公开(公告)号：US07691749B2

公开(公告)日：2010-04-06

申请号：US11305368

申请日：2005-12-16

申请人： Karl B. Levy ,  Junghwan Sung ,  Kaihan A. Ashtiani ,  James A. Fair ,  Joshua Collins ,  Juwen Gao

发明人： Karl B. Levy ,  Junghwan Sung ,  Kaihan A. Ashtiani ,  James A. Fair ,  Joshua Collins ,  Juwen Gao

IPC分类号： H01L21/44

CPC分类号： C23C16/4554 ,  C23C16/0272 ,  C23C16/34 ,  C23C16/45531 ,  C23C16/45534 ,  H01L21/28562 ,  H01L21/76843

摘要： Methods for depositing a tungsten nitride layer are described. The methods form a tungsten nitride layer using a carefully controlled deposition technique such as pulsed nucleation layer (PNL). Initially, a tungsten layer is formed on a substrate surface. The tungsten layer is then exposed to a nitriding agent to form a tungsten nitride layer. Methods of forming relatively thick layers of involve repeated cycles of contact with reducing agent, tungsten precursor and nitriding agent. In some cases, the cycle may also include contact with a dopant precursor such as phosphine or arsine.

摘要翻译： 描述了用于沉积氮化钨层的方法。 该方法使用精心控制的沉积技术如脉冲成核层（PNL）形成氮化钨层。 最初，在衬底表面上形成钨层。 然后将钨层暴露于氮化剂以形成氮化钨层。 形成相对较厚层的方法涉及与还原剂钨前体和氮化剂接触的重复循环。 在一些情况下，该循环还可以包括与诸如膦或胂的掺杂剂前体接触。

公开(公告)号：US07014709B1

公开(公告)日：2006-03-21

申请号：US10838443

申请日：2004-05-03

申请人： James A. Fair

发明人： James A. Fair

IPC分类号： C30B25/16

CPC分类号： C23C16/45525 ,  C23C16/16 ,  C23C16/18 ,  C23C16/45542 ,  C23C16/45553

摘要： A CVD method deposits conformal metal layers on small features of a substrate surface. The method includes three principal operations: depositing a thin conformal layer of precursor over some or all of the substrate surface; oxidizing the precursor to convert it to a conformal layer of metal oxide; and reducing some or all of the metal oxide to convert it to a conformal layer of the metal itself. The conformal layer of precursor may form a “monolayer” on the substrate surface. Examples of metals for deposition include copper, cobalt, ruthenium, indium, and rhodium.

摘要翻译： CVD法在衬底表面的小特征上沉积保形金属层。 该方法包括三个主要操作：在一些或所有基板表面上沉积薄的前体前体的共形层; 氧化前体以将其转化成金属氧化物的共形层; 并且还原一些或全部金属氧化物以将其转化为金属本身的共形层。 前体的共形层可以在基底表面上形成“单层”。 用于沉积的金属的实例包括铜，钴，钌，铟和铑。

公开(公告)号：US5741363A

公开(公告)日：1998-04-21

申请号：US621088

申请日：1996-03-22

申请人： Peter C. Van Buskirk ,  James A. Fair ,  David E. Kotecki

发明人： Peter C. Van Buskirk ,  James A. Fair ,  David E. Kotecki

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/00

CPC分类号： C23C16/45565 ,  C23C16/455

摘要： A showerhead disperser device for mixing plural vapor streams, comprising: a housing including front and rear walls in spaced apart relation to one another, and a side wall therebetween, defining within the housing an interior volume; the front wall having a multiplicity of vapor mixture discharge openings therein, for discharging mixed vapor from the interior volume of the housing exteriorly thereof, flow passages joined to the housing for introducing into the interior volume of the housing respective fluids to be mixed therein; and at least one baffle plate mounted in the interior volume of the housing, intermediate the front and rear walls of the housing, the baffle plate having an edge in spaced relation to the side wall to form an annular flow passage therebetween and the baffle plate having at least one of the respective fluids directed thereagainst upon introduction to the interior volume of the housing, for distribution thereof in the interior volume of the housing. The baffled showerhead disperser is usefully employed to enable formation of CVD thin films of highly uniform composition and thickness.

