公开(公告)号：US20210296415A1

公开(公告)日：2021-09-23

申请号：US17057027

申请日：2020-03-17

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Lujiang HUANGFU ,  Xing FAN ,  Hao GAO ,  Hao ZHANG ,  Qiuhua MENG ,  Na LI ,  Yansong LI

IPC: H01L27/32

Abstract: A pixel structure includes: a pixel definition layer having a first side and a second side which are opposite to each other in a thickness direction of the pixel definition layer, the pixel definition layer including a pixel opening having sidewalls; an island-shaped portion disposed in the pixel opening of the pixel definition layer and spaced apart from the sidewalls of the pixel opening, the island-shaped portion having sidewalls, and the sidewalls of the pixel opening and the sidewalls of the island-shaped portion defining a ring-shaped pixel groove; and a light emitting unit, at least a part of which is disposed in the ring-shaped pixel groove.

公开(公告)号：US20200150536A1

公开(公告)日：2020-05-14

申请号：US16424734

申请日：2019-05-29

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Ming LIU ,  Yueping ZUO ,  Qiuhua MENG ,  Chunyang WANG ,  Fei FANG

IPC: G03F7/20 ,  G03F7/004

Abstract: A photoresist and a method of manufacturing photoresist patterns are disclosed. The photoresist includes a plurality of photosensitive units, and each photosensitive unit has magnetism.