公开(公告)号：US09166387B2

公开(公告)日：2015-10-20

申请号：US13819929

申请日：2011-07-28

申请人： Hiroyuki Murakoshi ,  Takahiro Abe

发明人： Hiroyuki Murakoshi ,  Takahiro Abe

IPC分类号： H02G3/04 ,  F16L3/10 ,  B60R16/02 ,  H02G3/32

CPC分类号： H02G3/0406 ,  B60R16/0215 ,  F16L3/1025 ,  H02G3/0418 ,  H02G3/32

摘要： An object is to mount a harness protector on a circular-sectional-shaped reinforcing member stably in a space-saving manner. A protector into which a wiring harness is inserted is arranged on a top portion of a circular-sectional-shaped horizontal reinforcing member at a vehicle side along a longitudinal direction of the reinforcing member. A curved bottom surface formed on a bottom of the protector is engaged with a curved top surface of the reinforcing member. A locking clamp projected from the bottom is engaged with a hole of the reinforcing member. A notch portion communicated with the curved bottom surface and a bracket positioned at an upper side of the notch portion are provided on a sidewall of the protector. A receiving bracket of the reinforcing member is engaged with the notch portion, and the bracket is screwed and fixed to the receiving bracket. A bottom surface of a ground terminal is exposed in a bottom surface of the bracket, and the bottom surface of the ground terminal abuts on the conductive receiving bracket at the same time as the bracket is screwed and fixed.

摘要翻译： 目的是以节省空间的方式稳定地将线束保护器安装在圆形截面形状的加强构件上。 沿着加强构件的长度方向在车辆侧的圆形截面形状的水平加强构件的顶部上布置有插入线束的保护器。 形成在保护器的底部上的弯曲的底部表面与加强构件的弯曲的顶部表面接合。 从底部突出的锁定夹与加强构件的孔接合。 与弯曲底面连通的切口部分和位于切口部分上侧的支架设置在保护器的侧壁上。 加强构件的接收托架与切口部接合，并且托架被螺纹固定到接收托架。 接地端子的底面暴露在支架的底面，接地端子的底面与支架螺纹固定的同时靠在导电接收支架上。

公开(公告)号：USD591924S1

公开(公告)日：2009-05-05

申请号：US29300495

申请日：2008-04-02

申请人： Takahiro Abe

设计人： Takahiro Abe

公开(公告)号：US07015655B2

公开(公告)日：2006-03-21

申请号：US10478506

申请日：2002-05-20

申请人： Takeshi Kamoi ,  Minoru Maehara ,  Masanori Mishima ,  Takahiro Abe

发明人： Takeshi Kamoi ,  Minoru Maehara ,  Masanori Mishima ,  Takahiro Abe

IPC分类号： G05F1/00

CPC分类号： H05B41/3928 ,  H05B41/2883 ,  H05B41/2888 ,  H05B41/3922 ,  Y02B20/202 ,  Y10S315/05

摘要： An electronic ballast for a discharge lamp is capable of dimming the lamp over a wide range, yet minimizing a color temperature deviation. The ballast includes a power converter which converts an input DC voltage into a lamp power for driving the lamp, and a dimmer providing a dimmer command of a varying dimming ratio in order to reduce the lamp power to a greater extent as the dimming ratio decreases. A controller controls the power converter to supply a high frequency AC current to the lamp in response to the dimming ratio decreasing to a predetermined level, and to reduce an RMS value of the high frequency AC current as the dimming ratio decreases past the predetermined level.

