公开(公告)号：US20190283427A1

公开(公告)日：2019-09-19

申请号：US16289152

申请日：2019-02-28

Applicant: Tatsuya SAMESHIMA ,  Hisashi HABASHI ,  Ryota CHIBA

Inventor： Tatsuya SAMESHIMA ,  Hisashi HABASHI ,  Ryota CHIBA

IPC: B41J2/16 ,  B41J2/14 ,  C08L63/00 ,  C08K5/37 ,  C08K5/101 ,  C08K5/3445 ,  C08K5/544

Abstract: A liquid discharge head including: a flow path formation part in which pressure generation chambers are arranged; and a pressure generation unit configured to apply pressure to the pressure generation chambers, wherein the pressure generation unit is formed by joining a vibration unit to the flow path formation part with a resin layer, and wherein the resin layer includes a curable resin composition including (A) an epoxy resin, (B) a polythiol compound, (C) at least one adhesiveness-imparting agent selected from the group consisting of a compound represented by General Formula (1), a titanium compound represented by General Formula (2-1), and a titanium compound represented by General Formula (2-2), and (D) a curing accelerator.

公开(公告)号：US20140375725A1

公开(公告)日：2014-12-25

申请号：US14291478

申请日：2014-05-30

Applicant: Tatsuya Sameshima ,  Shinichi Kakuda ,  Hisashi Habashi ,  Takashi Mori ,  Kaname Morita ,  Daisuke Takagi ,  Hitoshi Usami ,  Tomoyuki Aratani

Inventor： Tatsuya Sameshima ,  Shinichi Kakuda ,  Hisashi Habashi ,  Takashi Mori ,  Kaname Morita ,  Daisuke Takagi ,  Hitoshi Usami ,  Tomoyuki Aratani

IPC: B41J2/14

CPC classification number: B41J2/1433 ,  B41J2/14233 ,  B41J2/1606

Abstract: A liquid ejection head is provided. The liquid ejection head includes a nozzle substrate to eject a droplet of a liquid from a nozzle thereof; a surface treatment layer, which is located on the surface of the nozzle substrate and which is an oxide layer including silicon (Si) and a transition metal capable of forming a passive layer; and an organic liquid repellent layer located on the surface treatment layer.

Abstract translation: 提供液体喷射头。 液体喷射头包括喷嘴基板，用于从喷嘴喷射液滴; 表面处理层，其位于喷嘴基板的表面上，并且是包含硅（Si）和能够形成钝化层的过渡金属的氧化物层; 以及位于表面处理层上的有机液体排斥层。