公开(公告)号：US09279177B2

公开(公告)日：2016-03-08

申请号：US13157220

申请日：2011-06-09

申请人： Yong-Sup Choi ,  Myeng-Woo Nam

发明人： Yong-Sup Choi ,  Myeng-Woo Nam

IPC分类号： H01L33/00 ,  B05C11/10 ,  C23C14/04 ,  C23C14/24 ,  C23C14/50 ,  C23C14/54 ,  C23C14/56

CPC分类号： C23C14/044 ,  C23C14/24 ,  C23C14/50 ,  C23C14/544 ,  C23C14/56

摘要： A thin film deposition apparatus includes: a deposition source for discharging a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source nozzle unit and having a plurality of patterning slits arranged in the first direction; a barrier plate assembly including a plurality of barrier plates that are disposed between the deposition source nozzle unit and the patterning slit sheet in the first direction, the plurality of barrier plates partitioning a deposition space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces; and a capacitive vacuum gauge disposed at a side of the deposition source and configured to measure a pressure inside the deposition source.

摘要翻译： 薄膜沉积设备包括：用于排出沉积材料的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 与沉积源喷嘴单元相对设置并且具有沿着第一方向布置的多个图案化狭缝的图案化缝隙片; 隔离板组件，其包括沿着第一方向设置在所述沉积源喷嘴单元和所述图案化缝隙片之间的多个阻挡板，所述多个阻挡板将所述沉积源喷嘴单元和所述图案化缝隙片之间的沉积空间分隔成为 多个次沉积空间; 以及电容式真空计，其设置在所述沉积源的一侧并且被配置为测量所述沉积源内的压力。

公开(公告)号：US09147557B2

公开(公告)日：2015-09-29

申请号：US13446873

申请日：2012-04-13

申请人： Yong-Sup Choi ,  Myung-Soo Huh

发明人： Yong-Sup Choi ,  Myung-Soo Huh

IPC分类号： C23C14/28 ,  H01J37/32 ,  C23C14/35 ,  H01J37/34

CPC分类号： H01J37/32229 ,  C23C14/352 ,  C23C14/357 ,  H01J37/32275 ,  H01J37/3405

摘要： A sputter device including a plurality of targets having magnetism; a reflector having magnetism and arranged between neighboring targets of the plurality of targets; a wave guide having magnetism and arranged adjacent the targets, the wave guide forming a guide space for guiding microwaves; and a limiter having magnetism and arranged adjacent the wave guide, the limiter forming an electron cyclotron resonance area together with the targets, the reflector, and the wave guide.

摘要翻译： 一种包括具有磁性的多个靶的溅射装置; 具有磁性并布置在所述多个靶的相邻靶之间的反射器; 具有磁性并布置成邻近靶的波导，波导形成用于引导微波的引导空间; 以及具有磁性并且布置成邻近波导的限幅器，限制器与靶，反射器和波导一起形成电子回旋共振区域。

公开(公告)号：US08876975B2

公开(公告)日：2014-11-04

申请号：US12907396

申请日：2010-10-19

申请人： Yong-Sup Choi ,  Kang-ll Lee ,  Chang Mog Jo

发明人： Yong-Sup Choi ,  Kang-ll Lee ,  Chang Mog Jo

IPC分类号： C23C14/02 ,  C23C14/24 ,  C23C16/04 ,  C23C16/448 ,  C23C16/455 ,  H01L21/02 ,  C23C14/04 ,  C23C14/12 ,  C23C14/56

CPC分类号： H01L21/02107 ,  C23C14/04 ,  C23C14/044 ,  C23C14/12 ,  C23C14/24 ,  C23C14/243 ,  C23C14/564 ,  C23C16/04 ,  C23C16/042 ,  C23C16/448 ,  C23C16/4485 ,  C23C16/45563

摘要： A thin film deposition apparatus can be simply applied to produce large-sized display devices on a mass scale and improves manufacturing yield. The thin film deposition apparatus for forming a thin film on a substrate includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; wherein each of the patterning slits includes a plurality of sub-slits.

