利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

20 条记录 (耗时 0.018 秒)

    Method of Controlling Orientation of Domains in Block Copolymer Films
    13.
    发明申请
    Method of Controlling Orientation of Domains in Block Copolymer Films 有权
    控制嵌段共聚物膜中畴的取向的方法

    公开(公告)号：US20090181171A1

    公开(公告)日：2009-07-16

    申请号：US12060516

    申请日：2008-04-01

    申请人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

    发明人： Joy Cheng ,  Ho-Cheol Kim ,  Daniel P. Sanders ,  Linda Sundberg

    IPC分类号： B44C1/22 ,  C08F283/10 ,  B05D5/00

    CPC分类号： C08L63/00 ,  B05D5/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C08F283/10 ,  C08L53/00 ,  C09D125/14 ,  G03F7/0002 ,  G03F7/038 ,  Y10S264/901 ,  Y10S428/91 ,  Y10T428/24942

    摘要： A method of orienting microphase-separated domains is disclosed, comprising applying a composition comprising an orientation control component, and a block copolymer assembly component comprising a block copolymer having at least two microphase-separated domains in which the orientation control component is substantially immiscible with the block copolymer assembly component upon forming a film; and forming a compositionally vertically segregated film on the surface of the substrate from the composition. The orientation control component and block copolymer segregate during film forming to form the compositionally vertically-segregated film on the surface of a substrate, where the orientation control component is enriched adjacent to the surface of the compositionally segregated film adjacent to the surface of the substrate, and the block copolymer assembly is enriched at an air-surface interface.

    摘要翻译： 公开了一种定向微相分离的结构域的方法，包括施加包含取向控制组分的组合物和包含具有至少两个微相分离结构域的嵌段共聚物的嵌段共聚物组合组分，其中取向控制组分与 嵌段共聚物组合物组分; 以及从所述组合物在所述基材的表面上形成组成上垂直分离的膜。 取向控制成分和嵌段共聚物在成膜时分离，在基板表面形成组成垂直分离的膜，其中取向控制成分相邻于与基板表面相邻的组成偏析膜的表面富集， 并且嵌段共聚物组件在空气 - 表面界面处富集。

    Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films
    14.
    发明授权
    Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films 有权
    使用含环氧基的脂环族丙烯酸聚合物作为嵌段共聚物薄膜的取向控制层的方法

    公开(公告)号：US07521090B1

    公开(公告)日：2009-04-21

    申请号：US12060500

    申请日：2008-04-01

    申请人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

    发明人： Joy Cheng ,  Ho-Cheol Kim ,  Charles T. Rettner ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Linda Sundberg

    IPC分类号： B05D5/00

    CPC分类号： B05D5/00 ,  B05D7/14 ,  B05D7/52 ,  C08L53/00 ,  C09D125/14 ,  C09D153/00

    摘要： Disclosed herein is a method of controlling the orientation of microphase-separated domains in a block copolymer film, comprising forming an orientation control layer comprising an epoxy-containing cycloaliphatic acrylic polymer on a surface of a substrate, irradiating and/or heating the substrate to crosslink the orientation control layer, and forming a block copolymer assembly layer comprising block copolymers which form microphase-separated domains, on a surface of the orientation control layer opposite the substrate. The orientation control layer can be selectively cross-linked to expose regions of the substrate, or the orientation control layer can be patterned without removing the layer, to provide selective patterning on the orientation control layer. In further embodiments, bilayer and trilayer imaging schemes are disclosed.

    摘要翻译： 本文公开了一种控制嵌段共聚物膜中微相分离的区域的取向的方法，包括在基材的表面上形成包含含环氧基的脂环族丙烯酸聚合物的取向控制层，照射和/或加热该基材以交联 取向控制层，并且在与衬底相对的取向控制层的表面上形成包含形成微相分离结构域的嵌段共聚物的嵌段共聚物组合层。 取向控制层可以选择性地交联以暴露衬底的区域，或者可以将取向控制层图案化而不去除该层，以在取向控制层上提供选择性图案化。 在另外的实施方案中，公开了双层和三层成像方案。

    Preparation of topcoat compositions and methods of use thereof
    16.
    发明申请
    Preparation of topcoat compositions and methods of use thereof 失效

    公开(公告)号：US20060292484A1

    公开(公告)日：2006-12-28

    申请号：US11159477

    申请日：2005-06-23

    申请人： Hiroshi Ito ,  Linda Sundberg

    发明人： Hiroshi Ito ,  Linda Sundberg

    IPC分类号： G03C1/00

    CPC分类号： G03F7/2041 ,  G03F7/0046 ,  G03F7/11

    摘要： A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from an alcohol is provided. Also provided is a method of forming an image on a photoresist that includes forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.

    Photoresist topcoat for a photolithographic process
    17.
    发明申请
    Photoresist topcoat for a photolithographic process 有权
    光刻面漆，用于光刻工艺

    公开(公告)号：US20060189779A1

    公开(公告)日：2006-08-24

    申请号：US11064871

    申请日：2005-02-24

    申请人： Robert Allen ,  Ratnam Sooriyakumaran ,  Linda Sundberg

    发明人： Robert Allen ,  Ratnam Sooriyakumaran ,  Linda Sundberg

    IPC分类号： C08G77/00

    CPC分类号： C08G77/04 ,  C08G77/045 ,  G03F7/0752 ,  G03F7/11 ,  G03F7/2041

    摘要： A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.

