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公开(公告)号：US20080165331A1
公开(公告)日：2008-07-10
申请号：US11987009
申请日：2007-11-26
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707
摘要： A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.
摘要翻译： 公开了一种光刻设备，其包括设置在基板台中的密封件，所述密封件可从打开构造致动至封闭构造，所述封闭构造使得当基板位于所述基板台上时，所述密封件封闭 基板和基板台。
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公开(公告)号：US08138486B2
公开(公告)日：2012-03-20
申请号：US12613846
申请日：2009-11-06
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US08481978B2
公开(公告)日：2013-07-09
申请号：US13083327
申请日：2011-04-08
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G21G5/00
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
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公开(公告)号：US20070114451A1
公开(公告)日：2007-05-24
申请号：US11603228
申请日：2006-11-22
申请人： Hans Jansen , Sebastiaan Maria Cornelissen , Sjoerd Nicolaas Donders , Roelof De Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Hendrikus Leenders , Jeroen Johannes Mertens , Bob Streefkerk , Jan-Gerard Van Der Toorn , Peter Smits , Franciscus Johannes Janssen , Michel Riepen
发明人： Hans Jansen , Sebastiaan Maria Cornelissen , Sjoerd Nicolaas Donders , Roelof De Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Hendrikus Leenders , Jeroen Johannes Mertens , Bob Streefkerk , Jan-Gerard Van Der Toorn , Peter Smits , Franciscus Johannes Janssen , Michel Riepen
IPC分类号： G21G5/00
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US07928407B2
公开(公告)日：2011-04-19
申请号：US11603228
申请日：2006-11-22
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G21K5/10
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US20100044593A1
公开(公告)日：2010-02-25
申请号：US12613846
申请日：2009-11-06
申请人： Hans JANSEN , Sebastian Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelius Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
发明人： Hans JANSEN , Sebastian Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelius Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US20070114452A1
公开(公告)日：2007-05-24
申请号：US11285774
申请日：2005-11-23
申请人： Hans Jansen , Sebastiaan Cornelissen , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Leenders , Jeroen Johannes Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Janssen , Michel Riepen , Bob Streefkerk
发明人： Hans Jansen , Sebastiaan Cornelissen , Sjoerd Donders , Roelof Graaf , Christiaan Hoogendam , Hernes Jacobs , Martinus Leenders , Jeroen Johannes Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Janssen , Michel Riepen , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： Lithographic Apparatus and Device Manufacturing Method In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 平版印刷设备和设备制造方法在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US20110090474A1
公开(公告)日：2011-04-21
申请号：US12980406
申请日：2010-12-29
申请人： Hans JANSEN , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Hans JANSEN , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Bob Streefkerk , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
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公开(公告)号：US07633073B2
公开(公告)日：2009-12-15
申请号：US11285774
申请日：2005-11-23
申请人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
发明人： Hans Jansen , Sebastiaan Maria Johannes Cornelissen , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hernes Jacobs , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Jan-Gerard Cornelis Van Der Toorn , Peter Smits , Franciscus Johannes Joseph Janssen , Michel Riepen , Bob Streefkerk
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/707
摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.
摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。
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公开(公告)号：US09481129B2
公开(公告)日：2016-11-01
申请号：US14000345
申请日：2012-02-07
申请人： Danny Willy August Verheyden , David Donald Erdman , Michael Gurreri , Randall Bobby Paul , Jan Watté , Robert Charles Flaig , Alan Edward Plotts , Michael Aaron Kadar-Kallen , Shelly Anne Buchter , Jan Vandenbroeck , Patrick Billet , Stefano Beri , André Johannes Maria Hilderink , Hernes Jacobs , Petrus Theodorus Rutgers , Petrus Theodorus Krechting , Martijn Johannes Wolbers , Walter Mattheus , Cristian-Radu Radulescu , Paul Vits , Karel Johannes Van Assenbergh , Pieter Cornelis Johan De Jager , Henk Jan Theodoor Van Der Pol
发明人： Danny Willy August Verheyden , David Donald Erdman , Michael Gurreri , Randall Bobby Paul , Jan Watté , Robert Charles Flaig , Alan Edward Plotts , Michael Aaron Kadar-Kallen , Shelly Anne Buchter , Jan Vandenbroeck , Patrick Billet , Stefano Beri , André Johannes Maria Hilderink , Hernes Jacobs , Petrus Theodorus Rutgers , Petrus Theodorus Krechting , Martijn Johannes Wolbers , Walter Mattheus , Cristian-Radu Radulescu , Paul Vits , Karel Johannes Van Assenbergh , Pieter Cornelis Johan De Jager , Henk Jan Theodoor Van Der Pol
CPC分类号： G02B6/3859 , B29C65/02 , B29C65/72 , B29C66/90 , B29D11/00711 , B29D11/00721 , B29K2105/253 , B29K2995/0049 , G02B6/245 , G02B6/2552 , G02B6/3802 , G02B6/3809 , G02B6/3825 , G02B6/3833 , G02B6/3846 , G02B6/3898 , Y10T156/12 , Y10T156/17
摘要： A portable device for attaching a connector to an optical fiber, the optical fiber having an end, the device comprising means for receiving the optical fiber at the end of the optical fiber; and a connector station for autonomously attaching the connector to the optical fiber.
摘要翻译： 一种用于将连接器附接到光纤的便携式设备，所述光纤具有端部，所述设备包括用于在所述光纤端部处接收所述光纤的装置; 以及用于将连接器自主地连接到光纤的连接器站。
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