公开(公告)号：US07887715B1

公开(公告)日：2011-02-15

申请号：US12643645

申请日：2009-12-21

申请人： Jong Dai Park ,  Jin Hyuk Lim ,  Jung Min Choi ,  Hyun Goo Kong ,  Jae Hyun Kim ,  Hye Jung Park

发明人： Jong Dai Park ,  Jin Hyuk Lim ,  Jung Min Choi ,  Hyun Goo Kong ,  Jae Hyun Kim ,  Hye Jung Park

IPC分类号： C09K13/04

CPC分类号： H01L21/3212 ,  C09G1/02

摘要： Disclosed herein are a chemical mechanical polishing slurry composition for chemical mechanical planarization of metal layers, which comprises a non-ionized, heat-activated nano-catalyst, and a polishing method using the same. The polishing slurry composition comprises: a non-ionized, heat-activated nano-catalyst which releases electrons and holes by energy generated in a chemical mechanical polishing process; an abrasive; and an oxidizing agent. The non-ionized heat-activated nano-catalyst and the abrasive are different from each other, and the non-ionized, heat-activated nano-catalyst is preferably a semiconductor material which releases electrons and holes at a temperature of 10 to 100° C. in an aqueous solution state, more preferably a transition metal silicide selected from the group consisting of CrSi, MnSi, CoSi, ferrosilicon (FeSi), mixtures thereof, and most preferably, a semiconductor material such as nano ferrosilicon. The content of the content of the non-ionized, heat-activated nano-catalyst is 0.00001 to 0.1 wt % based on the total weight of the slurry composition.

摘要翻译： 本文公开了一种用于金属层的化学机械平面化的化学机械抛光浆料组合物，其包含非离子化的热活化纳米催化剂和使用其的抛光方法。 抛光浆料组合物包括：通过在化学机械抛光工艺中产生的能量释放电子和空穴的非电离的热活化纳米催化剂; 研磨剂 和氧化剂。 非电离热活化纳米催化剂和研磨剂彼此不同，非离子化的热活化纳米催化剂优选为在10〜100℃的温度下释放电子和空穴的半导体材料 在水溶液状态下，更优选选自CrSi，MnSi，CoSi，硅铁（FeSi），其混合物，最优选半导体材料如纳米硅铁的过渡金属硅化物。 非离子化的热活化纳米催化剂的含量相对于浆料组合物的总重量为0.00001〜0.1重量％。

公开(公告)号：US20090215156A1

公开(公告)日：2009-08-27

申请号：US11887978

申请日：2006-09-05

申请人： Bong hyun Chung ,  Sang kyu Kim ,  Hye Jung Park

发明人： Bong hyun Chung ,  Sang kyu Kim ,  Hye Jung Park

IPC分类号： C12M1/34 ,  H01L21/3065 ,  C23F1/00 ,  H01L29/02 ,  H01L21/283 ,  H01L29/66 ,  B01J19/00 ,  G01N27/26 ,  G01N27/327 ,  C23F1/32 ,  C23F1/34 ,  C23F1/36 ,  C23F1/40 ,  G03F7/20 ,  G01R29/00

CPC分类号： G01N33/5438 ,  B82Y15/00 ,  C30B29/06 ,  C30B33/10

摘要： The present invention relates to a method of fabricating a nanogap and a nanogap sensor, and to a nanogap and a nanogap sensor fabricated using the method. The present invention relates to a method of fabricating a nanogap and a nanogap sensor, which can be realized by an anisotropic etching using a semiconductor manufacturing process. According to the method of present invention, the nanogap and nanogap sensor can be simply and cheaply produced in large quantities.

摘要翻译： 本发明涉及制造纳米隙和纳米隙传感器的方法，以及使用该方法制造的纳米隙和纳米隙传感器。 本发明涉及一种可以通过使用半导体制造工艺的各向异性蚀刻来实现的纳米隙和纳米隙传感器的制造方法。 根据本发明的方法，可以大量地简单且廉价地生产纳米隙和纳米隙传感器。

公开(公告)号：US20130063022A1

公开(公告)日：2013-03-14

申请号：US13429299

申请日：2012-03-23

申请人： Hye-Jung Park ,  Soon-Ryong Park ,  Woo-Suk Jung ,  Sun-Hwa Kim

发明人： Hye-Jung Park ,  Soon-Ryong Park ,  Woo-Suk Jung ,  Sun-Hwa Kim

IPC分类号： H05B33/12

CPC分类号： H01L51/5275 ,  H01L51/5253 ,  H01L2251/5315 ,  H05B33/04 ,  H05B33/10

摘要： An organic light emitting diode (OLED) display includes: a substrate; an organic light emitting element on the substrate; a thin film encapsulation layer covering the organic light emitting element; and a viewing angle compensation layer on the thin film encapsulation layer, wherein the viewing angle compensation layer corresponding to a pixel of the organic light emitting element has a plurality of sub-viewing angle compensation members. Accordingly, in the organic light emitting diode (OLED) display according to an exemplary embodiment, the viewing angle compensation layer is disposed on the thin film encapsulation layer such that optical characteristic changes such as the luminance change and the color change according to the viewing angle may be minimized or reduced.

摘要翻译： 有机发光二极管（OLED）显示器包括：基板; 基板上的有机发光元件; 覆盖有机发光元件的薄膜封装层; 以及在所述薄膜封装层上的视角补偿层，其中与所述有机发光元件的像素相对应的所述视角补偿层具有多个副视角补偿构件。 因此，在根据示例性实施例的有机发光二极管（OLED）显示器中，视角补偿层设置在薄膜封装层上，使得诸如亮度变化和颜色变化的光学特性根据视角 可以最小化或减少。