摘要翻译： 用于放电灯的电子镇流器能够在宽范围内对灯进行调光，同时最小化色温偏差。 镇流器包括功率转换器，其将输入DC电压转换为用于驱动灯的灯功率，以及调光器，其提供变化的调光比的调光器命令，以便在调光比减小时将灯功率降低到更大的程度。 控制器控制功率转换器响应于调光比降低到预定电平而向灯提供高频AC电流，并且随着调光比降低超过预定电平，降低高频AC电流的RMS值。

公开(公告)号：US5418719A

公开(公告)日：1995-05-23

申请号：US12831

申请日：1993-02-03

申请人： Takahiro Abe ,  Kazuyoshi Fukawa ,  Masaaki Kamimura

发明人： Takahiro Abe ,  Kazuyoshi Fukawa ,  Masaaki Kamimura

IPC分类号： G06F3/14 ,  G01R31/00 ,  G06F3/048 ,  G06F11/25 ,  G06F11/32 ,  G01M17/00

CPC分类号： G01R31/007 ,  G06F11/2257 ,  G06F11/32

摘要： A trouble checking apparatus for checking a trouble in a circuit or system. Data related to operating conditions of the circuit are inputted. A defective condition is checked for each of different regions of the circuit to provide a check result based upon the inputted data. The region is displayed in a graphic manner. The manners in which the circuit is presented at different regions of the circuit are controlled based upon the check results made for the respective regions.

摘要翻译： 用于检查电路或系统中的故障的故障检查装置。 输入与电路工作条件有关的数据。 检查电路的不同区域中的每一个的缺陷状况，以根据输入的数据提供检查结果。 该区域以图形方式显示。 基于对各个区域的检查结果来控制在电路的不同区域呈现电路的方式。

公开(公告)号：US09070388B2

公开(公告)日：2015-06-30

申请号：US13011019

申请日：2011-01-21

申请人： Kentaro Yamada ,  Takeshi Shimada ,  Takahiro Abe

发明人： Kentaro Yamada ,  Takeshi Shimada ,  Takahiro Abe

IPC分类号： C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  B44C1/22 ,  H01L21/302 ,  H01L21/461 ,  G11B5/31 ,  C23F4/00 ,  H01F41/34

CPC分类号： G11B5/3163 ,  C23F4/00 ,  H01F41/34

摘要： In a plasma processing method of dry-etching of a magnetic film having a thickness of 200 nm to 500 nm, a plasma processing method of dry-etching of a sample having the magnetic film on which a multilayered film including a resist film, an non-organic film underlying the resist film, a Cr film underlying the non-organic film, and an Al2O3 film underlying the Cr film.

摘要翻译： 在对200nm〜500nm的厚度的磁性膜进行干蚀刻的等离子体处理方法中，对具有含有抗蚀剂膜的多层膜的磁性膜的试样进行干法蚀刻的等离子体处理方法， - 抗蚀剂膜下面的无机膜，非有机膜下面的Cr膜和Cr膜下面的Al 2 O 3膜。

公开(公告)号：US08591752B2

公开(公告)日：2013-11-26

申请号：US13399030

申请日：2012-02-17

申请人： Takahiro Abe ,  Takeshi Shimada ,  Atsushi Yoshida ,  Kentaro Yamada ,  Daisuke Fujita

发明人： Takahiro Abe ,  Takeshi Shimada ,  Atsushi Yoshida ,  Kentaro Yamada ,  Daisuke Fujita

IPC分类号： B44C1/22 ,  B08B9/00

CPC分类号： H01J37/321 ,  C23F4/00 ,  C23G5/00 ,  H01J2237/334 ,  H01L43/12

摘要： A method for plasma-etching a magnetic film and plasma-cleaning, in which deposits in an etching processing chamber are efficiently removed while corrosion of a wafer is suppressed, is provided. A plasma processing method for plasma-etching a to-be-processed substrate having a magnetic film in an etching processing chamber includes the steps of plasma-etching the magnetic film using a first gas not containing chlorine, transferring out the to-be-processed substrate from the etching processing chamber, first plasma-cleaning of the etching processing chamber using a second gas containing chlorine, and second plasma-cleaning using a third gas containing hydrogen after the first plasma cleaning.

