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100 条记录 (耗时 0.02 秒)

    Substrate processing apparatus and substrate processing method
    13.
    发明授权
    Substrate processing apparatus and substrate processing method 失效
    基板加工装置及基板处理方法

    公开(公告)号：US06769855B2

    公开(公告)日：2004-08-03

    申请号：US10032528

    申请日：2001-12-27

    申请人： Masayuki Yokomori ,  Osamu Kuroda

    发明人： Masayuki Yokomori ,  Osamu Kuroda

    IPC分类号： B65G6500

    CPC分类号： H01L21/67781 ,  G06F9/4493 ,  Y10S414/138

    摘要： A substrate processing apparatus (1) includes a wafer loading/unloading and arraying part (14) to remove substrates W from a container (C) where a plurality of unprocessed substrates W to be processed are accommodated at regular intervals, substrate arraying part (51a, 51b, 60) for arranging the substrates W having been removed from two containers (C) at the loading/unloading and arraying part (14) at pitches half the pitch to arrange the substrates in the container (C), a processing part (4) for applying a designated process on the substrates (W), a transfer mechanism (17) for transporting the substrates (W) arranged by the substrate array part (51a, 51b, 60) to the processing part (4) and a stand-by part (75) to allow the substrates arranged by the substrate array parts to stand in readiness temporarily.

    摘要翻译： 衬底处理装置（1）包括晶片装载/排出部分（14），用于从要容纳多个待处理的多个未处理衬底W的容器（C）移除衬底W，所述衬底W以规则的间隔被容纳，衬底排列部分（51a ，51b，60），用于将已经从加载/卸载和排列部分（14）两个容器（C）移除的基板W以间距的一半排列，以将基板布置在容器（C）中，处理部分 4），用于在基板（W）上施加指定的处理;传送机构（17），用于将由基板阵列部分（51a，51b，60）布置的基板（W）传送到处理部分（4） - 通过部分（75），以允许由衬底阵列部分布置的衬底临时立即准备就绪。

    Apparatus for and method of transporting substrates to be processed
    15.
    发明授权
    Apparatus for and method of transporting substrates to be processed 失效

    公开(公告)号：US06368040B1

    公开(公告)日：2002-04-09

    申请号：US09251100

    申请日：1999-02-16

    申请人： Katuki Yamasaki ,  Osamu Kuroda ,  Kazuyuki Honda ,  Hiroshi Yamahata

    发明人： Katuki Yamasaki ,  Osamu Kuroda ,  Kazuyuki Honda ,  Hiroshi Yamahata

    IPC分类号： B65H100

    CPC分类号： H01L21/67781 ,  Y10S414/136 ,  Y10S414/137

    摘要： A substrate transporting apparatus includes a wafer transfer arm 10 for carrying a plurality of semiconductor wafers W being processed horizontally, a pitch changer 20 for carrying the wafers W at predetermined intervals vertically and a posture changing device 30 positioned between the wafer transfer arm 10 and the pitch changer 20, for changing the posture of the wafers W to the horizontal and vertical arrangements. The pitch changer 20 includes a first holding part 21A and a second holding part 21B which are adapted so as to elevate relatively to each other. The wafers W are held by either one of the holding parts 21A, 21B at the predetermined intervals. The posture changing device 30 has a pair of holders 31 between which the semiconductor wafers W is interposed. The holders 31 are respectively provided, on their sides opposing each other, with a plurality of holding grooves 32A, 32B for retaining the wafers W independently. With the arrangement, the whole apparatus can be small-sized to improve throughput and yield of products.

    Optical condenser system for light scanning apparatus
    18.
    发明授权
    Optical condenser system for light scanning apparatus 失效
    光学扫描仪用光电聚光系统

