Electrical device with a retractable plug
    11.
    发明授权
    Electrical device with a retractable plug 失效
    带可伸缩插头的电器

    公开(公告)号:US07494350B1

    公开(公告)日:2009-02-24

    申请号:US12018625

    申请日:2008-01-23

    Applicant: Po-Sheng Lee

    Inventor: Po-Sheng Lee

    CPC classification number: H01R24/68 H01R2103/00

    Abstract: An electrical device with a retractable plug has a body and a plug-moving assembly. The body has a chamber, a partition and a plug. The partition is formed in the chamber, separates the chamber into a plug chamber and an electronics chamber. The plug chamber has a longitudinal sidewall, a slot and an opening. The longitudinal sidewall is disposed parallelly with the partition and has an inner surface. The slot is formed through the longitudinal sidewall. The opening is formed through the end wall. The plug-moving assembly is mounted in the plug chamber and connects to the plug to selectively retract the plug into the plug chamber. Therefore, the plug of the electrical device may be selectively retracted to prevent prong damage, improve safety and aesthetics of design.

    Abstract translation: 具有可伸缩插头的电气装置具有主体和插头移动组件。 身体有一个房间,一个隔板和一个插头。 分隔件形成在腔室中,将腔室分离成塞子室和电子室。 插塞室具有纵向侧壁,槽和开口。 纵向侧壁与隔板平行设置并具有内表面。 槽通过纵向侧壁形成。 开口通过端壁形成。 插头移动组件安装在插塞室中并连接到插头以选择性地将插头缩回到插塞室中。 因此,电气设备的插头可以选择性地缩回以防止插脚损坏,提高设计的安全性和美观性。

    WET CLEANING PROCESS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
    12.
    发明申请
    WET CLEANING PROCESS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME 有权
    湿式清洗方法和使用该方法制造半导体器件的方法

    公开(公告)号:US20080203057A1

    公开(公告)日:2008-08-28

    申请号:US11679677

    申请日:2007-02-27

    Abstract: A wet cleaning process is provided. The wet cleaning process includes at least one first rinse process and a second rinse step. The first rinse step includes rinsing a substrate using deionized water containing CO2, and then draining the water containing CO2 to expose the substrate in an atmosphere of CO2. The second rinse step includes rinsing the substrate using deionized water containing CO2.

    Abstract translation: 提供湿式清洗方法。 湿式清洗方法包括至少一个第一漂洗过程和第二冲洗步骤。 第一冲洗步骤包括使用含有CO 2的去离子水冲洗底物,然后排出含有CO 2的水,以在CO 2气氛中曝光底物 。 第二冲洗步骤包括使用含有CO 2的去离子水漂洗底物。

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