公开(公告)号：US20150004395A1

公开(公告)日：2015-01-01

申请号：US14377003

申请日：2013-02-20

Applicant: KURARAY CO., LTD.

Inventor： Yasuhiro Nonaka ,  Hiroshi Kawai ,  Satoshi Yamakoshi

IPC: B32B15/082 ,  B32B15/08 ,  C23C16/46 ,  B32B5/16

Abstract: An object of the present invention is to provide a vapor-deposited film that enables the formation of a pinhole and/or a crack due to flexure thereof in a processing of the vapor-deposited film such as lamination to be suppressed, and the deterioration of the gas barrier property thereof to be inhibited. The present invention relates to a vapor-deposited film including a substrate film that contains a polyvinyl alcohol polymer, and a metal vapor-deposited layer provided on the substrate film, a mean particle size in the metal vapor-deposited layer as determined using an electron microscope being 150 nm or less. The average thickness of the metal vapor-deposited layer is preferably 30 nm or more and 100 nm or less.

Abstract translation: 本发明的目的是提供一种气相沉积膜，其可以在诸如层压的气相沉积膜的加工中由于其弯曲而形成针孔和/或裂纹，并且可以降低 其阻气性被抑制。 本发明涉及一种气相沉积膜，其包括含有聚乙烯醇聚合物的基底膜和设置在基底膜上的金属气相沉积层，使用电子测定的金属气相沉积层中的平均粒度 显微镜为150nm以下。 金属蒸镀层的平均厚度优选为30nm以上且100nm以下。