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公开(公告)号：US20190230779A1
公开(公告)日：2019-07-25
申请号：US16254140
申请日：2019-01-22
Applicant: Transient Plasma Systems, Inc.
Inventor： Jason M. Sanders , Mark Thomas
Abstract: Systems and methods for increasing the RF power switched into a resonant load by achieving voltage multiplication by means of coupled inductors are provided herein. In one approach, the RF electromagnetic wave achieved by voltage multiplication is used to drive a diode opening switch in order to create a fast rising, unipolar electrical pulse.
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公开(公告)号：US11629860B2
公开(公告)日：2023-04-18
申请号：US16586514
申请日：2019-09-27
Applicant: TRANSIENT PLASMA SYSTEMS, INC.
Inventor： Steve Cronin , William P. Schroeder , Jason M. Sanders , Daniel Singleton , Mark Thomas , Patrick Ford , Martin Adolph Gundersen
Abstract: A method and system to treat emissions (e.g., smoke, particulate, odor, grease) employs a nanosecond high voltage pulse generator, a transient pulsed plasma reactor, and a DC voltage source that supplies a DC bias voltage, preferably a negative DC bias voltage to a conductor of the transient pulsed plasma reactor. The system is used in a scheme that substantially reduces at least particulate matter in emissions streams, for example emissions streams produced during cooking, for instance in commercial charbroiling processes (e.g., cooking of hamburger meat), or from operation of internal combustion engines. Both a reduction in the size distribution and total particulate mass is achieved using the method and system described herein.
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公开(公告)号：US10587188B2
公开(公告)日：2020-03-10
申请号：US16254146
申请日：2019-01-22
Applicant: Transient Plasma Systems, Inc.
Inventor： Jason M. Sanders , Mark Thomas , Patrick Ford
Abstract: Systems and methods for quickly charging a load capacitance to a voltage level that is a multiple of the DC input voltage are provided herein. In one approach, the load capacitance is charged by a voltage multiplication circuit, and the load capacitance is subsequently discharged into a resonant circuit that drives a diode opening switch in order to create a fast rising, unipolar electrical pulse.
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Patent Agency Ranking
公开(公告)号：US20190229615A1
公开(公告)日：2019-07-25
申请号：US16254146
申请日：2019-01-22
Applicant: Transient Plasma Systems, Inc.
Inventor： Jason M. Sanders , Mark Thomas , Patrick Ford
IPC: H02M3/07
Abstract: Systems and methods for quickly charging a load capacitance to a voltage level that is a multiple of the DC input voltage are provided herein. In one approach, the load capacitance is charged by a voltage multiplication circuit, and the load capacitance is subsequently discharged into a resonant circuit that drives a diode opening switch in order to create a fast rising, unipolar electrical pulse.
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公开(公告)号：US11696388B2
公开(公告)日：2023-07-04
申请号：US16861658
申请日：2020-04-29
Applicant: Transient Plasma Systems, Inc.
Inventor： Ryan J. Umstattd , Jason M. Sanders , Mark Thomas , Patrick Ford , Daniel Singleton
IPC: H05H1/24
CPC classification number: H05H1/2418 , H05H1/2406
Abstract: A system for generating and delivering a low temperature, wide, partially ionized tunable plasma stream is described. The system employs a fast rising, repetitive high voltage pulse generator, flowing gas, and a plasma head to produce the described atmospheric pressure plasma stream and its associated active species. The plasma head may have an exit slit with a relatively wide dimension to produce a relative wide plasma stream. Electrodes may be located proximate the exit slit, for example one in an interior of the plasma head via with gas flows toward the exit slit, and the other exterior to the plasma head and offset from the exit slit. The plasma may include baffle material to enhance a uniformity of flow through and across the exit slit. Plasma heads with having exit slit with different widths may be provided as a kit.
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公开(公告)号：US20200023308A1
公开(公告)日：2020-01-23
申请号：US16508069
申请日：2019-07-10
Applicant: TRANSIENT PLASMA SYSTEMS, INC.
Inventor： Steve Cronin , William P. Schroeder , Jason M. Sanders , Daniel Singleton , Mark Thomas , Patrick Ford , Martin Adolph Gundersen
Abstract: A method and system to treat cooking emissions (e.g., smoke) employs a nanosecond high voltage pulse generator and a transient pulsed plasma reactor. The system is used in a scheme that substantially reduces particulate matter produced in commercial charbroiling processes (e.g., cooking of hamburger meat). Both a reduction in the size distribution and total particulate mass is achieved using the method and system described herein.
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公开(公告)号：US11478746B2
公开(公告)日：2022-10-25
申请号：US16508069
申请日：2019-07-10
Applicant: TRANSIENT PLASMA SYSTEMS, INC.
Inventor： Steve Cronin , William P. Schroeder , Jason M. Sanders , Daniel Singleton , Mark Thomas , Patrick Ford , Martin Adolph Gundersen
Abstract: A method and system to treat cooking emissions (e.g., smoke) employs a nanosecond high voltage pulse generator and a transient pulsed plasma reactor. The system is used in a scheme that substantially reduces particulate matter produced in commercial charbroiling processes (e.g., cooking of hamburger meat). Both a reduction in the size distribution and total particulate mass is achieved using the method and system described herein.
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公开(公告)号：US20200025393A1
公开(公告)日：2020-01-23
申请号：US16586514
申请日：2019-09-27
Applicant: TRANSIENT PLASMA SYSTEMS, INC.
Inventor： Steve Cronin , William P. Schroeder , Jason M. Sanders , Daniel Singleton , Mark Thomas , Patrick Ford , Martin Adolph Gundersen
Abstract: A method and system to treat emissions (e.g., smoke, particulate, odor, grease) employs a nanosecond high voltage pulse generator, a transient pulsed plasma reactor, and a DC voltage source that supplies a DC bias voltage, preferably a negative DC bias voltage to a conductor of the transient pulsed plasma reactor. The system is used in a scheme that substantially reduces at least particulate matter in emissions streams, for example emissions streams produced during cooking, for instance in commercial charbroiling processes (e.g., cooking of hamburger meat), or from operation of internal combustion engines. Both a reduction in the size distribution and total particulate mass is achieved using the method and system described herein.
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