Low resistance tunneling magnetoresistive sensor with natural oxidized double MgO barrier
    91.
    发明授权
    Low resistance tunneling magnetoresistive sensor with natural oxidized double MgO barrier 有权
    具有自然氧化双MgO阻挡层的低阻隧道磁阻传感器

    公开(公告)号:US08557407B2

    公开(公告)日:2013-10-15

    申请号:US12806164

    申请日:2010-08-06

    IPC分类号: G11B5/39

    摘要: A high performance TMR sensor is fabricated by incorporating a tunnel barrier having a Mg/MgO/Mg configuration. The 4 to 14 Angstroms thick lower Mg layer and 2 to 8 Angstroms thick upper Mg layer are deposited by a DC sputtering method while the MgO layer is formed by a NOX process involving oxygen pressure from 0.1 mTorr to 1 Torr for 15 to 300 seconds. NOX time and pressure may be varied to achieve a MR ratio of at least 34% and a RA value of 2.1 ohm-um2. The NOX process provides a more uniform MgO layer than sputtering methods. The second Mg layer is employed to prevent oxidation of an adjacent ferromagnetic layer. In a bottom spin valve configuration, a Ta/Ru seed layer, IrMn AFM layer, CoFe/Ru/CoFeB pinned layer, Mg/MgO/Mg barrier, CoFe/NiFe free layer, and a cap layer are sequentially formed on a bottom shield in a read head.

    摘要翻译: 通过并入具有Mg / MgO / Mg构型的隧道势垒来制造高性能TMR传感器。 通过DC溅射法沉积4至14埃厚的较低的Mg层和2至8埃厚的上部Mg层,而MgO层通过氧化压力为0.1毫托至1托的NOX工艺形成15至300秒。 可以改变NOX时间和压力以实现至少34%的MR比和2.1ohm-um2的RA值。 NOX工艺提供比溅射方法更均匀的MgO层。 第二Mg层用于防止相邻铁磁层的氧化。 在底部自旋阀结构中,Ta / Ru籽晶层,IrMn AFM层,CoFe / Ru / CoFeB钉扎层,Mg / MgO / Mg阻挡层,CoFe / NiFe自由层和覆盖层依次形成在底部屏蔽 在读头。

    Low resistance tunneling magnetoresistive sensor with natural oxidized double MgO barrier
    92.
    发明授权
    Low resistance tunneling magnetoresistive sensor with natural oxidized double MgO barrier 有权
    具有自然氧化双MgO阻挡层的低阻隧道磁阻传感器

    公开(公告)号:US08337676B2

    公开(公告)日:2012-12-25

    申请号:US12806082

    申请日:2010-08-05

    IPC分类号: C23C14/34

    摘要: A high performance TMR sensor is fabricated by incorporating a tunnel barrier having a Mg/MgO/Mg configuration. The 4 to 14 Angstroms thick lower Mg layer and 2 to 8 Angstroms thick upper Mg layer are deposited by a DC sputtering method while the MgO layer is formed by a NOX process involving oxygen pressure from 0.1 mTorr to 1 Torr for 15 to 300 seconds. NOX time and pressure may be varied to achieve a MR ratio of at least 34% and a RA value of 2.1 ohm-um2. The NOX process provides a more uniform MgO layer than sputtering methods. The second Mg layer is employed to prevent oxidation of an adjacent ferromagnetic layer. In a bottom spin valve configuration, a Ta/Ru seed layer, IrMn AFM layer, CoFe/Ru/CoFeB pinned layer, Mg/MgO/Mg barrier, CoFe/NiFe free layer, and a cap layer are sequentially formed on a bottom shield in a read head.

    摘要翻译: 通过并入具有Mg / MgO / Mg构型的隧道势垒来制造高性能TMR传感器。 通过DC溅射法沉积4至14埃厚的较低的Mg层和2至8埃厚的上部Mg层,而MgO层通过氧化压力为0.1毫托至1托的NOX工艺形成15至300秒。 可以改变NOX时间和压力以实现至少34%的MR比和2.1ohm-um2的RA值。 NOX工艺提供比溅射方法更均匀的MgO层。 第二Mg层用于防止相邻铁磁层的氧化。 在底部自旋阀结构中,Ta / Ru籽晶层,IrMn AFM层,CoFe / Ru / CoFeB钉扎层,Mg / MgO / Mg阻挡层,CoFe / NiFe自由层和覆盖层依次形成在底部屏蔽 在读头。

    Low resistance tunneling magnetoresistive sensor with natural oxidized double MgO barrier
    94.
    发明申请
    Low resistance tunneling magnetoresistive sensor with natural oxidized double MgO barrier 有权
    具有自然氧化双MgO阻挡层的低阻隧道磁阻传感器

    公开(公告)号:US20100320076A1

    公开(公告)日:2010-12-23

    申请号:US12806082

    申请日:2010-08-05

    IPC分类号: C23C14/35

    摘要: A high performance TMR sensor is fabricated by incorporating a tunnel barrier having a Mg/MgO/Mg configuration. The 4 to 14 Angstroms thick lower Mg layer and 2 to 8 Angstroms thick upper Mg layer are deposited by a DC sputtering method while the MgO layer is formed by a NOX process involving oxygen pressure from 0.1 mTorr to 1 Torr for 15 to 300 seconds. NOX time and pressure may be varied to achieve a MR ratio of at least 34% and a RA value of 2.1 ohm-um2. The NOX process provides a more uniform MgO layer than sputtering methods. The second Mg layer is employed to prevent oxidation of an adjacent ferromagnetic layer. In a bottom spin valve configuration, a Ta/Ru seed layer, IrMn AFM layer, CoFe/Ru/CoFeB pinned layer, Mg/MgO/Mg barrier, CoFe/NiFe free layer, and a cap layer are sequentially formed on a bottom shield in a read head.

    摘要翻译: 通过并入具有Mg / MgO / Mg构型的隧道势垒来制造高性能TMR传感器。 通过DC溅射法沉积4至14埃厚的较低的Mg层和2至8埃厚的上部Mg层,而MgO层通过氧化压力为0.1毫托至1托的NOX工艺形成15至300秒。 可以改变NOX时间和压力以实现至少34%的MR比和2.1ohm-um2的RA值。 NOX工艺提供比溅射方法更均匀的MgO层。 第二Mg层用于防止相邻铁磁层的氧化。 在底部自旋阀结构中,Ta / Ru籽晶层,IrMn AFM层,CoFe / Ru / CoFeB钉扎层,Mg / MgO / Mg阻挡层,CoFe / NiFe自由层和覆盖层依次形成在底部屏蔽 在读头。