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公开(公告)号:US20210257303A1
公开(公告)日:2021-08-19
申请号:US17306807
申请日:2021-05-03
Applicant: Intel Corporation
Inventor: Amruthavalli Pallavi ALUR , Sri Ranga Sai BOYAPATI , Robert Alan MAY , Islam A. SALAMA , Robert L. SANKMAN
IPC: H01L23/538 , H01L23/498 , H01L23/00 , H01L25/065 , H01L21/48 , H01L25/00 , H01L25/18 , H01L23/31
Abstract: An embedded multi-die interconnect bridge apparatus and method includes photolithographically formed interconnects coupled to laser-drilled interconnects. Several structures in the embedded multi-die interconnect bridge apparatus exhibit characteristic planarization during fabrication and assembly.
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12.
公开(公告)号:US20200303310A1
公开(公告)日:2020-09-24
申请号:US16889735
申请日:2020-06-01
Applicant: Intel Corporation
Inventor: Amruthavalli Pallavi ALUR , Sri Ranga Sai BOYAPATI , Robert Alan MAY , Islam A. SALAMA , Robert L. SANKMAN
IPC: H01L23/538 , H01L23/498 , H01L23/00 , H01L25/065 , H01L21/48 , H01L25/00 , H01L25/18 , H01L23/31
Abstract: An embedded multi-die interconnect bridge apparatus and method includes photolithographically formed interconnects coupled to laser-drilled interconnects. Several structures in the embedded multi-die interconnect bridge apparatus exhibit characteristic planarization during fabrication and assembly.
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