摘要:
Hair remover comprises main unit having gripper, head unit having blade for removing hair, and drive unit for driving blade. Direction of extension portion extended from one end is defined as extension direction. Direction in head unit along hair removing direction of blade is defined as first direction. Direction in head unit perpendicular to first direction is defined as second direction. Hair remover comprises rotating mechanical section having rotation center of which axis is perpendicular to extension direction, enabling head unit to rotate around rotation center with respect to main unit, and thereby switching between a state where second direction of head unit is parallel to extension direction and a state where second direction of head unit is perpendicular to extension direction. Drive unit comprises driving source and drive transmission unit transferring a driving force of driving source to head unit in said states.
摘要:
A resist composition for negative development including a base component (A) which exhibits decreased solubility in an organic solvent under the action of acid and an acid generator component (B) which generates acid upon exposure; and the resist composition used in a method of forming a resist pattern which includes: forming a resist film on a substrate using the resist composition; conducting exposure of the resist film; and patterning the resist film by negative development using a developing solution containing the organic solvent to form a resist pattern, wherein the acid generator component (B) contains an acid generator (B1) that generates an acid having a log P value of 2.7 or less and also a pKa value of at least −3.5.
摘要:
A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.
摘要:
A resist composition for immersion exposure including: a fluorine-containing polymeric compound (F) containing a structural unit (f1) having a base dissociable group and a structural unit (f2) represented by general formula (f2-1) (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; and W is a group represented by any one of general formulas (w-1) to (w-4)); a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid; and an acid generator component (B) that generates acid upon exposure.
摘要:
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1) shown below (wherein Q1 represents a divalent linkage group containing an oxygen atom; Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms which may have a substituent, with the proviso that the carbon atom adjacent to the sulfur atom within the —SO3− group has a fluorine atom bonded thereto; X represents a hydrocarbon group of 3 to 30 carbon atoms which may have a substituent; and A+ represents an organic cation), and the resist composition further including an organic compound (C) which generates an acid exhibiting a weaker acid strength than the acid generated from the acid generator (B1) upon exposure. [Chemical Formula 1] X-Q1-Y1—SO3+A+ (b1)
摘要:
An oil immersed solenoid capable of easily and quickly removing air and air bubbles in oil in a space accommodating a movable core and preventing the air and the like from accumulating in the space. In an oil immersed solenoid in which a movable core is accommodated in a space of a tubular second guide so as to be movable in an axial direction of the second guide and the movable core is pulled by a fixed magnetic pole portion provided to be spaced apart from a tip end portion of the second guide, an air accumulation preventing portion is provided between the tip end portion of the second guide and a convex portion of a rear end portion of the fixed magnetic pole portion, and the second guide is made of a magnetic material and the air accumulation preventing portion is made of a non-magnetic material.
摘要:
A resin for photoresist compositions is disclosed with excellent resolution and line edge roughness characteristics. A photoresist composition and a method for forming a resist pattern using such a resin are also disclosed. The resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the carbon atom in the α-position to the hydroxyl group has at least one electron attractive group.
摘要:
A positive resist composition including a resin component (A) which exhibits changed alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a copolymer (A1) containing a structural unit (a1) represented by general formula (II) or a polymer (A2) consisting of a structural unit (a1) represented by general formula (II) (wherein R represents a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; each of R1 to R3 independently represents an alkyl group or a fluorinated alkyl group, with the provision that no fluorine atom is bonded to a carbon atom adjacent to the tertiary carbon atom to which R1 to R3 are bonded, and at least one of R1 to R3 represents a fluorinated alkyl group; and R2 and R3 may form a ring structure).
摘要翻译:一种正型抗蚀剂组合物,其包含在酸作用下表现出碱溶性变化的树脂组分(A)和暴露时产生酸的酸产生剂组分(B),所述树脂组分(A)包含含有结构 由通式(II)表示的单元(a1)或由通式(II)表示的结构单元(a1)组成的聚合物(A2)(其中R表示氢原子,卤素原子,低级烷基或 卤代低级烷基; R 1〜R 3各自独立地表示烷基或氟代烷基,条件是不与氟原子键合到与R1-R3键合的叔碳原子相邻的碳原子上,并且在 R1至R3中的至少一个表示氟化烷基; R2和R3可以形成环结构)。
摘要:
A compound represented by general formula (I); and a compound represented by general formula (b1-1).[Chemical Formula 1] X-Q1-Y1—SO3−M+ (I) X-Q1-Y1—SO3−A+ (b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.
摘要:
A compound represented by general formula (I) shown below; and a polymeric compound having a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; A represents a divalent hydrocarbon group of 2 or more carbon atoms which may have a substituent; B represents a divalent hydrocarbon group of 1 or more carbon atoms which may have a substituent; and R2 represents an acid dissociable, dissolution inhibiting group.