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11.Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same 有权
标题翻译: 具有抗反射性的硬掩模组合物和使用其组合物的方法公开(公告)号:US20080305441A1
公开(公告)日:2008-12-11
申请号:US12155490
申请日:2008-06-05
申请人: Kyong Ho YOON , Jong Seob KIM , Dong Seon UH , Hwan Sung CHEON , Chang Il OH , Min Soo KIM , Jin Kuk LEE
发明人: Kyong Ho YOON , Jong Seob KIM , Dong Seon UH , Hwan Sung CHEON , Chang Il OH , Min Soo KIM , Jin Kuk LEE
CPC分类号: G03F7/091 , Y10S438/952
摘要: A hardmask composition includes an organic solvent and one or more aromatic ring-containing polymers represented by Formulae 1, 2 and 3:
摘要翻译: 硬掩模组合物包括有机溶剂和由式1,2和3表示的一种或多种含芳族环的聚合物: