公开(公告)号：US09006633B2

公开(公告)日：2015-04-14

申请号：US13667048

申请日：2012-11-02

Applicant: U.S. Army Research Laboratory ATTN: RDRL-LOC-I

Inventor： David H Tofsted ,  Sean Gerard O'Brien

IPC: H01L27/00 ,  H04N5/225 ,  G03B7/085 ,  G02B26/00 ,  H04N5/238

CPC classification number: H04N5/357 ,  G02B26/00 ,  G02B26/06 ,  G03B7/085 ,  G06T5/001 ,  H04N5/2254 ,  H04N5/238

Abstract: A method and system for image processing comprising an opening for entrance of light for forming an image by the system; at least one optical element through which the light passes; a variable aperture operatively associated with the at least one optical element placed in the optical train at an image plane and comprising a plurality of settings comprising first mask settings for shielding portions of the light and second mask settings for selectively masking portions of the light that pass through the first mask settings; an imager, the at least one processor being operatively connected to the variable aperture and imager for controlling the passage of the light through the variable aperture by selecting one of plurality of first mask settings and associated second mask settings, obtaining image results using the settings, comparing image results obtained by the respective mask settings, and determining the optimal first mask setting.

Abstract translation: 一种用于图像处理的方法和系统，包括用于由所述系统形成图像的入射光的开口; 光通过的至少一个光学元件; 可变孔径，与在图像平面处放置在光学系列中的至少一个光学元件可操作地相关联，并且包括多个设置，其包括用于屏蔽光的部分的第一掩模设置和用于选择性地掩蔽经过的光的部分的第二掩模设置 通过第一个掩码设置; 成像器，所述至少一个处理器可操作地连接到可变孔径和成像器，用于通过选择多个第一掩模设置和相关联的第二掩模设置中的一个来控制光通过可变孔径的通过，使用该设置获得图像结果， 比较通过各个掩模设置获得的图像结果，以及确定最佳的第一掩模设置。