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173 条记录 (耗时 0.042 秒)

    Tunable scorotron for depositing uniform charge potential
    92.
    发明授权
    Tunable scorotron for depositing uniform charge potential 失效
    用于沉积均匀电荷势的可调式电磁铁

    公开(公告)号：US5324942A

    公开(公告)日：1994-06-28

    申请号：US992512

    申请日：1992-12-17

    申请人： Satchidanand Mishra ,  Edward A. Domm ,  Denis C. Thomas

    发明人： Satchidanand Mishra ,  Edward A. Domm ,  Denis C. Thomas

    IPC分类号： G03G15/02 ,  H01T19/00 ,  H01T19/04

    CPC分类号： H01T19/00 ,  G03G15/0291

    摘要： The present invention is an apparatus for tuning or altering the charge potential limiting effect that a scorotron grid has upon an adjacent charge receiving surface. The scorotron charging apparatus utilizes corona producing means, spaced above the charge retentive surface, for emitting corona ions in response to a high voltage potential applied thereto, and a flexible grid, suspended between said corona producing means and the charge retentive surface in a nonplanar fashion, such that the spacing between said grid and the charge retentive surface is variable along at least one region of said grid.

    摘要翻译： 本发明是一种用于调节或改变遮光栅格对相邻电荷接收表面具有的电荷电位限制效应的装置。 电晕放电装置利用在电荷保持表面上方间隔开的电晕放电装置，用于响应施加到其上的高电压电位而发射电晕离子，以及以非平面方式悬挂在所述电晕产生装置和电荷保持表面之间的柔性栅格 使得所述栅格和电荷保持表面之间的间隔沿所述栅格的至少一个区域是可变的。

    Electrically tunable charging device for depositing uniform charge potential
    93.
    发明授权
    Electrically tunable charging device for depositing uniform charge potential 失效
    用于沉积均匀电荷势的电可调充电装置

    公开(公告)号：US5300986A

    公开(公告)日：1994-04-05

    申请号：US991910

    申请日：1992-12-17

    申请人： Satchidanand Mishra ,  Edward A. Domm ,  Denis C. Thomas

    发明人： Satchidanand Mishra ,  Edward A. Domm ,  Denis C. Thomas

    IPC分类号： G03G15/02

    CPC分类号： G03G15/0266 ,  G03G15/0291

    摘要： The present invention is a charging apparatus capable of electrically tuning or altering, on a relatively local scale, the corona ion current passing between a corona producing device and a charge retentive surface. The charging apparatus, which may be either a corotron or a scorotron, is specifically adapted to apply a uniform charge to a charge retentive surface which characteristically exhibits non-uniform charging behavior. More specifically, the charging apparatus comprises corona producing devices, spaced apart from the charge retentive surface, for emitting a corona ion current, and device, responsive to a bias voltage, for locally altering the corona ion current passing between said corona producing device and the charge retentive surface. In the described embodiments, the ion current altering device includes segmented grids, segmented shields and segmented electrodes, all of which may be maintained at variable bias voltages to produce local variation in the ion current passing to the charge retentive surface.

    摘要翻译： 本发明是一种充电装置，其能够在相对局部的尺度上对通过电晕放电装置和充电保持性表面之间的电晕离子电流进行电调谐或改变。 可以是corotron或scorotron的充电装置特别适用于向特性表现出不均匀充电行为的充电保持性表面施加均匀的电荷。 更具体地，充电装置包括与电荷保持表面间隔开的用于发射电晕离子电流的电晕产生装置，以及响应于偏置电压的装置，用于局部地改变在所述电晕产生装置和所述电晕放电装置之间通过的电晕离子电流 充电保持性表面。 在所描述的实施例中，离子电流改变装置包括分段栅格，分段屏蔽和分段电极，所有这些都可以保持在可变偏置电压，以产生通过电荷保持表面的离子电流的局部变化。

    Process for fabrication of seamless UV cured intermediate transfer belts (ITB)
    94.
    发明授权
    Process for fabrication of seamless UV cured intermediate transfer belts (ITB) 有权
    无缝UV固化中间转印带（ITB）的制造工艺

    公开(公告)号：US09017772B2

    公开(公告)日：2015-04-28

    申请号：US12832322

    申请日：2010-07-08

    申请人： Geoffrey M. T. Foley ,  Jin Wu ,  Satchidanand Mishra ,  Kent J. Evans

    发明人： Geoffrey M. T. Foley ,  Jin Wu ,  Satchidanand Mishra ,  Kent J. Evans

    IPC分类号： C08J7/04 ,  C09D133/14 ,  C09D133/06 ,  C09D133/08 ,  G03G15/16 ,  C09D4/00

    CPC分类号： G03G15/162 ,  C09D4/00 ,  C09D133/06 ,  C09D133/08 ,  C09D133/14

    摘要： Various embodiments provide methods and apparatus for forming intermediate transfer belts (ITBs) by combining a dip-coating process with a UV-curing process. In an embodiment, an ITB substrate can be immersed into a liquid coating composition contained in a dip tank and then withdrawn from the liquid coating composition. When exiting the dip tank, the coated substrate can enter a UV-curing chamber for a UV-curing process. Multiple cycles of dip-coating and UV-curing can be performed such that a desired ITB substrate coating layer thickness can be obtained. After coating the ITB substrate, the UV-cured coating composition can be released from the ITB substrate, wherein the UV-cured coating composition released from the ITB substrate forms the intermediate transfer belt.

    摘要翻译： 各种实施例提供了通过将浸涂工艺与UV固化工艺组合来形成中间转印带（ITB）的方法和装置。 在一个实施方案中，ITB基材可以浸入包含在浸槽中的液体涂料组合物中，然后从液体涂料组合物中取出。 当离开浸渍槽时，涂覆的基材可以进入用于UV固化过程的UV固化室。 可以进行浸涂和UV固化的多个循环，使得可以获得所需的ITB基材涂层厚度。 在涂覆ITB基材之后，UV固化的涂料组合物可以从ITB底物中释放出来，其中从ITB底物释放的UV固化涂料组合物形成中间转印带。