HAIR REMOVER
    91.
    发明申请
    HAIR REMOVER 有权
    头发去除

    公开(公告)号:US20130081277A1

    公开(公告)日:2013-04-04

    申请号:US13600542

    申请日:2012-08-31

    IPC分类号: B26B21/40

    摘要: Hair remover comprises main unit having gripper, head unit having blade for removing hair, and drive unit for driving blade. Direction of extension portion extended from one end is defined as extension direction. Direction in head unit along hair removing direction of blade is defined as first direction. Direction in head unit perpendicular to first direction is defined as second direction. Hair remover comprises rotating mechanical section having rotation center of which axis is perpendicular to extension direction, enabling head unit to rotate around rotation center with respect to main unit, and thereby switching between a state where second direction of head unit is parallel to extension direction and a state where second direction of head unit is perpendicular to extension direction. Drive unit comprises driving source and drive transmission unit transferring a driving force of driving source to head unit in said states.

    摘要翻译: 脱毛器包括具有夹持器的主单元,具有用于去除头发的刀片的头单元和用于驱动刀片的驱动单元。 从一端延伸的延伸部分的方向被定义为延伸方向。 沿着毛发去除方向的头部单元的方向被定义为第一方向。 垂直于第一方向的头单元中的方向被定义为第二方向。 脱毛器包括具有与延伸方向垂直的旋转中心的旋转机械部分,使得头部单元相对于主单元绕旋转中心旋转,从而在头部单元的第二方向平行于延伸方向的状态之间切换,以及 头单元的第二方向垂直于延伸方向的状态。 驱动单元包括在所述状态下将驱动源的驱动力传递到头单元的驱动源和驱动传递单元。

    RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND METHOD OF FORMING RESIST PATTERN
    92.
    发明申请
    RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND METHOD OF FORMING RESIST PATTERN 有权
    负面发展的阻力组成和形成耐力图的方法

    公开(公告)号:US20120264058A1

    公开(公告)日:2012-10-18

    申请号:US13440090

    申请日:2012-04-05

    IPC分类号: G03F7/027 G03F7/20 G03F7/004

    摘要: A resist composition for negative development including a base component (A) which exhibits decreased solubility in an organic solvent under the action of acid and an acid generator component (B) which generates acid upon exposure; and the resist composition used in a method of forming a resist pattern which includes: forming a resist film on a substrate using the resist composition; conducting exposure of the resist film; and patterning the resist film by negative development using a developing solution containing the organic solvent to form a resist pattern, wherein the acid generator component (B) contains an acid generator (B1) that generates an acid having a log P value of 2.7 or less and also a pKa value of at least −3.5.

    摘要翻译: 用于阴性显影的抗蚀剂组合物,包括在酸的作用下在有机溶剂中显示降低的溶解度的碱成分(A)和暴露时产生酸的酸产生剂组分(B); 以及在形成抗蚀剂图案的方法中使用的抗蚀剂组合物,其包括:使用抗蚀剂组合物在基板上形成抗蚀剂膜; 进行抗蚀剂膜的曝光; 并使用含有有机溶剂的显影溶液通过负显影对抗蚀剂膜进行图案化以形成抗蚀剂图案,其中酸产生剂组分(B)含有产生logP值为2.7以下的酸的酸产生剂(B1) 并且pKa值至少为-3.5。

    Resist composition and method of forming resist pattern
    95.
    发明授权
    Resist composition and method of forming resist pattern 有权
    抗蚀剂图案的抗蚀剂组成和方法

    公开(公告)号:US08012669B2

    公开(公告)日:2011-09-06

    申请号:US12400203

    申请日:2009-03-09

    IPC分类号: G03F7/00 G03F7/004

    摘要: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1) shown below (wherein Q1 represents a divalent linkage group containing an oxygen atom; Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent, with the proviso that the carbon atom adjacent to the sulfur atom within the —SO3− group has a fluorine atom bonded thereto; X represents a hydrocarbon group of 3 to 30 carbon atoms which may have a substituent; and A+ represents an organic cation), and the resist composition further including an organic compound (C) which generates an acid exhibiting a weaker acid strength than the acid generated from the acid generator (B1) upon exposure. [Chemical Formula 1] X-Q1-Y1—SO3+A+  (b1)

