Grinding and polishing device
    1.
    发明授权

    公开(公告)号:US11839949B2

    公开(公告)日:2023-12-12

    申请号:US16951850

    申请日:2020-11-18

    CPC classification number: B24B7/07

    Abstract: A grinding and polishing device includes a main body, a grinding disk, a sample disk, a first console, and a second console. The main body includes a support table and a support column. The support table is coupled to the support column. The grinding disk is fixed on the support table and includes a polishing surface. The sample disk is fixed on the support column and configured to hold a preform. The first console is electrically coupled to the sample disk and used for controlling a distance between the preform held by the sample disk and the grinding disk. The second console is electrically coupled to the grinding disk and used for controlling a working state of the grinding disk for grinding and polishing the preform.

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