公开(公告)号：US08896807B2

公开(公告)日：2014-11-25

申请号：US13944281

申请日：2013-07-17

Applicant: Nikon Corporation

Inventor： Alex Ka Tim Poon ,  Leonard Wai Fung Kho

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70358 ,  G03F7/708 ,  G03F7/70858

Abstract: A liquid immersion lithography apparatus includes a projection system having a final optical element via which a substrate is exposed to an exposure beam through an immersion liquid located between the final optical element and the substrate, and a nozzle member. The nozzle member has a first opening on one side of the final optical element and from which the immersion liquid is supplied, a second opening on a second side of the final optical element and from which the immersion liquid is collected, and a liquid recovery portion that surrounds a path of the exposure beam and from which the immersion liquid is collected. During exposure, an upper surface of the substrate faces the liquid recovery portion, and the immersion liquid is supplied from the first opening while the immersion liquid supplied from the first opening is recovered from the second opening and the liquid recovery portion.

Abstract translation: 液浸式光刻设备包括具有最终光学元件的投影系统，通过该最终光学元件将基板暴露于通过位于最终光学元件和基板之间的浸没液体的曝光光束和喷嘴构件。 喷嘴构件在最终光学元件的一侧上具有第一开口，并且供应浸没液体，在最终光学元件的第二侧上具有第二开口，并且从其收集浸没液体，并且液体回收部分 其围绕曝光束的路径并从中收集浸液。 在曝光期间，基板的上表面面向液体回收部分，并且从第一开口提供的浸液从第二开口和液体回收部分回收从第一开口供给浸渍液。