摘要翻译： 提供了一种用于等离子体蚀刻磁性膜和等离子体清洁的方法，其中在蚀刻处理室中的沉积物被有效地去除，同时腐蚀晶片被抑制。 在蚀刻处理室中对具有磁性膜的被处理基板进行等离子体蚀刻的等离子体处理方法包括使用不含氯的第一气体等离子体蚀刻磁性膜的步骤，将待处理的 来自蚀刻处理室的衬底，首先使用含氯的第二气体对蚀刻处理室进行等离子体清洁，以及在第一等离子体清洗之后使用含有氢的第三气体进行第二等离子体清洁。

公开(公告)号：US07905486B2

公开(公告)日：2011-03-15

申请号：US11939331

申请日：2007-11-13

申请人： Takahiro Abe

发明人： Takahiro Abe

IPC分类号： B65H5/02

CPC分类号： B65H5/062 ,  B65H2404/1441 ,  B65H2511/224 ,  B65H2513/53 ,  B65H2801/06 ,  B65H2220/02 ,  B65H2220/01

摘要： The invention provides a transportation apparatus for transporting a transportation target medium in a predetermined transportation direction. The transportation target medium transportation apparatus according to an aspect of the invention includes: a transport driving roller that is operated rotationally; a transport driven roller that is urged against the transport driving roller and follows the rotary movement of the transport driving roller; and a control unit that controls the movement of the transport driven roller between a contact position at which the transport driven roller is in contact with the transport driving roller and a non-contact position at which the transport driven roller is not in contact with the transport driving roller. In such a configuration of the transportation target medium transportation apparatus, the control unit moves the transport driven roller to the non-contact position at which the transport driven roller is not in contact with the transport driving roller when the thickness of the transportation target medium is at least a predetermined value, and then moves the transport driven roller to the contact position at which the transport driven roller is in contact with the transport driving roller when the length of time period in which the transport driven roller continues to be at the non-contact position exceeds a predetermined time period.

摘要翻译： 本发明提供一种用于在预定的运输方向上运输运输目标介质的运输设备。 根据本发明的一个方面的输送目标介质输送装置包括：旋转地操作的输送驱动辊; 传送驱动辊，其被推靠在传送驱动辊上并跟随传送驱动辊的旋转运动; 以及控制单元，其控制所述输送从动辊在所述输送从动辊与所述输送驱动辊接触的接触位置与所述输送从动辊与所述输送驱动辊不接触的非接触位置之间的运动 驱动辊。 在这样的输送目标介质输送装置的结构中，当输送对象介质的厚度为运送对象介质输送装置的厚度时，控制单元将输送从动辊移动到与输送驱动辊不接触的非接触位置 至少一个预定值，然后当传送从动辊继续处于非传送驱动辊的时间长度时，将传送从动辊移动到传送从动辊与传送驱动辊接触的接触位置， 接触位置超过预定时间段。

公开(公告)号：US6030820A

公开(公告)日：2000-02-29

申请号：US165796

申请日：1998-10-02

申请人： Satoshi Morioka ,  Takahiro Abe ,  Toshihiro Maeda ,  Arihiro Taki ,  Katsuhiko Sawada ,  Hiroaki Ishitsuka

发明人： Satoshi Morioka ,  Takahiro Abe ,  Toshihiro Maeda ,  Arihiro Taki ,  Katsuhiko Sawada ,  Hiroaki Ishitsuka

IPC分类号： C07C29/76 ,  C07C29/78 ,  C07C31/24 ,  C12P7/18 ,  C12R1/645 ,  C07C27/26 ,  C07C31/18 ,  C12P1/02

CPC分类号： C07C29/78 ,  C12P7/18 ,  Y10S435/911

摘要： A process for producing a high-purity erythritol crystal comprising a crystallization step of subjecting an erythritol-containing aqueous solution as a raw solution to crystallization, wherein an erythritol concentration of said erythritol-containing aqueous solution is adjusted to 30 to 60% by weight at the beginning of the crystallization step; said erythritol-containing aqueous solution is cooled at a cooling rate of not more than 20.degree. C./hour; a seed crystal of erythritol is added to said erythritol-containing aqueous solution in the course of the cooling, and the solution is cooled to not more than 20.degree. C. Such a process for producing a high-purity erythritol crystal of the present invention has a still higher purity and is further improved in crystal shape as compared to those produced by conventional processes.