    摘要翻译: 一种抗蚀剂组合物,其包含在酸的作用下在碱性显影液中溶解度变化的碱成分(A)和曝光时产生酸的酸发生剂成分(B),所述酸发生剂成分(B)含有酸发生剂 (b1)由下述通式(b1)表示的化合物(其中Q1表示含有氧原子的二价连接基团; Y1表示可具有取代基的1〜4个碳原子的氟化亚烷基,条件是 与-SO 3 - 基中的硫原子相邻的碳原子具有氟原子键合; X表示可以具有取代基的碳原子数3〜30的烃基,A +表示有机阳离子),抗蚀剂 组合物还包含有机化合物(C),该有机化合物(C)在曝光时产生的酸强度比酸产生剂(B1)产生的酸弱。 [化学式1] X-Q1-Y1-SO3 + A +(b1)

    Oil Immersed Solenoid
    96.
    发明申请
    Oil Immersed Solenoid 失效
    油浸电磁阀

    公开(公告)号:US20110163617A1

    公开(公告)日:2011-07-07

    申请号:US13063184

    申请日:2009-08-21

    申请人: Hiroaki Shimizu

    发明人: Hiroaki Shimizu

    IPC分类号: H02K41/035

    摘要: An oil immersed solenoid capable of easily and quickly removing air and air bubbles in oil in a space accommodating a movable core and preventing the air and the like from accumulating in the space. In an oil immersed solenoid in which a movable core is accommodated in a space of a tubular second guide so as to be movable in an axial direction of the second guide and the movable core is pulled by a fixed magnetic pole portion provided to be spaced apart from a tip end portion of the second guide, an air accumulation preventing portion is provided between the tip end portion of the second guide and a convex portion of a rear end portion of the fixed magnetic pole portion, and the second guide is made of a magnetic material and the air accumulation preventing portion is made of a non-magnetic material.

    摘要翻译: 一种油浸螺线管,其能够容易且快速地在容纳可动铁芯的空间中除去油中的空气和气泡,并防止空气等积聚在空间中。 在油浸式螺线管中,可动铁芯容纳在管状第二引导件的空间中,以能够在第二引导件的轴向方向上移动,并且可动铁芯被设置成间隔开的固定磁极部分 从第二引导件的末端部分,在第二引导件的末端部分和固定磁极部分的后端部分的凸部之间设置有防止积聚的部分,第二引导件由 磁性材料和防空气部分由非磁性材料制成。

    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    98.
    发明申请
    POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN 有权
    正电阻组合物和形成电阻图案的方法

    公开(公告)号:US20100075249A1

    公开(公告)日:2010-03-25

    申请号:US12447432

    申请日:2007-10-15

    IPC分类号: G03F7/20 G03F7/004

    摘要: A positive resist composition including a resin component (A) which exhibits changed alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a copolymer (A1) containing a structural unit (a1) represented by general formula (II) or a polymer (A2) consisting of a structural unit (a1) represented by general formula (II) (wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure).

    摘要翻译: 一种正型抗蚀剂组合物,其包含在酸作用下表现出碱溶性变化的树脂组分(A)和暴露时产生酸的酸产生剂组分(B),所述树脂组分(A)包含含有结构 由通式(II)表示的单元(a1)或由通式(II)表示的结构单元(a1)组成的聚合物(A2)(其中R表示氢原子,卤素原子,低级烷基或 卤代低级烷基; R 1〜R 3各自独立地表示烷基或氟代烷基,条件是不与氟原子键合到与R1-R3键合的叔碳原子相邻的碳原子上,并且在 R1至R3中的至少一个表示氟化烷基; R2和R3可以形成环结构)。