-
公开(公告)号:US12255216B2
公开(公告)日:2025-03-18
申请号:US17682195
申请日:2022-02-28
Applicant: TOPPAN Inc.
Inventor: Tomohiro Nakagome , Yu Ookubo
IPC: H01L27/146
Abstract: A photoelectric conversion device including a substrate including a charge generation region, a dielectric layer formed on the substrate, and a phase adjustment layer formed on the dielectric layer and having an upper surface and a lower surface. In a cross-sectional view of the photoelectric conversion device, a first plane extends parallel to the substrate in contact with the upper surface of the phase adjustment layer, a second plane is the lower surface of the phase adjustment layer, and the phase adjustment layer is formed such that the reflected light which has entered the first plane perpendicularly to the photoelectric conversion device and travels from the first plane to the second plane has an optical path length that varies depending on a position where the reflected light is incident on the first plane.