摘要:
A positive photoresist composition having improved sensitivity and resolution, a method of making the composition, and a method for forming a pattern during semiconductor processing using the composition are disclosed. The photoresist composition includes: (i) a photosensitive material obtained by mixing a first photosensitive compound represented by formula (1) and a second photosensitive compound represented by formulae (2a) or (2b); (ii) a resin; and (iii) a solvent. The invention enables the formation of patterns with an exceptional profile due to a high degree of sensitivity and resolution of the photoresist composition.
摘要:
The present invention relates to a method of mass-producing lactoferrin polypeptides from yeast which is resistant to lactoferrin polypeptides. The present invention also provides Pichia strains, especially Pichia pastoris KCTC 0500BP, that are resistant to lactoferrin polypeptides.