Galvano-micromirror and its manufacture process
    11.
    发明申请
    Galvano-micromirror and its manufacture process 有权
    Galvano-micromirror及其制造工艺

    公开(公告)号:US20010019445A1

    公开(公告)日:2001-09-06

    申请号:US09746291

    申请日:2000-12-20

    Inventor: Satoshi Ueda

    CPC classification number: G02B26/0841

    Abstract: A GALVANO-micromirror includes a first substrate having a light-reflective mirror face on one surface thereof and a first electrode on one or both surface(s) thereof; and a second substrate including a frame-form base, a second electrode located opposedly to the first electrode, a joint holder section located under the mirror face for holding the first substrate, and a torsion bar section located under the mirror face for connecting the frame-form base to the joint holder section and supporting the joint holder section pivotally within a range of angles, wherein a part of a surface of the first substrate on which the mirror face is not formed is joined to the joint holder section of the second substrate.

    Abstract translation: GALVANO微镜包括在其一个表面上具有光反射镜面的第一基底和在其一个或两个表面上的第一电极; 以及第二基板,包括框架形基部,与第一电极相对设置的第二电极,位于用于保持第一基板的镜面下方的接头保持部,以及位于镜面下方的用于连接框架的扭杆部 形成基座并且在一定角度范围内可枢转地支撑接头保持器部分,其中未形成镜面的第一基板的一部分表面接合到第二基板的接头保持部分 。

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