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185 条记录 (耗时 0.039 秒)

    Fluorinated Diamine and Polymer Made from the Same
    12.
    发明申请
    Fluorinated Diamine and Polymer Made from the Same 有权
    氟化二胺和由其制成的聚合物

    公开(公告)号：US20080221298A1

    公开(公告)日：2008-09-11

    申请号：US11667823

    申请日：2005-12-26

    申请人： Kazuhiro Yamanaka ,  Kazuhiko Maeda

    发明人： Kazuhiro Yamanaka ,  Kazuhiko Maeda

    IPC分类号： C07C229/54 ,  C08G69/02

    CPC分类号： C08G69/32 ,  C07C229/60 ,  C08G69/26 ,  C08G73/1039

    摘要： A fluorine-containing diamine represented by the formula (1), [Chemical Formula 29] is provided. Furthermore, a fluorine-containing polymer is provided by using this fluorine-containing amine as a monomer. The fluorine-containing polymer can exhibit superior characteristics such as low dielectric property and high transparency, while maintaining high fluorine content and retaining adhesive property.

    摘要翻译： 提供由式（1）表示的含氟二胺，[化学式29]。 此外，通过使用该含氟胺作为单体，提供含氟聚合物。 含氟聚合物可以表现出优异的特性，例如低介电性能和高透明度，同时保持高氟含量和保持粘合性能。

    Fluorine-containing compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers, dissolution inhibitors, and resist compositions
    13.
    发明授权
    Fluorine-containing compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers, dissolution inhibitors, and resist compositions 失效
    含氟化合物，含氟可聚合单体，含氟聚合物，溶解抑制剂和抗蚀剂组合物

    公开(公告)号：US07282549B2

    公开(公告)日：2007-10-16

    申请号：US10753071

    申请日：2004-01-08

    申请人： Tadashi Narita ,  Kazuhiko Maeda

    发明人： Tadashi Narita ,  Kazuhiko Maeda

    IPC分类号： C08F118/00

    CPC分类号： C07D319/12 ,  C07C31/44 ,  C07C33/483 ,  C07C43/23 ,  C07C69/65 ,  C07C69/653 ,  C07C69/78 ,  C07C2601/14 ,  C08F16/26 ,  C08F20/28

    摘要： The invention relates to a fluorine-containing compound containing a substituent represented by the formula 1: where R1 is (a) a straight-chain alkylene group, (b) a branched alkylene group, (c) a cyclic structure containing an aromatic ring group or aliphatic cyclic group, or (d) a substituent containing an aromatic ring group and an aliphatic cyclic group, and R1 optionally contains fluorine, another halogen, CN, oxygen, nitrogen, silicon, or alcohol, and R2 is a hydrogen atom, a straight-chain or branched alkyl group, an aromatic group, or a hydrocarbon group optionally containing an aliphatic cyclic group, and R2 optionally contains fluorine, oxygen, nitrogen, carbonyl bond, or alcohol, and a plural number of R2 having different structures are optionally contained in the molecule.

    摘要翻译： 本发明涉及含有式1表示的取代基的含氟化合物：其中R 1是（a）直链亚烷基，（b）支链亚烷基，（c） 含有芳环基或脂肪族环状基团的环状结构，或（d）含有芳香族环基和脂肪族环状基团的取代基，R 1可以含有氟，另外的卤素，CN，氧 氮，硅或醇，R 2是氢原子，直链或支链烷基，芳族基团或任选含有脂肪族环状基团的烃基， SUP> 2 任选地含有氟，氧，氮，羰基键或醇，并且分子中任选地含有多个具有不同结构的R 2 O 2。

    Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation
    14.
    发明授权
    Cyclic fluorine compounds, polymerizable fluoromonomers, fluoropolymers, and resist materials containing the fluoropolymers and method for pattern formation 有权
    含氟聚合物的环状氟化合物，可聚合氟单体，含氟聚合物和抗蚀材料以及图案形成方法

    公开(公告)号：US07232917B2

    公开(公告)日：2007-06-19

    申请号：US10563557

    申请日：2004-07-01

    申请人： Shinichi Sumida ,  Haruhiko Komoriya ,  Kazuhiko Maeda

    发明人： Shinichi Sumida ,  Haruhiko Komoriya ,  Kazuhiko Maeda

    IPC分类号： C07D305/14 ,  C08G65/22 ,  C23F1/42

    CPC分类号： C08F16/26 ,  C07D305/14 ,  C08F12/32 ,  C08F20/30 ,  G03F7/0046 ,  G03F7/0397

    摘要： The present invention provides a fluorine-containing cyclic compound represented by general formula (1): wherein R1 represents a halogen atom, and R2 and R3 each represents hydrogen or a hydrocarbon group. The above-mentioned hydrocarbon group is a straight-chain, branched or cyclic hydrocarbon group having 1 to 25 carbon atoms or an aromatic hydrocarbon group, and may contain a halogen atom, an oxygen atom, a nitrogen atom or a sulfur atom. Further, a fluorine-containing polymerizable monomer derived from the above-mentioned fluorine-containing cyclic compound, a fluorine-containing polymer compound obtained by polymerization or copolymerization using the above-mentioned compound or monomer, further a resist material and a pattern forming process using the above-mentioned polymer compound are also disclosed. According to the invention, there is provided the polymer compound suitable for a resist material having high transparency in a wide wavelength region from an ultraviolet region to a near-infrared light region, high adhesion to a substrate, film forming properties, high etching resistance and a high glass transition point at once, particularly for a photoresist material in a vacuum ultraviolet wavelength region. Further, the pattern forming process using the polymer compound is suitable for the formation of a high-resolution pattern form.

    摘要翻译： 本发明提供由通式（1）表示的含氟环状化合物：其中R 1表示卤素原子，R 2和R 3， / SUP>各自表示氢或烃基。 上述烃基是碳原子数1〜25的直链，支链或环状的烃基或芳香族烃基，可以含有卤素原子，氧原子，氮原子或硫原子。 此外，由上述含氟环状化合物衍生的含氟聚合性单体，使用上述化合物或单体进行聚合或共聚而得到的含氟高分子化合物，进一步具有抗蚀剂材料和使用 还公开了上述高分子化合物。 根据本发明，提供了适用于在从紫外线区域到近红外光区域的宽波长范围内具有高透明度的抗蚀剂材料的高分子化合物，对基片的高粘附性，成膜性，高耐蚀刻性和 一个高玻璃化转变点，特别是在真空紫外波长区域的光致抗蚀剂材料。 此外，使用高分子化合物的图案形成方法适用于形成高分辨率图案形式。

    Process for producing top coat film used in lithography
    15.
    发明申请
    Process for producing top coat film used in lithography 审中-公开
    用于光刻的用于制备面漆的方法

    公开(公告)号：US20070087125A1

    公开(公告)日：2007-04-19

    申请号：US11249603

    申请日：2005-10-14

    申请人： Kazuhiko Maeda ,  Michitaka Ootani ,  Haruhiko Komoriya

    发明人： Kazuhiko Maeda ,  Michitaka Ootani ,  Haruhiko Komoriya

    IPC分类号： B05D1/18 ,  B05D7/00

    CPC分类号： G03F7/11 ,  G03F7/0046 ,  G03F7/2041

    摘要： The present invention relates to a process for producing a top coat film used in a lithography. This process includes the steps of (a) providing a polymer that dissolves in an alkali developing solution, the polymer having in the molecule at least one group that is optionally protected and that is selected from the group consisting of a fluorocarbinol group, a sulfonic group, a fluoroalkylsulfonic group, and a carboxylic group; (b) dissolving the polymer in an organic solvent containing 40 wt % or greater of an alkane, thereby preparing a coating composition; and (c) applying the coating composition to a photoresist film, thereby forming the top coat film on the photoresist film.

    摘要翻译： 本发明涉及一种用于制造用于光刻的面漆的方法。 该方法包括以下步骤：（a）提供溶解在碱性显影溶液中的聚合物，所述聚合物在分子中具有至少一个任选保护的基团，并且选自氟代甲醇基，磺酸基 ，氟烷基磺酸基和羧基; （b）将聚合物溶解在含有40重量％以上的烷烃的有机溶剂中，由此制备涂料组合物; 和（c）将涂料组合物涂布到光致抗蚀剂膜上，从而在光致抗蚀剂膜上形成顶涂层。

    Apparatus having a cooling device
    16.
    发明授权
    Apparatus having a cooling device 有权
    具有冷却装置的装置

    公开(公告)号：US07170000B2

    公开(公告)日：2007-01-30

    申请号：US10387724

    申请日：2003-03-13

    申请人： Kazuhiko Maeda ,  Hiroaki Agata

    发明人： Kazuhiko Maeda ,  Hiroaki Agata

    IPC分类号： H01L35/00

    CPC分类号： G06F1/203 ,  G06F1/206 ,  H01L23/38 ,  H01L35/30 ,  H01L2924/0002 ,  Y02D10/16 ,  H01L2924/00

    摘要： Apparatus having a cooling device capable of both power generation using heat from a heat-generating component and cooling of the heat-generating component is provided. The cooling device has a heat-receiving part which receives heat conducted from a CPU, which is an external heat-generating component, a thermoelectric conversion part arranged to absorb heat from the heat-receiving part and having operating modes including a mode of cooling the heat-receiving part by being supplied with a current and a power generation mode of converting heat received from the heat-receiving part into a current and outputting the current, and a selecting part which makes a selection according to a temperature condition of the CPU as to in which one of the modes the thermoelectric conversion part should be operated.

    摘要翻译： 提供一种具有能够使用来自发热部件的热量的发电和发热部件的冷却的冷却装置的装置。 冷却装置具有受热部，该受热部从作为外部发热部的CPU接收热量，热电转换部配置成从受热部吸收热量，具有包括冷却方式的运转模式 通过提供将从受热部接收的热量转换成电流并输出电流的电流和发电模式，以及根据CPU的温度条件进行选择的选择部分作为热接收部分 其中热电转换部件应该被操作的模式之一。