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公开(公告)号:US4540520A
公开(公告)日:1985-09-10
申请号:US493981
申请日:1983-05-12
IPC分类号: C07C251/20 , C07C67/00 , C07C241/00 , C07C249/02 , C07C251/22 , G01N33/84 , C07C97/18
CPC分类号: G01N33/84
摘要: A novel compound is disclosed having the structure ##STR1## in which R is lower alkyl and X is halogen or pseudohalogen. Also disclosed in a novel process for preparing the compound which comprises the steps of combining a compound having the structure ##STR2## in which X is a halogen or pseudohalogen, and a compound having the structure ##STR3## in which R is lower alkyl and A is lower alkylidene to produce a first reaction mixture; adjusting the pH of the first reaction mixture to at least about 8 to produce a second reaction mixture; and recovering the compound or its salt from the second reaction mixture.
摘要翻译: 公开了具有结构式(Ⅰ)的新化合物,其中R是低级烷基,X是卤素或假卤素。 还公开了一种制备该化合物的新方法,该方法包括以下步骤:将其中X为卤素或假卤素的结构为“IMAGE”的化合物与其中R为低级结构的化合物 烷基和A是低级亚烷基以产生第一反应混合物; 将第一反应混合物的pH调节至至少约8以产生第二反应混合物; 并从第二反应混合物中回收化合物或其盐。