    公开(公告)号：US5774250A

    公开(公告)日：1998-06-30

    申请号：US839156

    申请日：1997-04-23

    申请人： Katsumi Shimada ,  Osamu Kuroda

    发明人： Katsumi Shimada ,  Osamu Kuroda

    IPC分类号： G02B26/10 ,  G02B13/00 ,  G02B13/18 ,  G02B26/12 ,  G02B26/08

    CPC分类号： G02B26/125

    摘要： An optical condenser system for a light scanning apparatus includes a first lens which is a single lens formed of plastic and a second lens which is a plano-convex lens formed of glass and convex toward the scanning surface. The first lens is concave toward a deflector of the light scanning apparatus and each side of the first lens is an aspheric surface defined by the following formula (6). The first and second lens satisfying the following formulae (1) to (5) 0.1f.ltoreq.d.sub.0 .ltoreq.0.3f (1) 0.02f.ltoreq.d.sub.2 .ltoreq.0.2f (2) -1.0.times.10.sup.2 /f.sup.3 .ltoreq.a.sub.1 .ltoreq.-1.0/f.sup.3( 3) 5.0.times.10/f.sup.5 .ltoreq.a.sub.2 .ltoreq.5.0.times.10.sup.3 /f.sup.5( 4) -0.3/f.ltoreq.1/f.sub.1 .ltoreq.0.3f (5) z=ch.sup.2 /�1+{1-(1+K)c.sup.2 h.sup.2}.sup.1/2 !+a.sub.1 h.sup.4 +a.sub.2 h.sup.6 +a.sub.3 h.sup.8 +a.sub.4 h.sup.10 ( 6) wherein f represents the focal length (mm) of the whole system, d.sub.0 represents the axial surface separation (mm) between the deflecting point at the deflector and the first lens, d.sub.2 represents the axial surface separation (mm) between the first lens and the second lens and f.sub.1 represents the focal length (mm) of the first lens.

    摘要翻译： 一种用于光扫描装置的光学聚光器系统包括：第一透镜，其是由塑料形成的单个透镜，第二透镜是由玻璃形成并且朝向扫描表面凸出的平凸透镜。 第一透镜对于光扫描装置的偏转器是凹形的，并且第一透镜的每一侧是由下式（6）限定的非球面。 满足以下公式（1）至（5）的第一和第二透镜0.1f

    Exposure apparatus and method for vibration control system
    19.
    发明授权
    Exposure apparatus and method for vibration control system 失效
    振动控制系统的曝光装置和方法

    公开(公告)号：US5737018A

    公开(公告)日：1998-04-07

    申请号：US442204

    申请日：1995-05-16

    申请人： Shuji Shimizu ,  Osamu Kuroda ,  Yasutaka Ito ,  Yoshikazu Takahashi

    发明人： Shuji Shimizu ,  Osamu Kuroda ,  Yasutaka Ito ,  Yoshikazu Takahashi

    IPC分类号： H04N5/232 ,  H04N5/235 ,  H04N5/238

    CPC分类号： H04N5/2327 ,  H04N5/23248 ,  H04N5/23258 ,  H04N5/23274 ,  H04N5/2352

    摘要： An exposure device controls the exposure of an image in a video camera using a vibration control system. The gain of an iris, which receives the image, the gain of an AGC amplifier, which amplifies the sensed image and the gain of an electronic shutter, which controls the speed at which images are sensed; are controlled by driving the iris in a first range indicative of an object illuminance when a hand vibration correcting operation is performed, driving the AGC amplifier in a second range indicative of the object illuminance, and driving the shutter in a third range indicative of the object illuminance.

    摘要翻译： 曝光装置使用振动控制系统控制摄像机中的图像的曝光。 接收图像的虹膜的增益AGC放大器的增益，其放大感测图像和电子快门的增益，其控制图像被感测的速度; 通过在执行手部振动校正操作的情况下在指示对象照度的第一范围内驱动虹膜来控制虹膜，在指示对象照度的第二范围内驱动AGC放大器，并且在指示对象的第三范围内驱动快门 照度。

    Exposing apparatus for performing exposure control corresponding to the luminance level of an object
    20.
    发明授权
    Exposing apparatus for performing exposure control corresponding to the luminance level of an object 失效
    用于执行与物体的亮度水平相对应的曝光控制的曝光装置

    公开(公告)号：US5473374A

    公开(公告)日：1995-12-05

    申请号：US260381

    申请日：1994-06-14

    申请人： Shuji Shimizu ,  Osamu Kuroda ,  Yasutaka Ito ,  Yoshikazu Takahashi

    发明人： Shuji Shimizu ,  Osamu Kuroda ,  Yasutaka Ito ,  Yoshikazu Takahashi

    IPC分类号： H04N5/232 ,  H04N5/235 ,  H04N5/238

    CPC分类号： H04N5/2327 ,  H04N5/23248 ,  H04N5/23258 ,  H04N5/23274 ,  H04N5/2352

    摘要： An exposing apparatus comprises: a lens group to fetch a light from an object; an iris to adjust a light amount from the lens group; an image pickup device to convert the light which passed through the iris into the electric signal; a detecting circuit to detect a luminance signal level from an output signal from the image pickup device; a reference level signal setting circuit to set an exposure control reference value to control the iris; an exposure control reference value modulating circuit to modulate the exposure control reference value when the iris is controlled; and a control circuit to set the exposure control reference value in correspondence to the luminance signal level when an output level of the detecting circuit is larger than a set value.

    摘要翻译： 曝光装置包括：用于从物体取出光的透镜组; 调整透镜组的光量的虹膜; 将通过虹膜的光转换成电信号的图像拾取装置; 检测电路，用于根据来自图像拾取装置的输出信号检测亮度信号电平; 基准电平信号设定电路，设定曝光控制基准值以控制所述光圈; 曝光控制基准值调制电路，用于当所述光圈被控制时调制所述曝光控制基准值; 以及控制电路，用于当检测电路的输出电平大于设定值时，根据亮度信号电平设定曝光控制基准值。