公开(公告)号：US20250013145A1

公开(公告)日：2025-01-09

申请号：US17971393

申请日：2022-10-21

Applicant: Worcester Polytechnic Institute

Inventor： Pratap Rao ,  John S. Berg ,  Maryam M. Shalmani

IPC: G03F7/00 ,  B41F19/00 ,  H05K3/12

Abstract: Nanoimprint lithography forms a microfeature array on a substrate responsive to inkjet printing techniques for high resolution printing of circuit elements and other features with highly accurate fidelity to predetermined boundaries. The microfeature array is defined by micropillars formed between intersecting microchannels in the substrate. The micropillars are responsive to a sequence of ink droplets in a highly controlled and predictable manner based on the droplet volume, droplet spacing and temperature. The flow of liquid ink is restrained by the micropillars for pinning the ink for avoiding uncontrolled ink flow as occurs on a flat surface. Subsequent layers of deposited ink tend to follow pining of previous layers, allowing an iterative buildup of layers for forming a trace of sufficient thickness and a high aspect ratio allowing traces extending above the depth of the microchannels for aiding communication with surface mount components.