公开(公告)号：US06828569B2

公开(公告)日：2004-12-07

申请号：US09988391

申请日：2001-11-19

申请人： Willem Van Schaik ,  Bastiaan Matthias Mertens ,  Hans Meiling ,  Norbertus Benedictus Koster

发明人： Willem Van Schaik ,  Bastiaan Matthias Mertens ,  Hans Meiling ,  Norbertus Benedictus Koster

IPC分类号： G21G500

CPC分类号： G03F7/70925 ,  G03F7/70883 ,  G03F7/70933

摘要： Cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of an oxygen-containing species selected from water, nitrogen oxide and oxygen-containing hydrocarbons. Generally, the space will be purged with an ozone-less purge gas which contains a small amount of the oxygen-containing species in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of the oxygen-containing species into the space.

摘要翻译： 用于光刻投影装置的光学部件的清洁可以通过在选择的含氧物质的存在下，用波长小于250nm的UV或EUV辐射照射包含光学部件的装置内的空间来进行 来自水，氮氧化物和含氧烃。 通常，除了通常的吹扫气体组合物之外，空间将被含有少量含氧物质的无臭氧净化气体吹扫。 该技术也可以通过将含氧物质的低压引入空间而用于抽空空间。