Use of vapor phase deposition to make fused silica articles having titanium dioxide in the surface layer
    1.
    发明授权
    Use of vapor phase deposition to make fused silica articles having titanium dioxide in the surface layer 失效
    使用蒸气相沉积制备在表面层中具有二氧化钛的熔融二氧化硅文章

    公开(公告)号:US3644607A

    公开(公告)日:1972-02-22

    申请号:US3644607D

    申请日:1969-12-18

    CPC classification number: C04B35/14

    Abstract: AN ARTICLE COMPOSED OF A METAL OXIDE HAVING A COMPOSITION OF TOW OR MORE OXIDES THE CONCENTRATION OF WHICH CAN PREFERENTIALLY OR SELECTIVELY BE VARIED THROUGHOUT ITS THICKNESS. THE METHOD FOR MAKING THE ARTICLE INCLUDES VAPOR PAHSE HYDROLYSIS OF A METAL HLAIDE DEPOSITION OF THE RESULTANT METAL OXIDE ONTO A DEPOSITION SURFACE. IN AN EXEMPLARY MODE SILICON DIOXIDE IS DEPOSITED ON A DEPOSITION MANDREL UNTIL A PREDETERMINED THICKNESS IS LAID DOWN. THEREAFTER A MIXTURE OF SILICON DIOXIDE AND TITANIUM DIOXIDE ARE DEPOSITED ON THE PREVIOUSLY BUILT-UP SILICON DIOXIDE LAYER. THE METAL OXIDE ARTICLE THUS FORMED IS A POROUS,AMORPHOUS STRUCTURE. FOR MOST USES THIS STRUCTURE IS THEN SINTERED TO FORM A FUSED METAL OXIDE STRUCTURE. THIS METHOD OF FORMING AN ARTICLE ALLOWS PREFERENTIAL VARIANCE OF THE THERMAL EXPANSION OF A FUSED SILICA CRUCIBLE OR TUBE THROUGHOUT ITS WALL THICKNESS.

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