    摘要翻译： 一种组合物，其包含式T m 3的功能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12和Q n M R1，R2，R3其中n等于8,10或12。 官能团包括碱水溶性部分。 官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。

    Immersion topcoat materials with improved performance
    18.
    发明申请
    Immersion topcoat materials with improved performance 有权
    浸渍面漆材料具有改进的性能

    公开(公告)号：US20060188804A1

    公开(公告)日：2006-08-24

    申请号：US11063940

    申请日：2005-02-23

    申请人： Robert Allen ,  Phillip Brock ,  Dario Gil ,  William Hinsberg ,  Carl Larson ,  Linda Sundberg ,  Gregory Wallraff

    发明人： Robert Allen ,  Phillip Brock ,  Dario Gil ,  William Hinsberg ,  Carl Larson ,  Linda Sundberg ,  Gregory Wallraff

    IPC分类号： G03C1/76

    CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

    摘要： A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoroalcohol monomer unit comprising one of the following two structures: wherein n is an integer. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.

    摘要翻译： 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包含至少一种溶剂和在含水碱性显影剂中具有至少3000 /秒的溶解速率的聚合物。 聚合物含有包含以下两种结构之一的六氟醇单体单元：其中n是整数。 面漆材料可以用于光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。 面漆材料优选不溶于水，因此特别适用于使用水作为成像介质的浸渍光刻技术。

    Water castable-water strippable top coats for 193 nm immersion lithography
    19.
    发明申请
    Water castable-water strippable top coats for 193 nm immersion lithography 审中-公开
    可浇注水可剥离的顶涂层，用于193 nm浸没光刻

    公开(公告)号：US20070117040A1

    公开(公告)日：2007-05-24

    申请号：US11284358

    申请日：2005-11-21

    申请人： Phillip Brock ,  Jennifer Cha ,  Dario Gil ,  Carl Larson ,  Linda Sundberg ,  Gregory Wallraff

    发明人： Phillip Brock ,  Jennifer Cha ,  Dario Gil ,  Carl Larson ,  Linda Sundberg ,  Gregory Wallraff

    IPC分类号： G03C1/00

    CPC分类号： G03F7/2041 ,  C09D129/04 ,  C09D131/04 ,  G03F7/11 ,  C08L2666/04

    摘要： A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises a polymer which is sparingly soluble or insoluble in water at a temperature of about 25° C. or below but soluble in water at a temperature of about 60° C. or above. The polymer contains poly vinyl alcohol monomer unit and a poly vinyl acetate or poly vinyl ether monomer unit having the following polymer structure: wherein R is an aliphatic or alicyclic radical; m and n are independently integers, and are the same or different; and p is zero or 1. The topcoat material may be used in lithography processes, wherein the topcoat material is applied on a photoresist layer. The topcoat material is particularly useful in immersion lithography techniques using water as the imaging medium. The topcoat material of the present invention are also useful for immersion lithography employing organic liquid as immersion medium.

    摘要翻译： 公开了一种用于施加在光致抗蚀剂材料上的面漆材料。 面漆材料包括在约25℃或更低的温度下微溶或不溶于水的聚合物，但在约60℃或更高的温度下可溶于水。 聚合物含有聚乙烯醇单体单元和具有以下聚合物结构的聚乙酸乙烯酯或聚乙烯醚单体单元：其中R是脂族或脂环族基团; m和n独立地是整数，并且相同或不同; 并且p为零或1.面漆材料可用于光刻工艺，其中将顶涂层材料施加在光致抗蚀剂层上。 面漆材料在使用水作为成像介质的浸没式光刻技术中特别有用。 本发明的面漆材料也可用于使用有机液体作为浸渍介质的浸渍光刻。

    Topcoat compositions and methods of use thereof
    20.
    发明申请
    Topcoat compositions and methods of use thereof 有权
    面漆组合物及其使用方法

    公开(公告)号：US20060292485A1

    公开(公告)日：2006-12-28

    申请号：US11159946

    申请日：2005-06-23

    申请人： Hiroshi Ito ,  Linda Sundberg

    发明人： Hiroshi Ito ,  Linda Sundberg

    IPC分类号： G03C1/00

    CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/2041

    摘要： A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from the group consisting of α,α,α-trifluorotoluene, 2,2,3,3,4,4,5,5-octafluoropentyl-1,1,2,2-tetrafluoroethyl ether (OFP-TFEE), and a mixture consisting of a hydrophobic alkane and an alcohol is provided. Also provided is method of forming an image on a photoresist that includes forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.

    摘要翻译： 一种面漆组合物，其包含含氟聚合物和选自α，α，α-三氟甲苯，2,2,3,3,4,4,5,5-八氟戊基-1,1， 提供了2,2-四氟乙基醚（OFP-TFEE）和由疏水性烷烃和醇组成的混合物。 还提供了在光致抗蚀剂上形成图像的方法，其包括在衬底上形成光致抗蚀剂; 将面漆组合物，包含至少一种含氟聚合物和浇铸溶剂的面漆组合物涂覆到光致抗蚀剂上; 除去顶涂层组合物的浇铸溶剂，导致在光致抗蚀剂上形成顶涂层材料; 将光致抗蚀剂暴露于辐射，辐射改变暴露于辐射的光致抗蚀剂区域的化学组成，在光致抗蚀剂中形成暴露和未曝光的区域; 并去除i）面漆材料和ii）光致抗蚀剂的曝光区域或光致抗蚀剂的未曝光区域。