公开(公告)号：US20070106075A1

公开(公告)日：2007-05-10

申请号：US11593051

申请日：2006-11-06

申请人： Sung Kim ,  Jeong Yoon ,  Raisa Kharbash ,  Han Kim ,  Xiang Li ,  Min Lim ,  Chang Cho

发明人： Sung Kim ,  Jeong Yoon ,  Raisa Kharbash ,  Han Kim ,  Xiang Li ,  Min Lim ,  Chang Cho

IPC分类号： C07D413/14 ,  C07D409/14 ,  C07D403/14

CPC分类号： C07D251/24 ,  C08F2/50 ,  G03F7/029 ,  Y10S430/121

摘要： The present invention relates to a triazine based photoactive compound containing an oxime ester group. The compound according to the present invention is a photoactive compound containing both an oxime ester group and a triazine group in one molecule, has excellent radical-generating efficiency due to effective absorption of UV radiation, particularly i-line (365 nm) radiation and can function as an effective initiator for photopolymerization of various compounds containing unsaturated groups, particularly an acryl compound.

摘要翻译： 本发明涉及含有肟酯基的三嗪系光敏化合物。 根据本发明的化合物是在一个分子中含有肟酯基和三嗪基的光敏化合物，由于UV辐射的有效吸收，特别是i线（365nm）辐射，具有极好的自由基产生效率，并且可以 作为含有不饱和基团，特别是丙烯酸化合物的各种化合物的光聚合的有效引发剂。

公开(公告)号：US20140220491A1

公开(公告)日：2014-08-07

申请号：US14111166

申请日：2012-05-14

申请人： Changho Cho ,  Won Jin Chung ,  Raisa Kharbash ,  Sunghyun Kim ,  Dongchang Choi ,  Sang Chul Lee ,  Han Soo Kim ,  Yoon Hee Heo ,  Sunhwa Kim

发明人： Changho Cho ,  Won Jin Chung ,  Raisa Kharbash ,  Sunghyun Kim ,  Dongchang Choi ,  Sang Chul Lee ,  Han Soo Kim ,  Yoon Hee Heo ,  Sunhwa Kim

IPC分类号： G03F7/004 ,  G03F7/038

CPC分类号： G03F7/0045 ,  G03F7/0007 ,  G03F7/029 ,  G03F7/032 ,  G03F7/033 ,  G03F7/0388

摘要： The present invention relates to a photoactive compound having a novel structure and a photosensitive resin composition including the same, and the photoactive compound according to the present invention has excellent sensitivity due to efficient absorption to a UV light source by including a nitro group and a phosphonate structure, and has excellent retention rate, mechanical strength, heat resistance, chemical resistance and developing resistance by improving solubility of the photosensitive resin composition by excellent compatibility of the phosphonate structure and a binder resin. Therefore, the photosensitive resin composition according to the present invention is useful to cure a column spacer, an overcoat, a passivation material and the like of a liquid crystal display device, and is useful in view of a high temperature process property.

摘要翻译： 本发明涉及一种具有新颖结构的光敏化合物和含有它的光敏树脂组合物，本发明的光敏化合物由于通过包括硝基和膦酸盐对UV光源的有效吸收而具有优异的灵敏度 结构，并且通过优异的膦酸酯结构和粘合剂树脂的相容性改善感光性树脂组合物的溶解性，具有优异的保留率，机械强度，耐热性，耐化学性和耐显影性。 因此，根据本发明的感光性树脂组合物可用于固化液晶显示装置的柱间隔物，外涂层，钝化材料等，并且考虑到高温加工性能是有用的。