，并通过第一和第二环形密封构件与接近台和旋转底座紧密接触以分别形成液体储存空间。 当抽吸保持和紧密接触被释放时，基板与旋转底座和接近台一起可旋转。
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公开(公告)号：US08343284B2
公开(公告)日：2013-01-01
申请号：US13163276
申请日：2011-06-17
申请人： Shigenori Kamei , Kotaro Ooishi , Masahito Hamada
发明人： Shigenori Kamei , Kotaro Ooishi , Masahito Hamada
IPC分类号： B08B5/04
CPC分类号： G03F7/168 , G03F7/162 , H01L21/6708 , Y10S134/902 , Y10T156/1111 , Y10T156/1928
摘要： A film removing device includes an approach stage having a flat approach part having a surface substantially flush with the surface of a substrate supported on a support member. The flat approach part faces a first side surface of the substrate at a corner of the substrate where the first side surface and a second side surface of the substrate join. A film removing nozzle spouts a solvent toward a peripheral part of the substrate and sucks a solution while being moved along the second side surface and the approach stage. A gas is spouted into a gap between the flat approach part and the corner of the substrate so that the gas flows through the gap toward the second side surface.
摘要翻译： 膜移除装置包括具有平坦接近部分的接近台，该平面接近部分具有与支撑在支撑构件上的基板的表面基本齐平的表面。 平面接近部分面对衬底的第一侧表面，其位于衬底的第一侧表面和第二侧表面接合的拐角处。 膜移除喷嘴向溶液的周边部喷射溶剂，并在沿着第二侧面和接近台移动的同时吸取溶液。 气体被喷射到平坦的接近部分和基底的角部之间的间隙中，使得气体朝向第二侧表面流过间隙。
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