摘要翻译： 薄膜沉积装置可以简单地应用于大规模生产大尺寸显示装置并提高制造成品率。 用于在基板上形成薄膜的薄膜沉积装置包括：放电沉积材料的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 以及图案化缝隙片，与所述沉积源喷嘴单元相对设置并且包括沿所述第一方向布置的多个图案化狭缝; 其中每个图案化缝隙包括多个子狭缝。

公开(公告)号：US08709161B2

公开(公告)日：2014-04-29

申请号：US12849193

申请日：2010-08-03

申请人： Ji-Sook Oh ,  Yong-Sup Choi ,  Jong-Heon Kim ,  Hee-Cheol Kang ,  Yun-Mi Lee ,  Chang-Mog Jo

发明人： Ji-Sook Oh ,  Yong-Sup Choi ,  Jong-Heon Kim ,  Hee-Cheol Kang ,  Yun-Mi Lee ,  Chang-Mog Jo

IPC分类号： C23C16/00

CPC分类号： H01L51/001 ,  C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  H01L27/3211 ,  H01L51/0011 ,  H01L51/56

摘要： A thin film deposition apparatus and a method of manufacturing an organic light-emitting display device using the thin film deposition apparatus. The thin film deposition apparatus includes a plurality of thin film deposition assemblies, each of which includes: a deposition source that discharges a deposition material; a deposition source nozzle unit that is disposed at a side of the deposition source and includes a plurality of deposition source nozzles; a patterning slit sheet that is disposed opposite to the deposition source nozzle unit and includes a plurality of patterning slits arranged in a first direction; and a barrier plate assembly that is disposed between the deposition source nozzle unit and the patterning slit sheet, in the first direction. The barrier plate assembly includes a plurality of barrier plates that partition a space between the deposition source nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces.

摘要翻译： 一种薄膜沉积设备和使用该薄膜沉积设备制造有机发光显示设备的方法。 薄膜沉积设备包括多个薄膜沉积组件，每个薄膜沉积组件包括：沉积源，其沉积沉积材料; 沉积源喷嘴单元，其设置在所述沉积源的一侧并且包括多个沉积源喷嘴; 图案化缝隙片，其与所述沉积源喷嘴单元相对地设置并且包括沿第一方向布置的多个图案化狭缝; 以及在第一方向上设置在沉积源喷嘴单元和图案化缝隙片之间的阻挡板组件。 阻挡板组件包括将沉积源喷嘴单元和图案化缝隙片之间的空间分隔成多个次沉积空间的多个阻挡板。

公开(公告)号：US08461058B2

公开(公告)日：2013-06-11

申请号：US13244110

申请日：2011-09-23

申请人： Valeriy Prushinskiy ,  Len Kaplan ,  Se-Ho Cheong ,  Won-Sik Hyun ,  Heung-Yeol Na ,  Kyong-Tae Park ,  Byoung-Seong Jeong ,  Yong-Sup Choi

发明人： Valeriy Prushinskiy ,  Len Kaplan ,  Se-Ho Cheong ,  Won-Sik Hyun ,  Heung-Yeol Na ,  Kyong-Tae Park ,  Byoung-Seong Jeong ,  Yong-Sup Choi

IPC分类号： H01L21/469 ,  H01L21/31 ,  H01L21/00 ,  H01L51/30

CPC分类号： C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  C23C14/50 ,  C23C14/568 ,  H01L51/56

摘要： An organic layer deposition apparatus including an electrostatic chuck combined with a substrate so as to fixedly support the substrate. The organic layer deposition apparatus including a receiving surface that has a set curvature for receiving the substrate; a deposition source for discharging a deposition material toward the substrate; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed to face the deposition source nozzle unit, and having a plurality of patterning slits arranged in a second direction perpendicular to the first direction, wherein a cross section of the patterning slit sheet on a plane formed by lines extending in the second direction and a third direction is bent by a set degree, wherein the third direction is perpendicular to the first and second directions.

摘要翻译： 一种有机层沉积设备，包括与基板结合以固定地支撑基板的静电卡盘。 所述有机层沉积设备包括具有用于接收所述基板的设定曲率的接收表面; 用于将沉积材料排向衬底的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 以及图案化缝隙片，其设置成与所述沉积源喷嘴单元相对，并且具有沿垂直于所述第一方向的第二方向布置的多个图案化狭缝，其中所述图案化缝隙片在由在所述第一方向上延伸的线形成的平面上的横截面 第二方向和第三方向弯曲设定度，其中第三方向垂直于第一和第二方向。

公开(公告)号：US20120100644A1

公开(公告)日：2012-04-26

申请号：US13244110

申请日：2011-09-23

申请人： Valeriy Prushinskiy ,  Len Kaplan ,  Se-Ho Cheong ,  Won-Sik Hyun ,  Heung-Yeol Na ,  Kyong-Tae Park ,  Byoung-Seong Jeong ,  Yong-Sup Choi

发明人： Valeriy Prushinskiy ,  Len Kaplan ,  Se-Ho Cheong ,  Won-Sik Hyun ,  Heung-Yeol Na ,  Kyong-Tae Park ,  Byoung-Seong Jeong ,  Yong-Sup Choi

IPC分类号： H01L51/56 ,  C23C16/50

CPC分类号： C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  C23C14/50 ,  C23C14/568 ,  H01L51/56

摘要： An organic layer deposition apparatus including an electrostatic chuck combined with a substrate so as to fixedly support the substrate. The organic layer deposition apparatus including a receiving surface that has a set curvature for receiving the substrate; a deposition source for discharging a deposition material toward the substrate; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed to face the deposition source nozzle unit, and having a plurality of patterning slits arranged in a second direction perpendicular to the first direction, wherein a cross section of the patterning slit sheet on a plane formed by lines extending in the second direction and a third direction is bent by a set degree, wherein the third direction is perpendicular to the first and second directions.

