公开(公告)号：US06740209B2

公开(公告)日：2004-05-25

申请号：US10205604

申请日：2002-07-26

Applicant: Masahiro Shibamoto ,  Shinji Furukawa ,  Tetsuya Endoh ,  Miho Sakai ,  Naoki Watanabe

Inventor： Masahiro Shibamoto ,  Shinji Furukawa ,  Tetsuya Endoh ,  Miho Sakai ,  Naoki Watanabe

IPC: C23C1434

CPC classification number: H01J37/3429 ,  C23C14/352 ,  C23C14/505 ,  H01J37/3408

Abstract: This application discloses a multi-layer film deposition apparatus comprising; plural cathodes comprising targets respectively, a main rotation mechanism for rotating each cathode together, and a substrate holder to hold a substrate onto which a multi-layer film is deposited by sputtering. The targets are arranged at positions where their center axes are on a circumference. The main rotation mechanism rotates the cathodes around the axis in common to the circumference. The substrate is located at a position within an area in view to the direction of the axis. The area is formed of two loci of points on the rotated targets. One of the locus is drawn by the point nearest to the axis, and the other locus is drawn by the point furthest from the axis.

Abstract translation: 本申请公开了一种多层成膜装置，包括： 分别包括靶的多个阴极，用于将每个阴极一起旋转的主旋转机构和用于保持通过溅射沉积多层膜的基板的基板保持器。 目标被布置在其中心轴在圆周上的位置。 主旋转机构将阴极围绕轴线共同旋转到圆周。 基板位于与轴线方向相对的区域内的位置。 该区域由旋转目标上的两个点组成。 其中一个轨迹由最靠近轴的点绘制，另一个轨迹由距离轴最远的点绘制。

公开(公告)号：US06660089B2

公开(公告)日：2003-12-09

申请号：US09772853

申请日：2001-01-31

Applicant: Naoyuki Nozawa ,  Terushige Takeyama ,  Miho Sakai

Inventor： Naoyuki Nozawa ,  Terushige Takeyama ,  Miho Sakai

IPC: B05C1300

CPC classification number: G11B5/8404 ,  C23C14/505 ,  C23C14/568 ,  G11B7/266 ,  G11B11/10582

Abstract: A substrate support mechanism of the present invention, which holds the inner rim of a disc substrate having an opening at its center, comprises: a hollow cylindrical member; a central shaft having a tapered portion disposed in the cylindrical member so as to be axially pushed by a first spring; and a plurality of radially movable members, each of which is pushed inwardly by a second spring and has a click to grip the inner rim; whereby the axial motion of the central shaft is converted by the tapered portion to the radial motion of said radially movable members to grip and release said substrate. A substrate rotation device includes a mechanism for axially moving the cylindrical member; a mechanism for axially moving the central shaft; and a mechanism for rotating the cylindrical member in addition to the substrate support mechanism.

Abstract translation: 本发明的基板支撑机构，其保持在其中心具有开口的盘基片的内缘，包括：中空圆柱形构件; 中心轴，其具有设置在所述圆筒形构件中以由第一弹簧轴向推动的锥形部分; 以及多个可径向移动的构件，每个都由第二弹簧向内推动并且具有夹紧内轮缘的咔嗒声; 由此中心轴的轴向运动通过锥形部分转换成所述可径向移动的部件的径向运动，以夹紧和释放所述基板。1。一种基板旋转装置，包括用于轴向移动所述圆柱形部件的机构; 用于轴向移动中心轴的机构; 以及除了基板支撑机构之外还使圆筒状构件旋转的机构。