摘要翻译： 一种高纯度赤藓糖醇晶体的制造方法，其特征在于，使含有赤藓糖醇的水溶液作为原料溶液进行结晶的结晶化步骤，其中所述含赤藓糖醇的水溶液的赤藓醇浓度在30〜60重量％ 结晶步骤的开始; 所述含赤藓糖醇的水溶液以不超过20℃/小时的冷却速度冷却; 在冷却过程中将赤藓糖醇晶种加入到所述含赤藓糖醇的水溶液中，并将溶液冷却至不超过20℃。本发明的高纯度赤藓糖醇晶体的制造方法具有 与通过常规方法制造的那些相比，纯度更高，并且晶体形状进一步提高。

公开(公告)号：US4770684A

公开(公告)日：1988-09-13

申请号：US26360

申请日：1987-03-16

申请人： Hisashi Tsukada ,  Takahiro Abe ,  Sugio Ishihara ,  Junichi Taira ,  Hiroo Akabane

发明人： Hisashi Tsukada ,  Takahiro Abe ,  Sugio Ishihara ,  Junichi Taira ,  Hiroo Akabane

IPC分类号： F25C5/14 ,  B29C3/00

CPC分类号： F25C5/14

摘要： An apparatus for production of compression-solidified snow comprises a pressure chamber with a rust preventive inner face, a pressure head for applying pressure to snow, a boost-typed pressure cylinder installed at one end of the pressure chamber and equipped with the pressure head, a hopper having an inner face which allows snow to slide thereon smoothly, and a pusher installed in a snow compression zone at the other end of the pressure chamber. A method of compressing snow into solidified snow lump is characterized in that snow having a temperature of 0.degree. to -30.degree. C. is compressed and formed with a pressure of 10 to 200 kg/cm.sup.2 at a head displacement velocity of 0.1 to 150 mm/sec for pressure holding time of 0.about.300 seconds into a solid having a density of 0.6 g/cm.sup.3 or more.

摘要翻译： 用于生产压缩固化雪的设备包括具有防锈内表面的压力室，用于施加压力的压力的压力头，安装在压力室的一端并配备有压力头的升压型压力缸， 具有允许雪平滑地滑动的内表面的料斗，以及安装在压力室的另一端的雪压缩区域中的推动器。 将雪压入固化的雪块的方法的特征在于，将温度为0〜-30℃的雪压缩并以10〜200kg / cm 2的压力形成，头位移速度为0.1〜150mm 的压力保持时间为0分钟的密度为0.6g / cm 3以上的固体。

公开(公告)号：US07224568B2

公开(公告)日：2007-05-29

申请号：US11069551

申请日：2005-03-02

申请人： Hiroaki Ishimura ,  Ken Yoshioka ,  Takahiro Abe ,  Go Saito ,  Motohiko Yoshigai

发明人： Hiroaki Ishimura ,  Ken Yoshioka ,  Takahiro Abe ,  Go Saito ,  Motohiko Yoshigai

IPC分类号： H01L21/683

CPC分类号： H01J37/32706 ,  H01J37/321 ,  H01L21/6833

摘要： In a plasma processing apparatus using electrostatic chuck, increase of plasma potential is prevented and abnormal discharge is avoided. The plasma processing apparatus comprises an RF source for generating plasma in a vacuum container, another RF source for applying an RF bias power to a sample, a sample stage having an electrostatic chuck electrode, a DC power supply for applying an electrostatic chuck voltage to the electrode, and a controller for shifting the electrostatic chuck voltage to negative by a potential difference of quarter to half of peak-to-peak voltage of the RF bias power for suppressing increase of plasma potential.

摘要翻译： 在使用静电卡盘的等离子体处理装置中，防止等离子体电位的增加，避免异常放电。 等离子体处理装置包括用于在真空容器中产生等离子体的RF源，用于向样品施加RF偏置功率的另一RF源，具有静电卡盘电极的样品台，用于向静电卡盘电压施加静电卡盘电压的DC电源 电极，以及控制器，用于将静电卡盘电压转换为负值，以抑制RF偏置功率的峰 - 峰电压的四分之一到一半的电位差，以抑制等离子体电位的增加。