Method of calibration for nonlinear optical sensor
    11.
    发明授权
    Method of calibration for nonlinear optical sensor 有权
    非线性光学传感器校准方法

    公开(公告)号:US08076154B2

    公开(公告)日:2011-12-13

    申请号:US12370358

    申请日:2009-02-12

    IPC分类号: G01N21/00

    摘要: A use composition monitor determines the concentration of peracid and/or peroxide in a use composition using a kinetic assay procedure. A sample mixture containing a sample of the use composition, a diluent and at least one reagent is prepared and analyzed using, for example, an optical detector. Response data obtained by the detector is used to determine the concentrations of peracid and/or peroxide in the use composition based upon an evaluation function determined by a calibration method. The calibration method includes determining coefficients of the evaluation function based upon known concentrations, and measured response data of calibration samples.

    摘要翻译: 使用组合物监测器使用动力学测定程序确定使用组合物中过酸和/或过氧化物的浓度。 使用例如光学检测器制备并分析含有使用组合物样品,稀释剂和至少一种试剂的样品混合物。 基于通过校准方法确定的评价函数,使用检测器获得的反应数据用于确定使用组合物中过酸和/或过氧化物的浓度。 校准方法包括基于已知浓度确定评估函数的系数,以及校准样本的测量响应数据。

    Method of treating a composite spin-on glass/anti-reflective material prior to cleaning
    14.
    发明授权
    Method of treating a composite spin-on glass/anti-reflective material prior to cleaning 失效
    在清洁之前处理复合旋涂玻璃/抗反射材料的方法

    公开(公告)号:US07399708B2

    公开(公告)日:2008-07-15

    申请号:US11094939

    申请日:2005-03-30

    申请人: Paul Schilling

    发明人: Paul Schilling

    IPC分类号: H01L21/307 H01L21/461

    摘要: Methods are provided for cleaning a microelectronic device, and one method includes providing a substrate having a patterned SOG/anti-reflective material; performing a process to cure the patterned SOG/anti-reflective material; and performing a cleaning process to remove the cured SOG/anti-reflective material. An apparatus for cleaning a microelectronic device is provided that includes a processing chamber; means for performing a SOG/anti-reflective material curing process within the processing chamber, means for performing a cleaning process within the processing chamber and means for venting the processing chamber.

    摘要翻译: 提供了用于清洁微电子器件的方法,并且一种方法包括提供具有图案化的SOG /抗反射材料的衬底; 执行固化图案化的SOG /抗反射材料的工艺; 并执行清洁处理以除去固化的SOG /抗反射材料。 提供一种用于清洁微电子器件的设备,其包括处理室; 用于在处理室内进行SOG /抗反射材料固化过程的装置,用于在处理室内进行清洁处理的装置和用于排出处理室的装置。