公开(公告)号：US20170256920A1

公开(公告)日：2017-09-07

申请号：US15601400

申请日：2017-05-22

Applicant: PLASMA AIR INTERNATIONAL, INC

Inventor： Lawrence T. Sunshine

IPC: H01T23/00

CPC classification number: H01T23/00

Abstract: The present disclosure is directed to ion generator device supports. An ion generator device support is configured to retain an ion generator device, the ion generator device having a first portion containing exposed electrodes and a second portion, the support includes a first wall, a second wall extending orthogonally from the first wall and a third wall extending orthogonally from the first wall opposed to the second wall, wherein the third wall extends a smaller distance from the first wall than the second wall, wherein the third wall comprises an orthogonal extension section that extends from the edge of the third wall towards the second wall and is substantially parallel to the first wall.

公开(公告)号：US20200062622A1

公开(公告)日：2020-02-27

申请号：US16547202

申请日：2019-08-21

Applicant: PLASMA AIR INTERNATIONAL, INC

Inventor： Charles Linley ,  Lawrence T. Sunshine

IPC: C02F1/58 ,  C02F3/00 ,  C02F1/42

Abstract: Systems for treating air in a wet well are provided. For example, a system comprises a housing with inlet and outlet openings, where the inlet opening is on the bottom wall. The inlet opening is covered by a screen or has a filter installed within or adjacent to the opening. The system further comprising an ionization device configured to generate bi-polar ions within a compartment of the housing and a fan disposed within the compartment. The fan has an air outlet mounted to the wall of a body of the housing orthogonal to the bottom wall, where the air outlet of the fan is aligned with the outlet opening in the wall. Power is supplied from an external power source. The power is selectively connected to at least the ionization device based on a criterion.

公开(公告)号：US10297984B2

公开(公告)日：2019-05-21

申请号：US15822899

申请日：2017-11-27

Applicant: PLASMA AIR INTERNATIONAL, INC

Inventor： Lawrence T. Sunshine

IPC: H01T23/00 ,  H01T19/04

Abstract: The present disclosure is directed to ion generators and their enclosures that include a base, a non-linear wall projecting from the base, a top connected to the non-linear wall a top connected to the non-linear wall, wherein the base, the non-linear wall and the top form a closed space, and at least one ionizing element extending from the enclosure, wherein the at least one ionizing element is configured to receive a voltage capable of producing ions from a power source in the closed space.

公开(公告)号：US20180278028A1

公开(公告)日：2018-09-27

申请号：US15989786

申请日：2018-05-25

Applicant: PLASMA AIR INTERNATIONAL, INC

Inventor： Lawrence T. Sunshine

IPC: H01T23/00

CPC classification number: H01T23/00

Abstract: The present disclosure is directed to ion generator device supports. An ion generator device support is configured to retain an ion generator device, the ion generator device having a first portion containing exposed electrodes and a second portion, the support includes a first wall, a second wall extending orthogonally from the first wall and a third wall extending orthogonally from the first wall opposed to the second wall, wherein the third wall extends a smaller distance from the first wall than the second wall, wherein the third wall comprises an orthogonal extension section that extends from the edge of the third wall towards the second wall and is substantially parallel to the first wall.

公开(公告)号：US09985421B2

公开(公告)日：2018-05-29

申请号：US15824191

申请日：2017-11-28

Applicant: PLASMA AIR INTERNATIONAL, INC

Inventor： Lawrence T. Sunshine

IPC: H01T23/00

CPC classification number: H01T23/00

Abstract: The present disclosure is directed to ion generator device supports. An ion generator device support is configured to retain an ion generator device, the ion generator device having a first portion containing exposed electrodes and a second portion, the support includes a first wall, a second wall extending orthogonally from the first wall and a third wall extending orthogonally from the first wall opposed to the second wall, wherein the third wall extends a smaller distance from the first wall than the second wall, wherein the third wall comprises an orthogonal extension section that extends from the edge of the third wall towards the second wall and is substantially parallel to the first wall.

公开(公告)号：US11018478B2

公开(公告)日：2021-05-25

申请号：US16594633

申请日：2019-10-07

Applicant: PLASMA AIR INTERNATIONAL, INC

Inventor： Lawrence T. Sunshine

IPC: H01T23/00

Abstract: The present disclosure is directed to ion generator device supports. An ion generator device support is configured to retain an ion generator device, the ion generator device having a first portion containing exposed electrodes and a second portion, the support includes a first wall, a second wall extending orthogonally from the first wall and a third wall extending orthogonally from the first wall opposed to the second wall, wherein the third wall extends a smaller distance from the first wall than the second wall, wherein the third wall comprises an orthogonal extension section that extends from the edge of the third wall towards the second wall and is substantially parallel to the first wall.

公开(公告)号：US20180090912A1

公开(公告)日：2018-03-29

申请号：US15824191

申请日：2017-11-28

Applicant: PLASMA AIR INTERNATIONAL, INC

Inventor： Lawrence T. Sunshine

IPC: H01T23/00

CPC classification number: H01T23/00

Abstract: The present disclosure is directed to ion generator device supports. An ion generator device support is configured to retain an ion generator device, the ion generator device having a first portion containing exposed electrodes and a second portion, the support includes a first wall, a second wall extending orthogonally from the first wall and a third wall extending orthogonally from the first wall opposed to the second wall, wherein the third wall extends a smaller distance from the first wall than the second wall, wherein the third wall comprises an orthogonal extension section that extends from the edge of the third wall towards the second wall and is substantially parallel to the first wall.

公开(公告)号：US09660425B1

公开(公告)日：2017-05-23

申请号：US14983846

申请日：2015-12-30

Applicant: PLASMA AIR INTERNATIONAL, INC

Inventor： Lawrence T. Sunshine

IPC: H01T23/00

CPC classification number: H01T23/00

Abstract: The present disclosure is directed to ion generator device supports. An ion generator device support is configured to retain an ion generator device, the ion generator device having a first portion containing exposed electrodes and a second portion, the support includes a first wall, a second wall extending orthogonally from the first wall, a third wall extending orthogonally from the first wall opposed to the second wall, wherein the third wall extends a smaller distance from the first wall than the second wall and a fourth wall extending orthogonally from the second wall, wherein a substantially open cavity is defined by the fourth wall, the second wall and an edge of the third wall, and a substantially closed cavity is defined by the second wall, the first wall and the third wall, and wherein the first portion of the ion generator device is retained within the substantially open cavity.