摘要翻译： 一种用于混合多个蒸汽流的喷头分散装置，包括：壳体，其包括彼此间隔开的前壁和后壁以及其间的侧壁，在所述壳体内限定内部容积; 所述前壁在其中具有多个蒸汽混合物排出口，用于从其外部的所述壳体的内部容积排出混合蒸气，流动通道连接到所述壳体，以将待混合的各种流体引入到所述壳体的内部容积中; 以及安装在所述壳体的内部容积中的至少一个挡板，位于所述壳体的前壁和后壁之间，所述挡板具有与所述侧壁间隔开的边缘，以在其间形成环形流动通道，并且所述挡板具有 各个流体中的至少一个在引入壳体的内部空间时被引导到其上，以将其分配在壳体的内部空间中。 挡板式喷头分散机有利地用于形成高度均匀组成和厚度的CVD薄膜。

公开(公告)号：US08864935B2

公开(公告)日：2014-10-21

申请号：US13493655

申请日：2012-06-11

申请人： James A. Fair ,  Vincent Decaux ,  Anirban Guha ,  David Cheung ,  John Keller ,  Peter Jagusch

发明人： James A. Fair ,  Vincent Decaux ,  Anirban Guha ,  David Cheung ,  John Keller ,  Peter Jagusch

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01J37/32449 ,  H01J37/321 ,  H01J37/3244 ,  H01J37/32458 ,  H01J37/32467 ,  H01J37/32633 ,  H01J37/32651 ,  H01J2237/335

摘要： Embodiments of a plasma generator apparatus for ashing a work piece are provided. The apparatus includes a container adapted for continuous gas flow there through from an inlet end to an outlet end thereof. The container is fabricated of a dielectric material and adapted for ionization therein of a portion of at least one component of gas flowing therethrough. A gas flow distributor is configured to direct gas flow to a region within the container and a coil surrounds at least a portion of side walls of the container adjacent the region of the container to which the gas flow distributor directs gas flow. A radio frequency generator is coupled to the coil.

摘要翻译： 提供了用于灰化工件的等离子体发生器装置的实施例。 该装置包括适于在其中从其入口端到其出口端的连续气体流动的容器。 容器由电介质材料制成并且适于其中流过其中的至少一种气体成分的一部分进行电离。 气流分配器构造成将气流引导到容器内的区域，并且线圈围绕容器的与气流分配器引导气体流动的区域相邻的容器侧壁的至少一部分。 射频发生器耦合到线圈。

公开(公告)号：US20080156631A1

公开(公告)日：2008-07-03

申请号：US11616326

申请日：2006-12-27

申请人： James A. Fair ,  Vincent Decaux ,  Anirban Guha ,  David Cheung ,  John Keller ,  Peter Jagusch

发明人： James A. Fair ,  Vincent Decaux ,  Anirban Guha ,  David Cheung ,  John Keller ,  Peter Jagusch

IPC分类号： H05H1/00

CPC分类号： H05H1/46 ,  H01J37/32357 ,  H01J37/32458

摘要： Methods of using a plasma generator to ash a work piece is provided. In an exemplary embodiment, the method includes flowing gas that has a gaseous component able to form plasma under conditions of radio-frequency energy excitation into the container. A proportion of the gas is directed to a first region of the container to form a higher gas density in the first region of the container and a corresponding lower gas density in a second region of the container. Sufficient energy is applied to the gas in at least the first region to excite a proportion of the gaseous component able to form plasma.

