Abstract:
A pipeline processor comprises a memory stage arithmetic unit, a data dependence detecting unit and a control unit. The data dependence detecting unit outputs a detection signal to the control unit when it detects the data dependent relationship between a load instruction LD and a subtraction instruction SUB to be executed next thereto. The control unit receives the detection signal to control such that load data to be loaded from a memory unit according to the load instruction LD is inputted to the memory stage arithmetic unit. The memory stage arithmetic unit executes subtraction by using the load data in a memory stage of the subtraction instruction SUB.
Abstract:
The rotary cathode X-ray tube equipment of the present invention is constructed so as to permit radiation of X-ray from all directions with respect to the whole circumference of a subject, and is used for x-ray CT. The equipment of the invention is constructed to prevent an X-ray radiation window 40 of a low strength from being influenced by atmospheric deformations of a vacuum vessel 1 or by machining and assembling errors, for example by using a joint portion disposed between the X-ray radiation window and an inner ring and having both a surface perpendicular to a rotational axis of a rotary member and a cylindrical surface parallel to the rotational axis, a face seal formed on the surface of the joint portion perpendicular to the rotational axis, and an axial seal formed on the cylindrical surface of the joint portion parallel to the rotational axis.
Abstract:
A pyroelectric device is arranged such that a pyroelectric member sensitive to infrared rays is incorporated in a casing composed of a can and a stem made of materials with similar thermal expansion coefficients. A filter for sealing a window hole for introducing infrared rays into the inside of the pyroelectric device is fixed to the window hole by a fusing agent of silver solder. Electrodes are formed on the upper and lower surfaces of the pyroelectric member and are composed of an absorbing electrode portion for absorbing infrared rays and a drawing electrode portion for outputting an electric signal by sensing the infrared rays. The absorbing electrode portion is composed of an infrared ray absorbing material formed in a thin layer. The drawing electrode portion is composed of the same material formed in a layer thicker than that of the absorbing electrode portion. Terminal pins passing through the pyroelectric device for outputting the electric signal are provided with flat collars near the extreme ends of the terminal pins. A printed board for internally processing the electric signals is abutted against the flat collars so that it is stably supported on the terminal pins in parallel with the filter.
Abstract:
A fire detection apparatus discriminates white smoke, black smoke and flame in a protected area based on changing characteristics of optically measured distances. The apparatus includes a distance meter having a light emitter for emitting a pulse of light energy towards a reference object, such as a distant wall, and a light detector for receiving the pulse of light energy reflected from the reference object or any intervening object. A distance to the reference object or the intervening object is determined based on the lapse of time from the emission to the detection of the pulse of light energy. White smoke is deemed detected when the distance measured is less than a reference difference and is substantially free of fluctuations. Black smoke is detected when the distance measured is more than the reference distance and is also substantially free of fluctuations. Flame is detected when the distances measured differ from the reference distance and fluctuates substantially.
Abstract:
A rear projection screen has a viewer's side and a projection side on which the image of a source is projected so that the projected image is visible from the viewer's side through the screen. The rear projection screen has a lenticular lens formed on the viewing side and including a multiplicity of vertically extending lens units each being provided at its both sides with total reflection surfaces. The lenticular lens further includes a multiplicity of horizontally extending lens units which diffuse the light in the vertical direction. The angular field of vision is increased in the horizontal direction by the vertical lens units and also in the vertical direction by the horizontally extending lens units.
Abstract:
In the embodiments of the invention disclosed herein a rear projection screen has a projection surface and a viewing surface with one of the surfaces formed so as to serve as a lens to provide bright stripe portions where the light passes and dark stripe portions where no light passes. Grooves are formed in the viewing surface along the dark stripe portions and thread-like members are disposed in these grooves as light-absorbing means. The lens formed in the screen surface may be formed of lenticules grooves having total reflection surfaces provided on both sides thereof and a Fresnel lens may be provided on the projection side surface. The thread-like members may be self-adhesive and may be disposed under tension in a screen having a curved surface. A diffusion agent and/or a light-absorbing colorant may be mixed into a medium constituting the screen.
Abstract:
The semiconductor device includes a semiconductor substrate, a gate insulating film formed in contact with an upper side of the semiconductor substrate, and a gate electrode formed on the upper side of the gate insulating film and made of metal nitride or metal nitride silicide. A buffer layer for preventing diffusion of nitrogen and silicon is interposed between the gate insulating film and the gate electrode. Preferably, the buffer layer has a thickness of 5 nm or less. In the case where gate electrode contains Ti elements, and the gate insulating film contains Hf elements, the buffer layer preferably contains a titanium film.
Abstract:
To provide a double filtration blood purification apparatus that can be primed while generation of bubbles within each of a separating membrane in both of a blood component separator and a plasma component separator is avoided and also to provide a method of priming such blood purification apparatus. A cleansing liquid introducing passage 19 is provided, which is a passage dedicated to introduce a cleansing liquid P from a cleansing liquid supply source 57 into a plasma component separator 3 and, also, this cleansing liquid introducing passage 19 is provided with a dedicated, third pump 3. When the third and first pumps are driven in normal and reverse directions, respectively, by a controller 50, a sufficient pressure is applied to the cleansing liquid P by the third ump and the cleansing liquid P can be introduced into the plasma component separator 3.
Abstract:
The manufacturing method of the CMOS type semiconductor device which can suppress the boron penetration from the gate electrode of the pMOS transistors to the semiconductor substrate in the case that boron is contained in the gate electrodes, while enabling the improvement in the NBTI lifetime of the pMOS transistors, without degrading the performance of the nMOS transistors, is offered.The manufacturing method of the CMOS type semiconductor device concerning the present invention has the following process steps. Halogen is introduced to the semiconductor substrate of pMOS transistor formation areas. Next, a gate insulating film is formed on the semiconductor substrate of the pMOS transistor formation areas. Next, nitrogen is introduced to the gate insulating film.
Abstract:
The manufacturing method of the CMOS type semiconductor device which can suppress the boron penetration from the gate electrode of the pMOS transistors to the semiconductor substrate in the case that boron is contained in the gate electrodes, while enabling the improvement in the NBTI lifetime of the pMOS transistors, without degrading the performance of the nMOS transistors, is offered. The manufacturing method of the CMOS type semiconductor device concerning the present invention has the following process steps. Halogen is introduced to the semiconductor substrate of pMOS transistor formation areas. Next, a gate insulating film is formed on the semiconductor substrate of the pMOS transistor formation areas. Next, nitrogen is introduced to the gate insulating film.