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140 条记录 (耗时 0.034 秒)

    Halftone phase shift mask blank, and method of manufacture
    11.
    发明授权
    Halftone phase shift mask blank, and method of manufacture 有权
    半色调相移掩模空白及其制造方法

    公开(公告)号：US07622228B2

    公开(公告)日：2009-11-24

    申请号：US11613780

    申请日：2006-12-20

    申请人： Satoshi Okazaki ,  Toshinobu Ishihara

    发明人： Satoshi Okazaki ,  Toshinobu Ishihara

    IPC分类号： G03F1/00

    CPC分类号： G03F1/32 ,  C23C14/0676 ,  C23C14/08 ,  G03F1/68

    摘要： A halftone phase shift mask blank has a phase shifter film on a transparent substrate. The phase shifter film is composed of a metal silicide compound containing Mo, at least one metal selected from Ta, Zr, Cr and W, and at least one element selected from O, N and C. The halftone phase shift mask blank has improved processability and high resistance to chemicals, especially to alkaline chemicals.

    摘要翻译： 半色调相移掩模板在透明基板上具有移相膜。 移相器膜由含有Mo，选自Ta，Zr，Cr和W中的至少一种金属和选自O，N和C中的至少一种元素的金属硅化物化合物组成。半色调相移掩模毛坯具有改善的加工性 耐化学品，特别是碱性化学品。

    Silicon-containing polymer, resist composition and patterning process
    14.
    发明授权
    Silicon-containing polymer, resist composition and patterning process 失效
    含硅聚合物，抗蚀剂组合物和图案化工艺

    公开(公告)号：US06919161B2

    公开(公告)日：2005-07-19

    申请号：US10611261

    申请日：2003-07-02

    申请人： Jun Hatakeyama ,  Takanobu Takeda ,  Toshinobu Ishihara

    发明人： Jun Hatakeyama ,  Takanobu Takeda ,  Toshinobu Ishihara

    IPC分类号： C08F230/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075

    CPC分类号： C08F230/08 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0758

    摘要： Silicon-containing polymers comprising recurring units of formula (1) are novel wherein R1 is a single bond or alkylene, R2 is hydrogen or alkyl, R3, R4 and R5 are alkyl, haloalkyl, aryl or silicon-containing group, R6 is hydrogen, methyl, cyano or —C(═O)OR8 wherein R8 is hydrogen, alkyl or acid labile group, R7 is alkyl, —NR9R10 or —OR11 wherein R9, R10 and R11 are hydrogen or alkyl, a and b are positive numbers satisfying 0

    摘要翻译： 包含式（1）的重复单元的含硅聚合物是新的，其中R 1是单键或亚烷基，R 2是氢或烷基，R 3 R 4，R 4和R 5是烷基，卤代烷基，芳基或含硅基团，R 6是氢，甲基， 氰基或-C（-O）OR 8，其中R 8为氢，烷基或酸不稳定基团，R 7为烷基，-NR 其中R 9，R 10和R 10和R 11和R 11独立地选自氢， α是氢或烷基，a和b是满足0

    Resist composition and patterning method
    15.
    发明授权
    Resist composition and patterning method 有权
    抗蚀剂组成和图案化方法

    公开(公告)号：US06818148B1

    公开(公告)日：2004-11-16

    申请号：US09401490

    申请日：1999-09-22

    申请人： Satoshi Watanabe ,  Toyohisa Sakurada ,  Yoshitaka Yanagi ,  Shigehiro Nagura ,  Toshinobu Ishihara

    发明人： Satoshi Watanabe ,  Toyohisa Sakurada ,  Yoshitaka Yanagi ,  Shigehiro Nagura ,  Toshinobu Ishihara

    IPC分类号： C09K1300

    CPC分类号： G03F7/0048

    摘要： A resist composition is provided comprising a fluorochemical surfactant which functions to reduce the contact angle of a coating of the resist composition with water or an aqueous base developer as the amount of the fluorochemical surfactant increases. The resist composition forms a coating having a thickness uniformity, free of defects, and wettable with an aqueous base developer when applied onto a substrate, and has a good storage stability in that particles do not increase during storage in solution form.

    摘要翻译： 提供了一种抗蚀剂组合物，其包括含氟化学表面活性剂，其功能是随着含氟表面活性剂的量的增加，抗蚀剂组合物的涂层与水或碱性显影剂水溶液的接触角降低。 抗蚀剂组合物形成具有厚度均匀性，无缺陷的涂层，并且当涂覆在基材上时可用基础显影剂水溶液润湿，并且具有良好的储存稳定性，因为在溶液形式储存期间颗粒不增加。

    Partially hydrogenated polymers and chemically amplified positive resist compositions
    19.
    发明授权
    Partially hydrogenated polymers and chemically amplified positive resist compositions 失效
    部分氢化聚合物和化学增幅阳性抗蚀剂组合物

    公开(公告)号：US6033828A

    公开(公告)日：2000-03-07

    申请号：US12583

    申请日：1998-01-26

    申请人： Junji Shimada ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    发明人： Junji Shimada ,  Osamu Watanabe ,  Satoshi Watanabe ,  Shigehiro Nagura ,  Toshinobu Ishihara

    IPC分类号： C08F8/04 ,  G03F7/004 ,  G03F7/039 ,  G03C1/492 ,  C08F12/08 ,  C08F12/24

    CPC分类号： G03F7/039 ,  C08F8/04 ,  G03F7/0045

    摘要： A polymer comprising recurring units of formula (1) is provided wherein some of the hydrogen atoms of phenolic hydroxyl groups and/or alcoholic hydroxyl groups are replaced by acid labile groups. The polymer is crosslinked within a molecule and/or between molecules with a crosslinking group having a C--O--C linkage resulting from reaction of some of the remaining phenolic hydroxyl groups and/or alcoholic hydroxyl groups with an alkenyl ether compound or halogenated alkyl ether compound. The amount of the acid labile group and the crosslinking group combined is on the average from more than 0 mol % to 80 mol % of the entirety of the phenolic hydroxyl group and alcoholic hydroxyl group. The polymer has Mw of 1,000-500,000. ##STR1## R.sup.1 is H or methyl, R.sup.2 is C.sub.1 -C.sub.8 alkyl, letter x is 0 or a positive integer, y is a positive integer, x+y.ltoreq.5, letters p and q are positive numbers satisfying p+q=1 and 0

    摘要翻译： 提供了包含式（1）的重复单元的聚合物，其中酚羟基和/或醇羟基的一些氢原子被酸不稳定基团取代。 聚合物在分子内和/或分子之间交联，具有由一些残留的酚羟基和/或醇羟基与链烯基醚化合物或卤代烷基醚化合物的反应产生的具有C-O-C键的交联基团。 酸不稳定基团和交联基团的用量平均为全部酚羟基和醇羟基的0摩尔％至80摩尔％以上。 聚合物的Mw为1,000-500,000。 R1是H或甲基，R2是C1-C8烷基，字母x是0或正整数，y是正整数，x + y <5，字母p和q是满足p + q = 1的正数， 0