摘要翻译： 提供了使用等离子体发生器来灰化工件的方法。 在示例性实施例中，该方法包括使气体具有能够在射频能量激发的条件下形成等离子体的气体成分进入容器。 气体的一部分被引导到容器的第一区域，以在容器的第一区域中形成更高的气体密度，并且在容器的第二区域中形成相应较低的气体密度。 在至少第一区域中对气体施加足够的能量以激发能够形成等离子体的一部分气态组分。

公开(公告)号：US6010748A

公开(公告)日：2000-01-04

申请号：US17384

申请日：1998-02-03

申请人： Peter C. Van Buskirk ,  James A. Fair ,  David E. Kotecki

发明人： Peter C. Van Buskirk ,  James A. Fair ,  David E. Kotecki

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/40

CPC分类号： C23C16/45565 ,  C23C16/455

摘要： A showerhead disperser device for mixing plural vapor streams, comprising: a housing including front and rear walls in spaced apart relation to one another, and a side wall therebetween, defining within the housing an interior volume; the front wall having a multiplicity of vapor mixture discharge openings therein, for discharging mixed vapor from the interior volume of the housing exteriorly thereof, flow passages joined to the housing for introducing into the interior volume of the housing respective fluids to be mixed therein; and at least one baffle plate mounted in the interior volume of the housing, intermediate the front and rear walls of the housing, the baffle plate having an edge in spaced relation to the side wall to form an annular flow passage therebetween and the baffle plate having at least one of the respective fluids directed thereagainst upon introduction to the interior volume of the housing, for distribution thereof in the interior volume of the housing. The baffled showerhead disperser is usefully employed to enable formation of CVD thin films of highly uniform composition and thickness.

摘要翻译： 一种用于混合多个蒸汽流的喷头分散装置，包括：壳体，其包括彼此间隔开的前壁和后壁以及其间的侧壁，在所述壳体内限定内部容积; 所述前壁在其中具有多个蒸汽混合物排出口，用于从其外部的所述壳体的内部容积排出混合蒸气，流动通道连接到所述壳体，以将待混合的各种流体引入到所述壳体的内部容积中; 以及安装在所述壳体的内部容积中的至少一个挡板，位于所述壳体的前壁和后壁之间，所述挡板具有与所述侧壁间隔开的边缘，以在其间形成环形流动通道，并且所述挡板具有 各个流体中的至少一个在引入壳体的内部空间时被引导到其上，以将其分配在壳体的内部空间中。 挡板式喷头分散机有利地用于形成高度均匀组成和厚度的CVD薄膜。

公开(公告)号：US5208643A

公开(公告)日：1993-05-04

申请号：US594528

申请日：1990-10-05

申请人： James A. Fair

发明人： James A. Fair

IPC分类号： C23C14/54 ,  G01J5/00 ,  G01J5/58

CPC分类号： G01J5/08 ,  C23C14/541 ,  G01J5/0846 ,  G01J5/58 ,  G01J2005/0074 ,  G01J5/0007

摘要： The temperature and radiant energy emissivity of a semiconductor substrate or wafer undergoing processing are monitored by combining indications derived from an interferometer and the intensity of radiant energy emitted from the substrate. The radiant energy intensity is detected at adjacent maxima or minima in the intensity of the interference pattern.

摘要翻译： 通过组合来自干涉仪的指示和从衬底发射的辐射能的强度来监测正在进行处理的半导体衬底或晶片的温度和辐射能发射率。 辐射能强度在相邻的最大值或最小值处以干涉图案的强度被检测。

公开(公告)号：US4565157A

公开(公告)日：1986-01-21

申请号：US480030

申请日：1983-03-29

申请人： Daniel L. Brors ,  James A. Fair ,  Kenneth A. Monnig

发明人： Daniel L. Brors ,  James A. Fair ,  Kenneth A. Monnig

IPC分类号： C23C16/42 ,  C23C16/44 ,  C23C16/448 ,  C23C16/458 ,  C23C16/46 ,  C23C16/52 ,  H01L21/28 ,  H01L21/285 ,  C23C11/08

CPC分类号： C23C16/4412 ,  C23C16/42 ,  C23C16/4588

摘要： An apparatus is provided for obtaining very high quality films by chemical vapor deposition in situations where the deposition is mass transport limited. In accordance with the preferred embodiments, there is provided a vacuum housing which is actively cooled to a temperature below which deposition occurs, while at the same time the wafers are being heated to cause deposition at the wafer surfaces. Also provided are mixing chamber systems to ensure that reactant gases are well mixed and distributed evenly over each wafer surface. Mass transport control is further enhanced by provided an exhaust manifold which scavenges reactant gases from locations distributed throughout the system to achieve an even exhaust. Also provided is a method for depositing silicon-rich tungsten silicides using the above apparatus.