摘要翻译： 一种有机层沉积设备，包括与基板结合以固定地支撑基板的静电卡盘。 所述有机层沉积设备包括具有用于接收所述基板的设定曲率的接收表面; 用于将沉积材料排向衬底的沉积源; 沉积源喷嘴单元，设置在沉积源的一侧，并且包括沿第一方向布置的多个沉积源喷嘴; 以及图案化缝隙片，其设置成与所述沉积源喷嘴单元相对，并且具有沿垂直于所述第一方向的第二方向布置的多个图案化狭缝，其中所述图案化缝隙片在由在所述第一方向上延伸的线形成的平面上的横截面 第二方向和第三方向弯曲设定度，其中第三方向垂直于第一和第二方向。

公开(公告)号：US07196336B2

公开(公告)日：2007-03-27

申请号：US10556226

申请日：2004-04-26

申请人： Kyu Sun Chung ,  Yong Sup Choi ,  Myoung Jae Lee

发明人： Kyu Sun Chung ,  Yong Sup Choi ,  Myoung Jae Lee

IPC分类号： G21K1/08

CPC分类号： H05H1/2406 ,  H05H2001/2443

摘要： An apparatus for injecting plasma in the atmosphere is provided, including a plurality of dielectric panels (13a, 13b, 13c), and 13d, which are disposed in parallel at predetermined intervals, a gas supply portion (14), to which the dielectric panels (13a, 13b, 13c, and 13d) are fixed and which supplies a gas to spaces between the dielectric panels (13a and 13b), between the dielectric panels (13b and 13c), and between the dielectric panels (13c and 13d), power electrodes (15a, 15b, and 15c), which are linearly installed near the gas supply portion (14) and between the dielectric panels (13a and 13b, between the dielectric panels 13b and 13c, and between the dielectric panels 13c and 13d), respectively, ground electrodes (16a, 16b, 16c, and 16d), which are formed in the ends of the dielectric panels (13a, 13b, 13c, and 13d), respectively, and a high frequency generator (17), which applies high frequency power to the power electrodes (15a, 15b, and 15c) and the ground electrodes (16a, 16b, 16c, and 16d).

摘要翻译： 提供了一种用于在大气中注入等离子体的装置，包括以预定间隔平行设置的多个电介质面板（13a，13b，13c）和13d，气体供应部分（14），至 所述电介质面板（13a，13b，13c和13d）被固定并且在所述电介质面板（13b和13c）之间向所述电介质面板（13a和13b）之间的空间供应气体， ，并且在电介质面板（13c和13d）之间，电极电极（15a，15b和15c），线性地安装在气体供应部分（14）附近以及电介质面板（13a和13c）之间 b，在电介质面板13b和13c之间以及电介质面板13c和13d之间d）分别形成在接地电极（16a，16b，16c和16d）的端部 电介质面板（13a，13b，13c，13d）和高频发生器（17），其向功率电极（15A， 15b和15c）和接地电极（16a，16b，16c和16d）。

公开(公告)号：US08486737B2

公开(公告)日：2013-07-16

申请号：US12856942

申请日：2010-08-16

申请人： Yun-Mi Lee ,  Yong-Sup Choi ,  Hyun-Sook Park ,  Jong-Heon Kim ,  Jae-Kwang Ryu ,  Young-Mook Choi

发明人： Yun-Mi Lee ,  Yong-Sup Choi ,  Hyun-Sook Park ,  Jong-Heon Kim ,  Jae-Kwang Ryu ,  Young-Mook Choi

IPC分类号： H01L21/00 ,  H01L21/31 ,  H01L21/469 ,  B05B15/02 ,  B05B15/04 ,  C23C16/00

CPC分类号： C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  H01L27/3244 ,  H01L51/0005 ,  H01L51/56

摘要： A thin film deposition apparatus and a method of manufacturing an organic light-emitting display device by using the same, and more particularly, to a thin film deposition apparatus that can remove a deposition material deposited on a patterning slit sheet without performing an additional cleaning process, and a method of manufacturing an organic light-emitting display device by using the thin film deposition apparatus.

