公开(公告)号：US09728931B2

公开(公告)日：2017-08-08

申请号：US15035674

申请日：2014-11-27

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich Nikipelov ,  Vadim Yevgenyevich Banine ,  Pieter Willem Herman De Jager ,  Gosse Charles De Vries ,  Olav Waldemar Vladimir Frijns ,  Leonardus Adrianus Gerardus Grimminck ,  Andelko Katalenic ,  Johannes Antonius Gerardus Akkermans ,  Erik Loopstra ,  Wouter Joep Engelen ,  Petrus Rutgerus Bartraij ,  Teis Johan Coenen ,  Wilhelmus Patrick Elisabeth Maria Op'T Root

IPC: H01S3/09 ,  H01J1/34 ,  H05H7/08

CPC classification number: H01S3/0903 ,  H01J1/34 ,  H05H7/08 ,  H05H2007/084

Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.