摘要翻译： 提供了一种用于通过化学气相沉积获得非常高质量的膜的装置，其中沉积是质量传输受限的。 根据优选实施例，提供了一种真空壳体，其被主动冷却到低于该温度发生的温度，同时晶片被加热以在晶片表面上沉积。 还提供了混合室系统，以确保反应气体在每个晶片表面上均匀地均匀分布。 通过提供排气歧管进一步增强了质量运输控制，排气歧管从分布在整个系统中的位置清除反应气体，以实现均匀的排气。 还提供了使用上述装置沉积富硅的硅化钨的方法。

公开(公告)号：US20080156264A1

公开(公告)日：2008-07-03

申请号：US11616324

申请日：2006-12-27

申请人： James A. Fair ,  Vincent Decaux ,  Anirban Guha ,  David Cheung ,  John Keller ,  Peter Jagusch

发明人： James A. Fair ,  Vincent Decaux ,  Anirban Guha ,  David Cheung ,  John Keller ,  Peter Jagusch

IPC分类号： C23C16/00

CPC分类号： H01J37/32449 ,  H01J37/321 ,  H01J37/3244 ,  H01J37/32458 ,  H01J37/32467 ,  H01J37/32633 ,  H01J37/32651 ,  H01J2237/335

摘要： Embodiments of a plasma generator apparatus for ashing a work piece are provided. The apparatus includes a container adapted for continuous gas flow there through from an inlet end to an outlet end thereof. The container is fabricated of a dielectric material and adapted for ionization therein of a portion of at least one component of gas flowing therethrough. A gas flow distributor is configured to direct gas flow to a region within the container and a coil surrounds at least a portion of side walls of the container adjacent the region of the container to which the gas flow distributor directs gas flow. A radio frequency generator is coupled to the coil.

摘要翻译： 提供了用于灰化工件的等离子体发生器装置的实施例。 该装置包括适于在其中从其入口端到其出口端的连续气体流动的容器。 容器由电介质材料制成并且适于其中流过其中的至少一种气体成分的一部分进行电离。 气流分配器构造成将气流引导到容器内的区域，并且线圈围绕容器的与气流分配器引导气体流动的区域相邻的容器侧壁的至少一部分。 射频发生器耦合到线圈。

公开(公告)号：US07107998B2

公开(公告)日：2006-09-19

申请号：US10687318

申请日：2003-10-16

申请人： Harold F. R. Greer ,  James A. Fair ,  Junghwan Sung ,  Nerissa Sue Draeger

发明人： Harold F. R. Greer ,  James A. Fair ,  Junghwan Sung ,  Nerissa Sue Draeger

IPC分类号： B08B9/00 ,  C23F4/00

CPC分类号： C23G5/00 ,  C23C16/16 ,  C23C16/4405

摘要： Carbon monoxide gas is provided in a ruthenium-deposition apparatus to clean undesired ruthenium-containing deposits from apparatus surfaces. Carbon monoxide gas is mixed with reactant gases in apparatus tubing and in a ruthenium-deposition reaction chamber to inhibit formation of undesired ruthenium deposits on apparatus surfaces and to remove ruthenium deposits.

摘要翻译： 在钌沉积设备中提供一氧化碳气体以从设备表面清洁不需要的含钌沉积物。 一氧化碳气体与设备管道和钌沉积反应室中的反应气体混合，以抑制在设备表面上形成不需要的钌沉积物并除去钌沉积物。