摘要翻译： 一种薄膜沉积装置及其制造方法，更具体地说涉及一种薄膜沉积装置，其能够除去沉积在图案化缝隙片上的沉积材料，而不进行额外的清洁处理 以及使用该薄膜沉积装置制造有机发光显示装置的方法。

公开(公告)号：US20130026035A1

公开(公告)日：2013-01-31

申请号：US13446873

申请日：2012-04-13

申请人： Yong-Sup CHOI ,  Myung-Soo Huh

发明人： Yong-Sup CHOI ,  Myung-Soo Huh

IPC分类号： C23C14/35

CPC分类号： H01J37/32229 ,  C23C14/352 ,  C23C14/357 ,  H01J37/32275 ,  H01J37/3405

摘要： A sputter device including a plurality of targets having magnetism; a reflector having magnetism and arranged between neighboring targets of the plurality of targets; a wave guide having magnetism and arranged adjacent the targets, the wave guide forming a guide space for guiding microwaves; and a limiter having magnetism and arranged adjacent the wave guide, the limiter forming an electron cyclotron resonance area together with the targets, the reflector, and the wave guide.

摘要翻译： 一种包括具有磁性的多个靶的溅射装置; 具有磁性并布置在所述多个靶的相邻靶之间的反射器; 具有磁性并布置成邻近靶的波导，波导形成用于引导微波的引导空间; 以及具有磁性并且布置成邻近波导的限幅器，限制器与靶，反射器和波导一起形成电子回旋共振区域。

公开(公告)号：US08137466B2

公开(公告)日：2012-03-20

申请号：US12862153

申请日：2010-08-24

申请人： Hee-Cheol Kang ,  Hyun-Sook Park ,  Jae-Kwang Ryu ,  Yong-Sup Choi ,  Yun-Mi Lee ,  Sang-Soo Kim

发明人： Hee-Cheol Kang ,  Hyun-Sook Park ,  Jae-Kwang Ryu ,  Yong-Sup Choi ,  Yun-Mi Lee ,  Sang-Soo Kim

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： C23C14/044 ,  C23C14/12 ,  C23C14/243 ,  C23C14/568 ,  H01L51/001 ,  H01L51/0081 ,  H01L51/56 ,  Y10S414/135 ,  Y10T279/23

摘要： A thin film deposition apparatus and an organic light-emitting display device by using the same. The thin film deposition apparatus includes an electrostatic chuck, an a plurality of chambers; at least one thin film deposition assembly; a carrier; a first power source plug; and a second power source plug. The electrostatic chuck includes a body having a supporting surface that contacts a substrate to support the substrate, wherein the substrate is a deposition target; an electrode embedded into the body and applying an electrostatic force to the supporting surface; and a plurality of power source holes formed to expose the electrode and formed at different locations on the body. The plurality of chambers are maintained in a vacuum state. The at least one thin film deposition assembly is located in at least one of the plurality of chambers, is separated from the substrate by a predetermined distance, and is used to form a thin film on the substrate supported by the electrostatic chuck. The carrier is used to move the electrostatic chuck to pass through the plurality of chambers. The first power source plug is installed to be attachable to and detachable from one of the power source holes in order to supply power to the electrode. The first power source plug is installed at an upstream of a path in which the electrostatic chuck is moved by the carrier. The second power source plug is installed to be attachable to and detachable from another of the power source holes in order to supply power to the electrode. The second power source plug is installed in the path to be downstream to the first power source plug with respect to the path.

摘要翻译： 一种薄膜沉积装置和使用该薄膜沉积装置的有机发光显示装置。 薄膜沉积设备包括静电卡盘，多个腔室; 至少一个薄膜沉积组件; 承运人 第一个电源插头; 和第二电源插头。 静电卡盘包括具有与基板接触以支撑基板的支撑表面的主体，其中基板是沉积靶; 电极，其嵌入到所述主体中并向所述支撑表面施加静电力; 以及形成为暴露电极并形成在身体上的不同位置处的多个电源孔。 多个室保持在真空状态。 所述至少一个薄膜沉积组件位于所述多个室中的至少一个室中，与所述衬底分离预定距离，并且用于在由所述静电吸盘支撑的所述衬底上形成薄膜。 载体用于移动静电卡盘以通过多个室。 第一电源插头被安装成可以从电源孔之一附接和拆卸，以向电极供电。 第一电源插头安装在静电卡盘由载体移动的路径的上游。 第二电源插头被安装成可以与另一个电源孔相连接和拆卸，以向电极供电。 第二电源插头安装在相对于路径到第一电源插头的下游的路径中。